公开(公告)号：US06293310B1

公开(公告)日：2001-09-25

申请号：US08960464

申请日：1997-10-29

申请人： Eric J. Redemann ,  Kim N. Vu

发明人： Eric J. Redemann ,  Kim N. Vu

IPC分类号： F16K1110

CPC分类号： C23C16/44 ,  C23C16/455 ,  C23C16/45561 ,  F16K11/22 ,  F16K27/003 ,  H01J37/3244 ,  H01L21/67017 ,  Y10T137/5109 ,  Y10T137/87885

摘要： A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

公开(公告)号：US06435215B1

公开(公告)日：2002-08-20

申请号：US09939487

申请日：2001-08-23

申请人： Eric J. Redemann ,  Kim N. Vu

发明人： Eric J. Redemann ,  Kim N. Vu

IPC分类号： F16K2700

CPC分类号： H01L21/67017 ,  C23C16/44 ,  C23C16/455 ,  C23C16/45561 ,  H01J37/3244 ,  Y10T137/4259 ,  Y10T137/5109 ,  Y10T137/5283 ,  Y10T137/87885 ,  Y10T137/87917

摘要： A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

公开(公告)号：US06394138B1

公开(公告)日：2002-05-28

申请号：US09229722

申请日：1999-01-13

申请人： Kim N. Vu ,  Eric J. Redemann ,  David P. Sherriff

发明人： Kim N. Vu ,  Eric J. Redemann ,  David P. Sherriff

IPC分类号： F16K2700

CPC分类号： C23C16/44 ,  C23C16/45561 ,  F16K11/22 ,  F16K27/003 ,  H01J37/3244 ,  H01L21/67017 ,  Y10T137/87249 ,  Y10T137/87885

摘要： A manifold system for enabling a distribution of fluids includes a plurality of individual manifold blocks that can be joined together to form a gas stick. Each manifold block will have a fluid passage way with an entrance port and exit port accessing a common surface. An active component can be mounted to one manifold block, while extending across a port of an adjacent manifold block. An alignment system can be provided to ensure that the entrance and exit ports are positioned in a plane containing the common surface to facilitate sealing.

摘要翻译： 用于实现流体分配的歧管系统包括可以连接在一起以形成气棒的多个单独的歧管块。 每个歧管块将具有流体通道，其中入口和出口进入共同的表面。 活动部件可以安装到一个歧管块，同时延伸穿过相邻歧管块的端口。 可以提供对准系统以确保入口和出口端口位于包含公共表面的平面中以便于密封。

公开(公告)号：US06189570B1

公开(公告)日：2001-02-20

申请号：US09371655

申请日：1999-08-10

申请人： Eric J. Redemann ,  Kim N. Vu

发明人： Eric J. Redemann ,  Kim N. Vu

IPC分类号： F16K1110

CPC分类号： H01L21/67017 ,  C23C16/44 ,  C23C16/455 ,  C23C16/45561 ,  H01J37/3244 ,  Y10T137/4259 ,  Y10T137/5109 ,  Y10T137/5283 ,  Y10T137/87885 ,  Y10T137/87917

摘要： A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

公开(公告)号：US5992463A

公开(公告)日：1999-11-30

申请号：US739936

申请日：1996-10-30

申请人： Eric J. Redemann ,  Kim N. Vu

发明人： Eric J. Redemann ,  Kim N. Vu

IPC分类号： F16K27/00 ,  C23C16/44 ,  C23C16/455 ,  F16K11/10 ,  F16K51/00 ,  H01J37/32 ,  H01L21/00 ,  H01L21/304 ,  F16K11/20

CPC分类号： H01L21/67017 ,  C23C16/44 ,  C23C16/455 ,  C23C16/45561 ,  H01J37/3244 ,  Y10T137/4259 ,  Y10T137/5109 ,  Y10T137/5283 ,  Y10T137/87885 ,  Y10T137/87917

摘要： A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

公开(公告)号：US6142539A

公开(公告)日：2000-11-07

申请号：US371659

申请日：1999-08-10

申请人： Eric J. Redemann ,  Kim N. Vu

发明人： Eric J. Redemann ,  Kim N. Vu

IPC分类号： F16K27/00 ,  C23C16/44 ,  C23C16/455 ,  F16K11/10 ,  F16K51/00 ,  H01J37/32 ,  H01L21/00 ,  H01L21/304 ,  F16L17/00

CPC分类号： H01L21/67017 ,  C23C16/44 ,  C23C16/455 ,  C23C16/45561 ,  H01J37/3244 ,  Y10T137/4259 ,  Y10T137/5109 ,  Y10T137/5283 ,  Y10T137/87885 ,  Y10T137/87917

摘要： A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

公开(公告)号：US06474700B2

公开(公告)日：2002-11-05

申请号：US09732434

申请日：2000-12-07

申请人： Eric J. Redemann ,  Kim N. Vu

发明人： Eric J. Redemann ,  Kim N. Vu

IPC分类号： F16L1700

CPC分类号： H01L21/67017 ,  C23C16/44 ,  C23C16/455 ,  C23C16/45561 ,  H01J37/3244 ,  Y10T137/4259 ,  Y10T137/5109 ,  Y10T137/5283 ,  Y10T137/87885 ,  Y10T137/87917

摘要： A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

摘要翻译： 用于制造半导体的工具的气体面板包括具有用于接收处理气体的入口的一体式歧管本体。 歧管主体具有沿气流的大致方向延伸的至少一个侧壁。 侧壁包括其上具有活动装置的至少一个活动装置部位。 有源装置与形成在一体式歧管内的气体输送通道气体连通。 有源装置可以是手动阀，气动阀，压力调节器，压力传感器，净化器，过滤器或流量控制器。 气体在主体装置中在歧管主体中的气体流动路径的延续处被接收并且被传送到歧管出口以最终到达工具。

公开(公告)号：US06374859B1

公开(公告)日：2002-04-23

申请号：US09111999

申请日：1998-07-08

申请人： Kim N. Vu ,  Eric J. Redemann ,  David P. Sheriff

发明人： Kim N. Vu ,  Eric J. Redemann ,  David P. Sheriff

IPC分类号： F16K2700

CPC分类号： C23C16/44 ,  C23C16/455 ,  C23C16/45561 ,  F16K11/22 ,  F16K27/003 ,  H01J37/3244 ,  H01L21/67017 ,  Y10T137/5109 ,  Y10T137/87885

摘要： A manifold system for incorporation in a gas panel distribution system for semi-conductor manufacturing includes a plurality of individual manifold blocks with each manifold block having a fluid passageway with an entrance and exit port accessing a common surface. Adjacent manifold blocks are removably interconnected to permit the respective fluid passageways to be in position for interconnection. A plurality of active components can be sealingly fastened to the individual manifold blocks to complete the interconnection of the respective fluid passageways. Each active component can bridge over a pair of adjacent individual manifold blocks and form with the individual manifold blocks an operative gas stick for delivering gas to a semiconductor tool. The individual manifold blocks can be identical in configuration and can include a first upper flange on one side and a second lower flange on an opposite side to enable an interlocking of adjacent manifold blocks.

摘要翻译： 用于并入用于半导体制造的气体面板分配系统中的歧管系统包括多个单独的歧管块，每个歧管块具有流体通道，入口和出口进入共同的表面。 相邻的歧管块可移除地互连，以允许相应的流体通道在适当的位置进行互连。 多个有源部件可以密封地紧固到各个歧管块以完成各个流体通道的互连。 每个有源部件可以跨接在一对相邻的单独歧管块上，并与各个歧管块形成用于将气体输送到半导体工具的可操作气体棒。 各个歧管块的构造可以相同，并且可以包括一侧上的第一上凸缘和相对侧上的第二下凸缘，以使得相邻歧管块的联锁。

公开(公告)号：US06192938B1

公开(公告)日：2001-02-27

申请号：US09371408

申请日：1999-08-10

申请人： Eric J. Redemann ,  Kim N. Vu

发明人： Eric J. Redemann ,  Kim N. Vu

IPC分类号： F16K11110

CPC分类号： H01L21/67017 ,  C23C16/44 ,  C23C16/455 ,  C23C16/45561 ,  H01J37/3244 ,  Y10T137/4259 ,  Y10T137/5109 ,  Y10T137/5283 ,  Y10T137/87885 ,  Y10T137/87917

摘要： A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

摘要翻译： 用于制造半导体的工具的气体面板包括具有用于接收处理气体的入口的一体式歧管本体。 歧管主体具有沿气流的大致方向延伸的至少一个侧壁。 侧壁包括其上具有活动装置的至少一个活动装置部位。 有源装置与形成在一体式歧管内的气体输送通道气体连通。 有源装置可以是手动阀，气动阀，压力调节器，压力传感器，净化器，过滤器或流量控制器。 气体在主体装置中在歧管主体中的气体流动路径的延续处被接收并且被传送到歧管出口以最终到达工具。

公开(公告)号：US5925829A

公开(公告)日：1999-07-20

申请号：US790218

申请日：1997-02-03

申请人： Robert Laragione ,  Dan B. LeMay ,  Eric J. Redemann ,  Michael D. Upchurch

发明人： Robert Laragione ,  Dan B. LeMay ,  Eric J. Redemann ,  Michael D. Upchurch

IPC分类号： G01F1/34 ,  G01F25/00 ,  G01F1/00

CPC分类号： G01F25/003 ,  G01F1/34 ,  G01F25/0053

摘要： Method and apparatus for determining a mass rate of flow of gas by a rate of change of pressure includes an inlet for communicating a flow of gas from a source of gas whose mass flow rate is to be measured. A volumetric container is connected to the gas inlet to receive the gas. The volumetric container precisely defines a standard volume in its interior. Positioned within the volumetric container is a heat conductive assembly for maintaining the interior of the system substantially isothermal during pressure changes of the gas as gas flows into or leaves the container. Attached to the container is a pressure measuring transducer which measures the gas pressure within the container. The rate of change of the gas pressure under isothermal conditions within the container is indicative of the rate of mass flow of the gas into or out of the volumetric container.

摘要翻译： 用于通过压力变化率确定气体质量流率的方法和装置包括用于连通来自待测量质量流量的气体源的气体流的入口。 容积式容器连接到气体入口以接收气体。 体积容器在其内部精确地定义了标准体积。 位于容积容器内的是导热组件，用于在气体流入或离开容器时气体的压力变化期间将体系内部保持基本等温。 附着在容器上的是测量容器内的气体压力的压力测量传感器。 容器内等温条件下的气体压力变化率表示气体进出容积容器的质量流量。