Abstract:
A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.
Abstract:
Method and apparatus for determining a mass rate of flow of gas by a rate of change of pressure includes an inlet for communicating a flow of gas from a source of gas whose mass flow rate is to be measured. A volumetric container is connected to the gas inlet to receive the gas. The volumetric container precisely defines a standard volume in its interior. Positioned within the volumetric container is a heat conductive assembly for maintaining the interior of the system substantially isothermal during pressure changes of the gas as gas flows into or leaves the container. Attached to the container is a pressure measuring transducer which measures the gas pressure within the container. The rate of change of the gas pressure under isothermal conditions within the container is indicative of the rate of mass flow of the gas into or out of the volumetric container.
Abstract:
An improved flow measuring device, such as a mass flow meter or mass flow controller, providing a high turn-down ratio as compared to prior art devices. In accordance with various embodiments of the invention, a flow sensor includes a sensor flow path that includes one or more restrictions configured to provide the sensor flow path with a non-linear relationship between a pressure drop across the sensor flow path and the flow of fluid through the flow sensor conduit. Such a flow sensor preferably achieves a high turn-down ratio by way of a variable bypass ratio that is directly proportional to the sensor tube mass flow rate so that the turn-down ratio of the mass flow controller will be ideally proportional to the square of the turndown achievable by the flow sensor conduit fluid sensing portion alone. In some embodiments, the restriction can be employed as a part of a fluid seal having an orifice and disposed between a flow sensor portion of a flow meter and a bypass portion of the flow meter.
Abstract:
An improved flow measuring device, such as a mass flow meter or mass flow controller, providing a high turn-down ratio as compared to prior art devices. In accordance with various embodiments of the invention, a flow sensor includes a sensor flow path that includes one or more restrictions configured to provide the sensor flow path with a non-linear relationship between a pressure drop across the sensor flow path and the flow of fluid through the flow sensor conduit. Such a flow sensor preferably achieves a high turn-down ratio by way of a variable bypass ratio that is directly proportional to the sensor tube mass flow rate so that the turn-down ratio of the mass flow controller will be ideally proportional to the square of the turndown achievable by the flow sensor conduit fluid sensing portion alone. In some embodiments, the restriction can be employed as a part of a fluid seal having an orifice and disposed between a flow sensor portion of a flow meter and a bypass portion of the flow meter.
Abstract:
A thermal mass flow meter associated with an inclination sensor that detects an angle of inclination of at least one portion of a thermal mass flow sensor relative to at least one reference axis. Based upon the detected angle of inclination, the output signal of the mass flow meter that is indicative of the mass flow rate of fluid through the sensor may be compensated to account for any inaccuracies relating to the orientation in which the mass flow meter is installed. Inaccuracies for which compensation may be provided include thermal siphoning effects and fluid buoyancy effects. By compensating for such inaccuracies, the mass flow meter may be used in any orientation, and/or may be used in non-inertial (e.g., accelerating) environments. The flow meter may be used as a stand alone device, or incorporated in a thermal mass flow controller.
Abstract:
A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.
Abstract:
A manifold system for enabling a distribution of fluids includes a plurality of individual manifold blocks that can be joined together to form a gas stick. Each manifold block will have a fluid passage way with an entrance port and exit port accessing a common surface. An active component can be mounted to one manifold block, while extending across a port of an adjacent manifold block. An alignment system can be provided to ensure that the entrance and exit ports are positioned in a plane containing the common surface to facilitate sealing.
Abstract:
A mass flow control apparatus comprising a proportional valve upstream of a flow measurement portion, a pressure sensing element fluidly connected to determine a fluid pressure downstream of the flow measurement portion, and a dynamically adjustable variable valve downstream of the flow measurement portion and adjacent to the pressure sensing element connection. Fluid conductance of the variable valve is adjusted according to a control scheme based upon limitations of the flow measurement portion. Integral flow verification may be enabled with additional fluid pathway elements upstream of the flow measurement portion.
Abstract:
A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.
Abstract:
A fluid delivery system includes a manifold plate having an upper surface, four vertical sides, and a lower surface opposite the upper surface, where the manifold plate includes a gas inlet, a gas outlet, and a plurality of component receiving stations, one or more component receiving stations located on the upper surface and two or more component receiving stations located on the lower surface. The manifold plate also includes a plurality of internal fluid passageways interconnecting the gas inlet, the plurality of component receiving stations, and the gas outlet. The system also includes a plurality of active fluid components, one active fluid component coupled to a corresponding one component receiving station on the manifold plate. The fluid delivery system can be configured having a single channel or a dual channel.