Process for manufacturing a ceramic element for a watch case and element obtained by this process
    1.
    发明授权
    Process for manufacturing a ceramic element for a watch case and element obtained by this process 有权
    用于制造用于通过该方法获得的表壳和元件的陶瓷元件的方法

    公开(公告)号:US08282270B2

    公开(公告)日:2012-10-09

    申请号:US12603792

    申请日:2009-10-22

    申请人: Eric Grippo

    发明人: Eric Grippo

    摘要: According to this process for manufacturing a ceramic element intended to be fitted onto a watch case, the visible surface of which has features, a soluble layer (2) is selectively deposited on said visible surface, the thickness of said soluble layer being at least equal to the height of said features, a first tie layer (3) of the Ti, Ta, Cr or Th type is vacuum-deposited by magnetron sputtering with a thickness of at least 100 nm by physical vapor deposition (PVD) on said surface thus selectively coated, followed, without venting atmosphere, by PVD deposition of said second layer (4) made of Au, Pt, Ag, Ni, Pd, TiN, CrN, ZrN or alloys thereof with a thickness of at least 100 nm, and then said soluble layer (2) is dissolved.

    摘要翻译: 根据该制造用于装配在表壳上的陶瓷元件的方法,其可见表面具有特征,在所述可见表面上选择性地沉积可溶层(2),所述可溶层的厚度至少相等 到所述特征的高度,通过在所述表面上通过物理气相沉积(PVD)至少100nm的厚度通过磁控溅射将Ti,Ta,Cr或Th型的第一粘结层(3)真空沉积,因此 选择性地涂覆,然后通过PVD沉积由Au,Pt,Ag,Ni,Pd,TiN,CrN,ZrN或其合金制成的厚度至少为100nm的所述第二层(4),而不排放空气,然后 所述可溶层(2)溶解。

    PROCESS FOR MANUFACTURING A CERAMIC ELEMENT FOR A WATCH CASE AND ELEMENT OBTAINED BY THIS PROCESS
    3.
    发明申请
    PROCESS FOR MANUFACTURING A CERAMIC ELEMENT FOR A WATCH CASE AND ELEMENT OBTAINED BY THIS PROCESS 有权
    制造本工艺获得的手表和元件的陶瓷元件的工艺

    公开(公告)号:US20100110841A1

    公开(公告)日:2010-05-06

    申请号:US12603792

    申请日:2009-10-22

    申请人: Eric Grippo

    发明人: Eric Grippo

    摘要: According to this process for manufacturing a ceramic element intended to be fitted onto a watch case, the visible surface of which has features, a soluble layer (2) is selectively deposited on said visible surface, the thickness of said soluble layer being at least equal to the height of said features, a first tie layer (3) of the Ti, Ta, Cr or Th type is vacuum-deposited by magnetron sputtering with a thickness of at least 100 nm by physical vapor deposition (PVD) on said surface thus selectively coated, followed, without venting atmosphere, by PVD deposition of said second layer (4) made of Au, Pt, Ag, Ni, Pd, TiN, CrN, ZrN or alloys thereof with a thickness of at least 100 nm, and then said soluble layer (2) is dissolved.

    摘要翻译: 根据该制造用于装配在表壳上的陶瓷元件的方法,其可见表面具有特征,在所述可见表面上选择性地沉积可溶层(2),所述可溶层的厚度至少相等 到所述特征的高度,通过在所述表面上通过物理气相沉积(PVD)至少100nm的厚度通过磁控溅射将Ti,Ta,Cr或Th型的第一粘结层(3)真空沉积,因此 选择性地涂覆,然后通过PVD沉积由Au,Pt,Ag,Ni,Pd,TiN,CrN,ZrN或其合金制成的厚度至少为100nm的所述第二层(4),而不排放空气,然后 所述可溶层(2)溶解。

    Process for manufacturing a ceramic element for a watch case and element obtained by this process
    5.
    发明授权
    Process for manufacturing a ceramic element for a watch case and element obtained by this process 有权
    用于制造用于通过该方法获得的表壳和元件的陶瓷元件的方法

    公开(公告)号:US07628894B2

    公开(公告)日:2009-12-08

    申请号:US11061289

    申请日:2005-02-18

    申请人: Eric Grippo

    发明人: Eric Grippo

    IPC分类号: C23C14/35

    摘要: According to this process for manufacturing a ceramic element intended to be fitted onto a watch case, the visible surface of which has features, a soluble layer is selectively deposited on said visible surface, the thickness of said soluble layer being at least equal to the height of said features, a first tie layer of the Ti, Ta, Cr or Th type is vacuum-deposited by magnetron sputtering with a thickness of at least 100 nm by physical vapor deposition (PVD) on said surface thus selectively coated, followed, without venting atmosphere, by PVD deposition of said second layer made of Au, Pt, Ag, Ni, Pd, TiN, CrN, ZrN or alloys thereof with a thickness of at least 100 nm, and then said soluble layer is dissolved.

    摘要翻译: 根据该制造用于装配在手表壳体上的陶瓷元件的方法,其可见表面具有特征,可溶层被选择性地沉积在所述可见表面上,所述可溶层的厚度至少等于高度 的所述特征,通过在所述表面上的物理气相沉积(PVD)通过磁控溅射将厚度至少为100nm的Ti,Ta,Cr或Th型的第一粘结层真空沉积,从而选择性地涂覆,随后,没有 通过PVD沉积由Au,Pt,Ag,Ni,Pd,TiN,CrN,ZrN或其合金制成的厚度为至少100nm的所述第二层,然后溶解所述可溶层。