公开(公告)号：US20250079198A1

公开(公告)日：2025-03-06

申请号：US18816488

申请日：2024-08-27

Applicant: Elemental Scientific, Inc.

Inventor： Jacob Unnerstall ,  Brianna Dufek ,  Daniel R. Wiederin ,  Suhas Ketkar ,  Austin Schultz ,  Kyle W. Uhlmeyer ,  Beau A. Marth

IPC: H01L21/67 ,  H01L21/02

Abstract: Systems and methods are described for systems and methods for integrated decomposition and scanning of a semiconducting wafer for organic and inorganic impurities. In an aspect, a method includes, but is not limited to, positioning a nozzle above a surface of a semiconducting wafer, the semiconducting wafer supported adjacent to or within an interior of a chamber body; introducing a first scan fluid including one or more organic fluids to an inlet port of the nozzle; directing a portion of the first scan fluid onto the surface of the semiconducting wafer to permit interaction between the scan fluid and one or more organic contaminants present on the surface of the semiconducting wafer; and removing the first scan fluid containing at least a portion of the one or more organic contaminants from the surface of the semiconducting wafer via the nozzle.

公开(公告)号：US20250079145A1

公开(公告)日：2025-03-06

申请号：US18816531

申请日：2024-08-27

Applicant: Elemental Scientific, Inc.

Inventor： Jacob Unnerstall ,  Brianna Dufek ,  Daniel R. Wiederin ,  Suhas Ketkar ,  Austin Schultz ,  Kyle W. Uhlmeyer ,  Beau A. Marth

IPC: H01J49/04 ,  H01J49/10 ,  H01J49/40 ,  H01J49/42

Abstract: Systems and methods are described for collecting and combining multiple scan samples from a surface of a semiconducting wafer. A system embodiment includes, but is not limited to, a scan nozzle configured to introduce a first scan solution to a surface of a semiconducting wafer to remove impurities from the surface to provide a first scan sample and retrieve the first scan sample, the scan nozzle further configured to introduce a second scan solution to the surface of the semiconducting wafer to remove residual impurities from the surface to provide a second scan sample and retrieve the second scan sample; and a collection vessel in fluid communication with the scan nozzle, the collection vessel configured to receive each of the first scan sample and the second scan sample from the nozzle and to mix the first scan sample with the second scan sample to provide a combined scan sample.

公开(公告)号：US20250076160A1

公开(公告)日：2025-03-06

申请号：US18816564

申请日：2024-08-27

Applicant: Elemental Scientific, Inc.

Inventor： Jacob Unnerstall ,  Brianna Dufek ,  Daniel R. Wiederin ,  Suhas Ketkar ,  Austin Schultz ,  Kyle W. Uhlmeyer ,  Beau A. Marth

IPC: G01N1/28 ,  B01F23/40

Abstract: Systems and methods are described for generating organic solvent scan solutions and calibration standards inline for semiconductor wafer analysis. A method embodiment includes, but is not limited to, drawing, via a pump system, a first organic solvent from a first organic chemical source; drawing, via the pump system, a second organic solvent from a second organic chemical source; mixing, inline, the first organic solvent and the second organic solvent to form an organic scan solution; and introducing the organic scan solution to a scan nozzle for introduction to one or more surfaces of a semiconducting wafer to remove one or more organic contaminants from the semiconducting wafer.