Electron beam apparatus having a low loss beam path
    2.
    发明授权
    Electron beam apparatus having a low loss beam path 有权
    具有低损耗光束路径的电子束装置

    公开(公告)号:US06749903B2

    公开(公告)日:2004-06-15

    申请号:US10245208

    申请日:2002-09-17

    IPC分类号: B05D306

    CPC分类号: H01J33/04

    摘要: An apparatus for irradiating an article, particularly a multi-layer article, with electron beam radiation is provided. The apparatus contains a window having a short unit path length and allows for controlled irradiation of an article such that upper portions of the article receive significantly higher electron beam dosages than lower portions of the article. Such differential dosage allows for modification of an article comprising a coating composition that can be modified by electron beam irradiation on a substrate that is vulnerable to degradation from electron beam radiation. A method of irradiating an article with electron beams, and products manufactured using the apparatus and method of the invention, are also disclosed.

    摘要翻译: 提供了一种用于用电子束辐射照射物品,特别是多层物品的设备。 该装置包含具有短的单位路径长度的窗口,并允许制品的受控照射,使得制品的上部比制品的下部接收明显更高的电子束剂量。 这种差异剂量允许修饰包含可以通过电子束照射在易受电子束辐射劣化的基底上的涂层组合物的制品。 还公开了用电子束照射物品的方法,以及使用本发明的装置和方法制造的产品。