METHOD AND APPARATUS FOR CALIBRATING POSITION OF IMAGE SENSOR, AND METHOD OF DETECTING POSITION OF IMAGE SENSOR
    1.
    发明申请
    METHOD AND APPARATUS FOR CALIBRATING POSITION OF IMAGE SENSOR, AND METHOD OF DETECTING POSITION OF IMAGE SENSOR 有权
    用于校准图像传感器位置的方法和装置,以及检测图像传感器位置的方法

    公开(公告)号:US20080109182A1

    公开(公告)日:2008-05-08

    申请号:US11828516

    申请日:2007-07-26

    IPC分类号: G01C25/00

    CPC分类号: H04N5/349

    摘要: A method and apparatus for calibrating a position of an image sensor, and a method of detecting the position of an image sensor are provided. The method of calibrating the position of an image sensor includes: obtaining first image information corresponding to a first position of the image sensor and obtaining second image information corresponding to a second position of the image sensor, calculating cross-correlation values between the obtained first image information and second image information; determining whether or not the calculated cross-correlation values are symmetrical; setting a driving power value of the image sensor for moving the image sensor the distance between the first position to the second position as a reference driving power value for moving the image sensor one-pixel distance, if it is determined that the cross-correlation values are not symmetrical; and calibrating the position of the image sensor by using the set driving power value.

    摘要翻译: 提供了用于校准图像传感器的位置的方法和装置以及检测图像传感器的位置的方法。 校准图像传感器的位置的方法包括:获得与图像传感器的第一位置相对应的第一图像信息,并获得与图像传感器的第二位置对应的第二图像信息,计算所获得的第一图像之间的互相关值 信息和第二图像信息; 确定所计算的互相关值是否对称; 设置图像传感器的驱动功率值,用于将图像传感器的距离移动到第一位置与第二位置之间,作为用于使图像传感器移动一像素距离的基准驱动功率值,如果确定互相关值 不对称 并使用设定的驱动功率值来校准图像传感器的位置。

    Method and apparatus for calibrating position of image sensor, and method of detecting position of image sensor
    2.
    发明授权
    Method and apparatus for calibrating position of image sensor, and method of detecting position of image sensor 有权
    用于校准图像传感器位置的方法和装置,以及检测图像传感器位置的方法

    公开(公告)号:US07490016B2

    公开(公告)日:2009-02-10

    申请号:US11828516

    申请日:2007-07-26

    IPC分类号: G01C25/00

    CPC分类号: H04N5/349

    摘要: A method and apparatus for calibrating a position of an image sensor, and a method of detecting the position of an image sensor are provided. The method of calibrating the position of an image sensor includes: obtaining first image information corresponding to a first position of the image sensor and obtaining second image information corresponding to a second position of the image sensor, calculating cross-correlation values between the obtained first image information and second image information; determining whether or not the calculated cross-correlation values are symmetrical; setting a driving power value of the image sensor for moving the image sensor the distance between the first position to the second position as a reference driving power value for moving the image sensor one-pixel distance, if it is determined that the cross-correlation values are not symmetrical; and calibrating the position of the image sensor by using the set driving power value.

    摘要翻译: 提供了用于校准图像传感器的位置的方法和装置以及检测图像传感器的位置的方法。 校准图像传感器的位置的方法包括:获得与图像传感器的第一位置相对应的第一图像信息,并获得与图像传感器的第二位置对应的第二图像信息,计算所获得的第一图像之间的互相关值 信息和第二图像信息; 确定所计算的互相关值是否对称; 设置图像传感器的驱动功率值,用于将图像传感器的距离移动到第一位置与第二位置之间,作为用于使图像传感器移动一像素距离的基准驱动功率值,如果确定互相关值 不对称 并使用设定的驱动功率值来校准图像传感器的位置。

    Apparatus comprising substrate and conductive layer
    4.
    发明授权
    Apparatus comprising substrate and conductive layer 有权
    装置包括基底和导电层

    公开(公告)号:US08523555B2

    公开(公告)日:2013-09-03

    申请号:US13621204

    申请日:2012-09-15

    IPC分类号: B29C59/00

    摘要: A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.

    摘要翻译: 提供了纳米压印母版及其制造方法。 该方法包括:将导电金属离子注入包括石英的衬底中,以在石英衬底内形成导电层; 在其上形成导电层的石英基板上涂覆抗蚀剂,以形成抗蚀剂涂层; 将抗蚀剂涂层暴露于电子束以形成微图案; 通过使用其中形成有微图案的抗蚀剂涂层作为掩模来蚀刻石英基板; 并除去抗蚀剂涂层以获得形成微图案的母版。

    NANO IMPRINT MASTER AND METHOD OF MANUFACTURING THE SAME
    7.
    发明申请
    NANO IMPRINT MASTER AND METHOD OF MANUFACTURING THE SAME 有权
    NANO IMPRINT MASTER及其制造方法

    公开(公告)号:US20110223279A1

    公开(公告)日:2011-09-15

    申请号:US13113534

    申请日:2011-05-23

    IPC分类号: B29C59/02

    摘要: A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.

    摘要翻译: 提供了纳米压印母版及其制造方法。 该方法包括:将导电金属离子注入包括石英的衬底中,以在石英衬底内形成导电层; 在其上形成导电层的石英基板上涂覆抗蚀剂,以形成抗蚀剂涂层; 将抗蚀剂涂层暴露于电子束以形成微图案; 通过使用其中形成有微图案的抗蚀剂涂层作为掩模来蚀刻石英基板; 并除去抗蚀剂涂层以获得形成微图案的母版。

    Nano imprint master and method of manufacturing the same
    8.
    发明授权
    Nano imprint master and method of manufacturing the same 有权
    纳米印记的主人和制造方法相同

    公开(公告)号:US07968253B2

    公开(公告)日:2011-06-28

    申请号:US11745609

    申请日:2007-05-08

    IPC分类号: G03F1/00

    摘要: A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.

    摘要翻译: 提供了纳米压印母版及其制造方法。 该方法包括:将导电金属离子注入包括石英的衬底中,以在石英衬底内形成导电层; 在其上形成导电层的石英基板上涂覆抗蚀剂,以形成抗蚀剂涂层; 将抗蚀剂涂层暴露于电子束以形成微图案; 通过使用其中形成有微图案的抗蚀剂涂层作为掩模来蚀刻石英基板; 并除去抗蚀剂涂层以获得形成微图案的母版。

    Conductive layer including implanted metal ions
    9.
    发明授权
    Conductive layer including implanted metal ions 有权
    导电层包括植入金属离子

    公开(公告)号:US08349527B2

    公开(公告)日:2013-01-08

    申请号:US13113534

    申请日:2011-05-23

    IPC分类号: G03F1/00

    摘要: A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.

    摘要翻译: 提供了纳米压印母版及其制造方法。 该方法包括:将导电金属离子注入包括石英的衬底中,以在石英衬底内形成导电层; 在其上形成导电层的石英基板上涂覆抗蚀剂,以形成抗蚀剂涂层; 将抗蚀剂涂层暴露于电子束以形成微图案; 通过使用其中形成有微图案的抗蚀剂涂层作为掩模来蚀刻石英基板; 并除去抗蚀剂涂层以获得形成微图案的母版。