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公开(公告)号：US20080165406A1
公开(公告)日：2008-07-10
申请号：US11885785
申请日：2006-03-09
申请人： Ehud Galun , Nisim Hadar , Alon Tavory , Israel Vilenchik , Ephraim Argaman , Gidon Slosberg , Moshe Toker , Yosef Kigel , Guy Ben-Zvi , Rami Cohen , Vladimir Dmitriev , Sergey Oshemkov
发明人： Ehud Galun , Nisim Hadar , Alon Tavory , Israel Vilenchik , Ephraim Argaman , Gidon Slosberg , Moshe Toker , Yosef Kigel , Guy Ben-Zvi , Rami Cohen , Vladimir Dmitriev , Sergey Oshemkov
CPC分类号： G02B27/32
摘要： A reticle device is disclosed, comprising a transparent substrate provided with subsurface reticle design inscribed within the substrate.
摘要翻译： 公开了一种掩模版设备，其包括设置有内接在衬底内的地下掩模版设计的透明衬底。
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公开(公告)号：US20070065729A1
公开(公告)日：2007-03-22
申请号：US10564972
申请日：2004-07-18
CPC分类号： G03F1/70 , G03F1/38 , G03F1/50 , G03F1/54 , G03F7/70433
摘要： A method for compensating for critical dimension (CD) variations of pattern lines of a wafer, by the correcting the CD of the corresponding photomask. The photomask comprises a transparent substrate having two substantially opposite surfaces, a first back surface and a second front surface on which front surface an absorbing coating is provided, on which the pattern lines were formed by removing the coating at the pattern lines. The method comprises: determining CD variations across regions of a wafer exposure field relating to the photomask; and providing Shading Elements (SE) within the substrate of the photomask in regions which correlates to regions of the wafer exposure field where CD variations greater than a predetermined target value were determined, whereby the shading elements attenuate light passing through the regions, so as to compensate for the CD variations on the wafer and hence provide and improved CD tolerance wafer.
摘要翻译： 通过校正相应光掩模的CD来补偿晶片图案线的临界尺寸（CD）变化的方法。 光掩模包括具有两个基本上相对的表面的透明基底，第一后表面和第二前表面，其上设置有表面吸收涂层，其上通过去除图案线上的涂层而形成图案线。 该方法包括：确定跨越与光掩模相关的晶片曝光场的区域的CD变化; 并且在确定了CD变化大于预定目标值的晶片曝光场的区域相关的区域中，在光掩模的衬底内提供遮光元件（SE），由此遮光元件使通过该区域的光衰减，从而 补偿晶片上的CD变化，从而提供和改进的CD容限晶片。
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公开(公告)号：US20130209926A1
公开(公告)日：2013-08-15
申请号：US13806252
申请日：2011-06-21
申请人： Sergey Oshemkov , Ralph Klaesges , Markus Mengel , Vladimir Kruglyakov , Eitan Zait , Vladimir Dmitriev , Guy Ben-Zvi , Steven Labovitz
发明人： Sergey Oshemkov , Ralph Klaesges , Markus Mengel , Vladimir Kruglyakov , Eitan Zait , Vladimir Dmitriev , Guy Ben-Zvi , Steven Labovitz
IPC分类号： G03F7/20
CPC分类号： G03F7/2002 , C03C23/0025
摘要： A system for processing a substrate includes a light source to provide light pulses, a stage to support a substrate, optics to focus the light pulses onto the substrate, a scanner to scan the light pulses across the substrate, a computer to control properties of the light pulses and the scanning of the light pulses such that color centers are generated in various regions of the substrate, and at least one of (i) an ultraviolet light source to irradiate the substrate with ultraviolet light or (ii) a heater to heat the substrate after formation of the color centers to stabilize a transmittance spectrum of the substrate.
摘要翻译： 用于处理衬底的系统包括提供光脉冲的光源，用于支撑衬底的阶段，用于将光脉冲聚焦到衬底上的光学器件，扫描器以跨过衬底扫描光脉冲，计算机，以控制 光脉冲和光脉冲的扫描，使得在基板的各个区域中产生颜色中心，以及（i）紫外光源中的至少一个，以用紫外线照射基板，或（ii）加热器来加热 在形成颜色中心之后的衬底以稳定衬底的透射光谱。
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公开(公告)号：US09034539B2
公开(公告)日：2015-05-19
申请号：US13806252
申请日：2011-06-21
申请人： Sergey Oshemkov , Ralph Klaesges , Markus Mengel , Vladimir Kruglyakov , Eitan Zait , Vladimir Dmitriev , Guy Ben-Zvi , Steven Labovitz
发明人： Sergey Oshemkov , Ralph Klaesges , Markus Mengel , Vladimir Kruglyakov , Eitan Zait , Vladimir Dmitriev , Guy Ben-Zvi , Steven Labovitz
CPC分类号： G03F7/2002 , C03C23/0025
摘要： A system for processing a substrate includes a light source to provide light pulses, a stage to support a substrate, optics to focus the light pulses onto the substrate, a scanner to scan the light pulses across the substrate, a computer to control properties of the light pulses and the scanning of the light pulses such that color centers are generated in various regions of the substrate, and at least one of (i) an ultraviolet light source to irradiate the substrate with ultraviolet light or (ii) a heater to heat the substrate after formation of the color centers to stabilize a transmittance spectrum of the substrate.
摘要翻译： 用于处理衬底的系统包括提供光脉冲的光源，用于支撑衬底的阶段，用于将光脉冲聚焦到衬底上的光学器件，扫描器以跨过衬底扫描光脉冲，计算机，以控制 光脉冲和光脉冲的扫描，使得在基板的各个区域中产生颜色中心，以及（i）紫外光源中的至少一个，以用紫外线照射基板，或（ii）加热器来加热 在形成颜色中心之后的衬底以稳定衬底的透射光谱。
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公开(公告)号：US07736819B2
公开(公告)日：2010-06-15
申请号：US10564972
申请日：2004-07-18
IPC分类号： G03F1/00
CPC分类号： G03F1/70 , G03F1/38 , G03F1/50 , G03F1/54 , G03F7/70433
摘要： A method for compensating for critical dimension (CD) variations of pattern lines of a wafer, by the correcting the CD of the corresponding photomask. The photomask comprises a transparent substrate having two substantially opposite surfaces, a first back surface and a second front surface on which front surface an absorbing coating is provided, on which the pattern lines were formed by removing the coating at the pattern lines. The method comprises: determining CD variations across regions of a wafer exposure field relating to the photomask; and providing Shading Elements (SE) within the substrate of the photomask in regions which correlates to regions of the wafer exposure field where CD variations greater than a predetermined target value were determined, whereby the shading elements attenuate light passing through the regions, so as to compensate for the CD variations on the wafer and hence provide and improved CD tolerance wafer.
摘要翻译： 通过校正相应光掩模的CD来补偿晶片图案线的临界尺寸（CD）变化的方法。 光掩模包括具有两个基本上相对的表面的透明基板，第一后表面和第二前表面，其上设置有表面吸收涂层，其上通过去除图案线上的涂层而形成图案线。 该方法包括：确定跨越与光掩模相关的晶片曝光场的区域的CD变化; 并且在确定了CD变化大于预定目标值的晶片曝光场的区域相关的区域中，在光掩模的衬底内提供遮光元件（SE），由此遮光元件衰减穿过该区域的光，以便 补偿晶片上的CD变化，从而提供和改进的CD容限晶片。
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公开(公告)号：US20050084767A1
公开(公告)日：2005-04-21
申请号：US10504866
申请日：2002-12-12
CPC分类号： G03F1/72
摘要： A system and method for repairing a photomask (52) for use in a photolithography process is disclosed, the photomask (52), consisting of a substrate layer (38) and a chrome layer (36) over the substrate layer (38), having a defect (42) in the chrome layer (36), the method comprising: providing a pulsed laser source (1) for generating an ultra-short pulsed laser beam; providing optical elements for scanning, directing and focusing the pulsed laser beam at a desired target location; directing the pulsed laser beam through the substrate and focusing it on a target location located inside the substrate adjacent the defect (42) to write a diffractive optical element (34), thus changing the scattering properties of the substrate at the target location.
摘要翻译： 公开了一种用于修复用于光刻工艺的光掩模（52）的系统和方法，所述光掩模（52）由衬底层（38）和覆盖在所述衬底层（38）上的铬层（36）组成，所述光掩模 所述铬层（36）中的缺陷（42），所述方法包括：提供用于产生超短脉冲激光束的脉冲激光源（1） 提供用于在期望的目标位置处扫描，引导和聚焦脉冲激光束的光学元件; 将脉冲激光束引导通过衬底并将其聚焦在位于邻近缺陷（42）的衬底内的目标位置上以写入衍射光学元件（34），从而改变衬底在目标位置处的散射特性。
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7.发明授权公开(公告)号：US06566626B2
公开(公告)日：2003-05-20
申请号：US09898964
申请日：2001-07-03
申请人： Grigory Gaissinsky , Victor Kopelev , Stella Kopelev , Sergey Oshemkov , Nikolay Guletsky , Vladimir Dmitriev
发明人： Grigory Gaissinsky , Victor Kopelev , Stella Kopelev , Sergey Oshemkov , Nikolay Guletsky , Vladimir Dmitriev
IPC分类号： B23K2600
CPC分类号： B44B7/007 , B23K26/50 , B23K26/53 , C03C4/04 , C03C23/0005 , C03C23/0025 , C03C23/007
摘要： A method and apparatus for generating colored images of at least one color within a light-sensitive glass sample. The glass sample contains light-sensitive chemical components that acquire at least one of a multiplicity of colors in response to actinic radiation and subsequent heating to a temperature that causes color to appear. The method comprises focusing a pulsed laser beam to a target location within the glass, irradiating a plurality of pulses focused in the target location within the glass sample, thus generating a zone of increased opacity to the visible light at the target location and a resultant localized actinic radiation at that zone, displacing the focus point of the laser beam and the glass sample relative to each other by the displacing device in a predetermined manner so as to produce a plurality of zones of increased opacity that form an image, and heating of the sample to a temperature that causes color to appear at the zones of increased opacity.
摘要翻译： 一种用于在感光玻璃样品内产生至少一种颜色的彩色图像的方法和装置。 玻璃样品包含光敏化学成分，其响应于光化辐射获得多种颜色中的至少一种，并随后加热至导致颜色出现的温度。 该方法包括将脉冲激光束聚焦到玻璃内的目标位置，照射聚焦在玻璃样品内的目标位置中的多个脉冲，从而产生对目标位置处的可见光增加的不透明度区域，并且产生局部 在该区域的光化辐射，通过移动装置以预定的方式使激光束和玻璃样品的聚焦点相对于彼此移动，以便产生形成图像的增加的不透明度的多个区域，并且加热 样品到导致颜色出现在增加不透明度的区域的温度。
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公开(公告)号：US08101921B2
公开(公告)日：2012-01-24
申请号：US12133004
申请日：2008-06-04
申请人： Sergey Oshemkov , Vladimir Dmitriev , Lev Dvorkin
发明人： Sergey Oshemkov , Vladimir Dmitriev , Lev Dvorkin
CPC分类号： A61B18/26 , A61B17/3203 , A61B2017/32032 , A61B2018/263 , Y10T137/0391 , Y10T137/2191 , Y10T137/2196 , Y10T137/2207
摘要： A method for inducing a controllable jet in a transparent liquid is disclosed. The method comprises providing a gas-liquid interface, providing a laser source and generating a beam comprising a sequence of laser pulses, and focusing the beam to a target location within the liquid at a predetermined distance from the gas-liquid interface and creating a plurality of cavitation bubbles, yielding a jet directed away from the gas-liquid interface. Other methods and apparatus are also described and claimed.
摘要翻译： 公开了一种用于在透明液体中诱导可控射流的方法。 该方法包括提供气 - 液界面，提供激光源并产生包括一系列激光脉冲的光束，并将光束聚焦到液体内的目标位置，距离气 - 液界面预定距离，并产生多个 的空化气泡，产生远离气 - 液界面的射流。 还描述和要求保护其它方法和装置。
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9.发明申请公开(公告)号：US20110036991A1
公开(公告)日：2011-02-17
申请号：US12934155
申请日：2009-04-05
申请人： Sergey Oshemkov , Lev Dvorkin , Vladimir Dmitriev
发明人： Sergey Oshemkov , Lev Dvorkin , Vladimir Dmitriev
IPC分类号： G21K5/00
CPC分类号： G02B21/32 , A61B18/26 , A61B2018/263
摘要： A method for producing, trapping and manipulating a gas microbubble in liquid is disclosed. The method includes providing a pulsed laser source for generating a pulsed laser radiation and focusing optics; and focusing a pulsed laser radiation to a focal zone within the liquid, with energy exceeding the threshold of optical breakdown in the liquid at the focal zone. It is also suggested to use focusing optics to focus the laser beam to a focal point at a depth close to the compensation depth of the focusing optics for spherical aberration.
摘要翻译： 公开了一种用于在液体中产生，捕获和操纵气体微泡的方法。 该方法包括提供用于产生脉冲激光辐射和聚焦光学器件的脉冲激光源; 并且将脉冲激光辐射聚焦到液体内的聚焦区域，其能量超过在聚焦区域处的液体中光学击穿的阈值。 还建议使用聚焦光学器件将激光束聚焦到靠近聚焦光学器件的补偿深度的球面像差处的焦点。
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公开(公告)号：US06884961B1
公开(公告)日：2005-04-26
申请号：US10362800
申请日：2001-08-23
CPC分类号： G03H1/0808 , G02B5/32 , G03H2001/0094 , G03H2001/0484 , G03H2001/0491 , G03H2260/62
摘要： A method of producing in a solid transparent material, a diffractive optical element for the transformation of an incident wave in a predefined manner, by developing a mathematical model of the element in terms of the required transformation, then using that model for determining a set of points which form the desired diffractie optical element, and then focusing a pulsed laser beam sequentially onto the points in the set, such that it causes optical breakdown damage at those points. Numerical solutions for determining the positions of the set of points from the mathematical model are presented. The production of number of elements for specific applications is described. Complete laser systems capable of monitoring the production of the points in real time according to the results obtained by diffraction of the incident wave by the element under production.
摘要翻译： 一种以固体透明材料制造的衍射光学元件，用于以预定方式转换入射波的衍射光学元件，通过根据所需变换开发元件的数学模型，然后使用该模型来确定一组 形成期望的衍射光学元件的点，然后将脉冲激光束顺序地聚焦到该组中的点上，使得其在那些点处引起光学击穿损伤。 提出了从数学模型中确定点集的位置的数值解。 描述了用于特定应用的元件数量的生产。 完整的激光系统能够根据由生产中的元件的入射波的衍射获得的结果实时监控点的生成。
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