专利检索 ap:("EBARA CORPORATION") AND inv:"Toru OSUGA" 第 1 页

1.

发明公开
INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING METHOD, PROGRAM, SUBSTRATE PROCESSING APPARATUS, CRITERION DATA DETERMINATION APPARATUS, AND CRITERION DATA DETERMINATION METHOD 审中-公开

公开(公告)号：US20240077079A1

公开(公告)日：2024-03-07

申请号：US18508671

申请日：2023-11-14

申请人： EBARA CORPORATION

发明人： Keiji MAISHIGI , Tetsuro SUGIURA , Katsuaki USUI , Masahiro HATAKEYAMA , Chikako HONMA , Toru OSUGA , Koichi IWASAKI , Jie Yuan LIN

IPC分类号： F04C28/28 , F04D27/00 , G06F9/54 , G06F17/18

CPC分类号： F04C28/28 , F04D27/001 , G06F9/542 , G06F17/18

摘要： An information processing apparatus detecting presence or absence of abnormality of a vacuum pump derived from a product produced within a target vacuum pump, including: a determination unit configured to determine a normal variation range or a normal time variation behavior of a target state quantity which is a state quantity varying depending on a load of gas flowing into the vacuum pump, based on at least one of past target state quantities of the target vacuum pump or another vacuum pump; and a comparison unit configured to compare a current target state quantity of the target vacuum pump with the normal variation range or the normal time variation behavior and output the comparison result.

2.

发明申请
VACUUM EVACUATION SYSTEM 审中-公开

公开(公告)号：US20170200622A1

公开(公告)日：2017-07-13

申请号：US15313990

申请日：2015-05-28

申请人： EBARA CORPORATION

发明人： Atsushi SHIOKAWA , Tetsuro SUGIURA , Shinichi SEKIGUCHI , Takashi KYOTANI , Tetsuo KOMAI , Norio KIMURA , Keiichi ISHIKAWA , Toru OSUGA

IPC分类号： H01L21/67 , C23C14/22 , G05D16/20 , C23C16/44

CPC分类号： H01L21/67017 , C23C14/22 , C23C16/4412 , C23C16/52 , F04B37/14 , F04B37/16 , F04B41/00 , G05D16/2013 , H01J37/32834 , H01J37/32844 , H01L21/205 , H01L21/3065 , H01L21/31 , H01L21/67276 , Y02C20/30 , Y02P70/605

摘要： The present invention relates to a vacuum evacuation system used to evacuate a processing gas from one or more process chambers for use in, for example, a semiconductor-device manufacturing apparatus. The vacuum evacuation system is a vacuum apparatus for evacuating a gas from a plurality of process chambers (1). The vacuum evacuation system includes a plurality of first vacuum pumps (5) coupled to the plurality of process chambers (1) respectively, a collecting pipe (7) coupled to the plurality of first vacuum pumps (5), and a second vacuum pump (8) coupled to the collecting pipe (7).