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    Lignan process
    3.
    发明授权
    Lignan process 失效
    木质素过程

    公开(公告)号：US5210230A

    公开(公告)日：1993-05-11

    申请号：US777952

    申请日：1991-10-17

    申请人： Joseph F. Payack

    发明人： Joseph F. Payack

    IPC分类号： C07D307/92

    CPC分类号： C07D307/92

    摘要： A three-step process is described for the preparation of a lignan of the formula ##STR1## This lignan is useful as an intermediate for the preparation of anti-asthmatic pyranylphenyl hydroxyalkylnaphthoic acids.

    摘要翻译： 描述了用于制备下式的木脂素的三步法：该木脂素可用作制备抗哮喘吡喃基苯基羟烷基萘甲酸的中间体。

    2-(4-piperidinyl)-1H-pyrido[4,3-b]-indol-1-ones and related compounds
    8.
    发明授权
    2-(4-piperidinyl)-1H-pyrido[4,3-b]-indol-1-ones and related compounds 失效
    2-（4-哌啶基）-1H-吡啶并[4,3-b] - 吲哚-1-酮和相关化合物

    公开(公告)号：US5430154A

    公开(公告)日：1995-07-04

    申请号：US148225

    申请日：1993-11-08

    申请人： Lawrence L. Martin ,  Denise M. Flanagan ,  Joseph F. Payack

    发明人： Lawrence L. Martin ,  Denise M. Flanagan ,  Joseph F. Payack

    IPC分类号： C07D401/12 ,  C07D471/04 ,  C07D401/00 ,  C07D209/42

    CPC分类号： C07D401/12 ,  C07D471/04

    摘要： A compound of the formula ##STR1## wherein R.sup.1 is hydrogen, loweralkyl, phenyl, phenyl substituted by one or more loweralkyl, loweralkoxy, halogen, or trifluoromethyl groups, phenylloweralkyl or phenylloweralkyl in which the phenyl group is substituted by one or more loweralkyl, loweralkoxy, halogen, or trifluoromethyl groups; R.sup.2 is loweralkyl, furanylloweralkyl, thienylloweralkyl, pyrrolylloweralkyl, pyridinylloweralkyl, phenylloweralkyl, or phenylloweralkyl in which the phenyl group is substituted by one or more loweralkyl, loweralkoxy, halogen, or trifluoromethyl groups; X is hydrogen, loweralkyl, loweralkoxy, halogen, or trifluoromethyl; m is 0 or 1; n is 1 or 2; an optical isomer thereof or a salt thereof.

    摘要翻译： 其中R 1为氢，低级烷基，苯基，被一个或多个低级烷基，低级烷氧基，卤素或三氟甲基取代的苯基，苯基低级烷基或苯基低级烷基，其中苯基被一个或多个低级烷基取代的低级烷氧基 ，卤素或三氟甲基; R2是低级烷基，呋喃基低级烷基，噻吩基低级烷基，吡咯基低级烷基，吡啶基低级烷基，苯基低级烷基或苯基低级烷基，其中苯基被一个或多个低级烷基，低级烷氧基，卤素或三氟甲基取代; X是氢，低级烷基，低级烷氧基，卤素或三氟甲基; m为0或1; n为1或2; 其光学异构体或其盐。

    2-(4-piperidinyl)-1H-pyrido[4,3-B]indol-1-ones and related compounds
    9.
    发明授权
    2-(4-piperidinyl)-1H-pyrido[4,3-B]indol-1-ones and related compounds 失效
    2-（4-哌啶基）-1H-吡啶并[4,3-B]吲哚-1-酮及相关化合物

    公开(公告)号：US5292883A

    公开(公告)日：1994-03-08

    申请号：US67891

    申请日：1993-05-27

    申请人： Lawrence L. Martin ,  Denise M. Flanagan ,  Joseph F. Payack

    发明人： Lawrence L. Martin ,  Denise M. Flanagan ,  Joseph F. Payack

    IPC分类号： C07D401/12 ,  C07D471/04 ,  C07D401/00 ,  C07D209/42

    CPC分类号： C07D401/12 ,  C07D471/04

    摘要： A compound of the formula ##STR1## wherein R.sup.1 is hydrogen, loweralkyl, phenyl, phenyl substituted by one or more loweralkyl, loweralkoxy, halogen, or trifluoromethyl groups, phenylloweralkyl or phenylloweralkyl in which the phenyl group is substituted by one or more loweralkyl, loweralkoxy, halogen, or trifluoromethyl groups; R.sup.2 is loweralkyl, furanylloweralkyl, thienylloweralkyl, pyrrolylloweralkyl, pyridinylloweralkyl, phenylloweralkyl, or phenylloweralkyl in which the phenyl group is substituted by one or more loweralkyl, loweralkoxy, halogen, or trifluoromethyl groups; X is hydrogen, loweralkyl, loweralkoxy, halogen, or trifluoromethyl; m is 0, 1 or 2; n is 1 or 2; an optical isomer thereof or a salt thereof.

    摘要翻译： 其中R 1为氢，低级烷基，苯基，被一个或多个低级烷基，低级烷氧基，卤素或三氟甲基取代的苯基，苯基低级烷基或苯基低级烷基，其中苯基被一个或多个低级烷基取代的低级烷氧基 ，卤素或三氟甲基; R2是低级烷基，呋喃基低级烷基，噻吩基低级烷基，吡咯基低级烷基，吡啶基低级烷基，苯基低级烷基或苯基低级烷基，其中苯基被一个或多个低级烷基，低级烷氧基，卤素或三氟甲基取代; X是氢，低级烷基，低级烷氧基，卤素或三氟甲基; m为0,1或2; n为1或2; 其光学异构体或其盐。