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公开(公告)号：US06316165B1
公开(公告)日：2001-11-13
申请号：US09264061
申请日：1999-03-08
IPC分类号： G03F700
CPC分类号： G03F7/091 , Y10S430/151
摘要： The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coating layer is required. ARCs of the invention contain a low molecular weight resin, a plasticizer compound and/or a low Tg resin. The invention also includes methods for applying forming planarizing ARC coating layers.
摘要翻译： 本发明提供适合用作抗反射涂料组合物（“ARC”）的新的光吸收组合物，包括用于深UV应用。 本发明的抗反射组合物在需要平面化涂层时特别有用。 本发明的ARCs含有低分子量树脂，增塑剂化合物和/或低Tg树脂。 本发明还包括用于施加成形平坦化ARC涂层的方法。
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公开(公告)号：US06855466B2
公开(公告)日：2005-02-15
申请号：US09952880
申请日：2001-09-15
IPC分类号： G03F7/11 , C08K5/13 , C08K5/3445 , C08L33/06 , C08L61/20 , C08L101/12 , G03F7/004 , G03F7/09 , H01L21/027 , G03F7/00
CPC分类号： G03F7/091 , Y10S430/151
摘要： The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coating layer is required. ARCs of the invention contain a low molecular weight resin, a plasticizer compound and/or a low Tg resin. The invention also includes methods for applying forming planarizing ARC coating layers.
摘要翻译： 本发明提供适合用作抗反射涂料组合物（“ARC”）的新的光吸收组合物，包括用于深UV应用。 本发明的抗反射组合物在需要平面化涂层时特别有用。 本发明的ARCs含有低分子量树脂，增塑剂化合物和/或低Tg树脂。 本发明还包括用于施加成形平坦化ARC涂层的方法。
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公开(公告)号：US07147983B1
公开(公告)日：2006-12-12
申请号：US08726613
申请日：1996-10-07
申请人： James Michael Mori , James W. Thackeray , Roger F. Sinta , Rosemary Bell , Robin L. Miller-Fahey , Timothy G. Adams , Thomas M. Zydowsky , Edward K. Pavelchek , Manuel doCanto
发明人： James Michael Mori , James W. Thackeray , Roger F. Sinta , Rosemary Bell , Robin L. Miller-Fahey , Timothy G. Adams , Thomas M. Zydowsky , Edward K. Pavelchek , Manuel doCanto
IPC分类号： G03F7/04
CPC分类号： G03F7/091 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111 , Y10S430/127
摘要： The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
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公开(公告)号：US06653049B2
公开(公告)日：2003-11-25
申请号：US09788111
申请日：2001-02-17
IPC分类号： G03F711
CPC分类号： G03F7/091
摘要： The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), particularly for deep UV applications. The antireflective compositions of the invention in general comprise a resin binder component that contains a high molecular weight polymer, e.g. a polymer having an Mw of at least about 40,000 daltons. ARCs of the invention exhibit exceptional conformality upon application to a substrate surface. For example, ARCs of the invention can coat substantial topography such as vertical and sloping steps with high conformality.
摘要翻译： 本发明提供适合用作抗反射涂料组合物（“ARC”）的新的光吸收组合物，特别是用于深UV应用。 本发明的抗反射组合物通常包含含有高分子量聚合物的树脂粘合剂组分，例如， 具有至少约40,000道尔顿的Mw的聚合物。 本发明的ARC在应用于基底表面时表现出非凡的共形性。 例如，本发明的ARCs可以涂覆基本的形貌，例如具有高共形性的垂直和倾斜的台阶。
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5.发明授权Methods utilizing antireflective coating compositions with exposure under 200 nm 有权利用200nm以下曝光的抗反射涂料组合物的方法公开(公告)号：US06410209B1
公开(公告)日：2002-06-25
申请号：US09153575
申请日：1998-09-15
申请人： Timothy G. Adams , Edward K. Pavelchek , Roger F. Sinta , Manuel DoCanto , Robert F. Blacksmith , Peter Trefonas, III
发明人： Timothy G. Adams , Edward K. Pavelchek , Roger F. Sinta , Manuel DoCanto , Robert F. Blacksmith , Peter Trefonas, III
IPC分类号： G03C500
CPC分类号： G03F7/091
摘要： The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.
摘要翻译： 本发明提供了适合用作抗反射组合物（ARC）的新的光吸收交联组合物，特别适合于短波长成像应用例如193nm。 本发明的ARCs优选与外涂抗蚀剂层（即底层ARC）一起使用，并且通常包含可有效吸收反射的亚-200nm曝光辐射的新型ARC树脂粘合剂。
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公开(公告)号：US06190839B1
公开(公告)日：2001-02-20
申请号：US09007590
申请日：1998-01-15
IPC分类号： G03F726
CPC分类号： G03F7/091
摘要： The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), particularly for deep UV applications. The antireflective compositions of the invention in general comprise a resin binder component that contains a high molecular weight polymer, e.g. a polymer having an Mw of at least about 40,000 daltons. ARCs of the invention exhibit exceptional conformality upon application to a substrate surface. For example, ARCs of the invention can coat substantial topography such as vertical and sloping steps with high conformality.
摘要翻译： 本发明提供适合用作抗反射涂料组合物（“ARC”）的新的光吸收组合物，特别是用于深UV应用。 本发明的抗反射组合物通常包含含有高分子量聚合物的树脂粘合剂组分，例如， 具有至少约40,000道尔顿的Mw的聚合物。 本发明的ARC在应用于基底表面时表现出非凡的共形性。 例如，本发明的ARCs可以涂覆基本的形貌，例如具有高共形性的垂直和倾斜的台阶。
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7.发明授权公开(公告)号：US06602652B2
公开(公告)日：2003-08-05
申请号：US10126636
申请日：2002-04-20
申请人： Timothy G. Adams , Edward K. Pavelchek , Roger F. Sinta , Manuel DoCanto , Robert F. Blacksmith , Peter Trefonas, III
发明人： Timothy G. Adams , Edward K. Pavelchek , Roger F. Sinta , Manuel DoCanto , Robert F. Blacksmith , Peter Trefonas, III
IPC分类号： G03C500
CPC分类号： G03F7/091
摘要： The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.
摘要翻译： 本发明提供了适合用作抗反射组合物（ARC）的新的光吸收交联组合物，特别适合于短波长成像应用例如193nm。 本发明的ARCs优选与外涂抗蚀剂层（即底层ARC）一起使用，并且通常包含可有效吸收反射的亚-200nm曝光辐射的新型ARC树脂粘合剂。
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公开(公告)号：US06849373B2
公开(公告)日：2005-02-01
申请号：US09904587
申请日：2001-07-14
IPC分类号： G03F7/004 , C08J9/26 , C09D5/00 , G03F7/09 , G03F7/095 , G03F7/11 , H01B3/46 , H01L21/027 , H01L21/316 , G03F7/00
CPC分类号： C08J9/26 , C08J2201/046 , C08J2383/04 , G03F7/091 , G03F7/095 , H01B3/46 , H01L21/02118 , H01L21/02282 , H01L21/31695 , Y10S430/127 , Y10S430/128
摘要： The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during exposure of an overcoated photoresist. Antireflective compositions of the invention can significantly reduce undesired footing of an overcoated resist relief image.
摘要翻译： 本发明提供了适合用作抗反射组合物的新的光吸收交联组合物，特别是用于深UV应用。 本发明的抗反射组合物包含在外涂光致抗蚀剂曝光期间被活化的光酸产生剂。 本发明的抗反射组合物可以显着减少外涂防腐剂图像的不期望的基础。
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公开(公告)号：US07026101B2
公开(公告)日：2006-04-11
申请号：US09918399
申请日：2001-07-30
IPC分类号： G03F7/00
CPC分类号： G03F7/091 , Y10S430/151
摘要： Antireflective compositions are provided that contain a basic additive material. Such use of a basic material can significantly decrease or even completely eliminate notching of an overcoated photoresist relief image. Antireflective formulations of the invention are preferably crosslinking compositions and may contain a resin component in addition to the basic additive. Antireflective compositions of the invention can be effectively used at a variety of wavelengths used to expose an overcoated photoresist layer, including 248 nm and 193 nm.
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公开(公告)号：US5939236A
公开(公告)日：1999-08-17
申请号：US797741
申请日：1997-02-07
IPC分类号： G03F7/004 , C08J9/26 , C09D5/00 , G03F7/09 , G03F7/095 , G03F7/11 , H01B3/46 , H01L21/027 , H01L21/316
CPC分类号： C08J9/26 , G03F7/091 , G03F7/095 , H01B3/46 , H01L21/02118 , H01L21/02282 , H01L21/31695 , C08J2201/046 , C08J2383/04 , Y10S430/127 , Y10S430/128
摘要： The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during exposure of an overcoated photoresist. Antireflective compositions of the invention can significantly reduce undesired footing of an overcoated resist relief image.
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