公开(公告)号：US20110196646A1

公开(公告)日：2011-08-11

申请号：US13000443

申请日：2009-07-03

申请人： Everhardus Mos ,  Henricus Johannes Lamberttus Megens ,  Maurits Van Der Schaar ,  Hubertus Johannes Gertrudus Simons ,  Scott Anderson Middlebrooks

发明人： Everhardus Mos ,  Henricus Johannes Lamberttus Megens ,  Maurits Van Der Schaar ,  Hubertus Johannes Gertrudus Simons ,  Scott Anderson Middlebrooks

IPC分类号： G06F15/00 ,  G03B27/54

CPC分类号： G03F9/7003 ,  G03F7/705 ,  G03F7/70633

摘要： A lithographic system includes a lithographic apparatus comprising a projection system which projects a patterned radiation beam onto a target portion of a substrate and an alignment system which measures the position of a feature of the pattern on the substrate at a number of locations over the substrate. A controller compares the measured positions with points on a grid of values and extrapolates values for intermediate positions on the substrate based on values of corresponding intermediate points on the grid, so as to provide an indication of the intermediate positions on the substrate and their displacements relative to the grid. The grid is based on at least one orthogonal basis function, the measurement on the substrate being performed at positions corresponding to the root values of the at least one orthogonal basis function.

摘要翻译： 光刻系统包括光刻设备，其包括投影系统，该投影系统将图案化的辐射束投影到基板的目标部分上;以及对准系统，该对准系统在衬底上的多个位置处测量衬底上的图案的特征的位置。 控制器将测量位置与值网格上的点进行比较，并基于栅格上对应的中间点的值来外推基板上的中间位置的值，以便提供基板上的中间位置及其相对位移的指示 到电网。 网格基于至少一个正交基函数，基板上的测量在对应于至少一个正交基函数的根值的位置处执行。