POLISHING APPARATUS AND POLISHING METHOD
    2.
    发明公开

    公开(公告)号:US20240300068A1

    公开(公告)日:2024-09-12

    申请号:US18589145

    申请日:2024-02-27

    CPC classification number: B24B49/04 B24B49/105 B24B49/16

    Abstract: A polishing apparatus includes a polishing table with a polishing pad for polishing a film formed on a semiconductor wafer. The polishing apparatus includes a first sensor that outputs a first signal corresponding to the film thickness of the film and a second sensor that is more sensitive than the first sensor and that outputs a second signal corresponding to the film thickness of the film. When the film thickness of the film is equal to or less than a predetermined film thickness, the film thickness detector detects the film thickness of the film according to a second signal. When the film is thicker than the predetermined film thickness, the film thickness detector detects the film thickness of the film according to the first signal and the second signal.

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