摘要:
A spherically mounted retroreflector (SMR) includes a replicated optic, a substrate, and an adhesive. The replicated optic, which includes a cube-corner retroreflector, has a base area smaller than the retroreflector area. The substrate has a partially spherical outer surface and a cavity sized to accept the replicated optic. An adhesive attaches the optic to the substrate.
摘要:
A dimensional measuring device sends a beam of light to a remote probe having a retroreflector and a pitch/yaw sensor. The pitch/yaw sensor passes the light through an aperture and a lens to a position sensor that generates an electrical signal indicative of the position of the received light. A processor uses the electrical signal to determine a pitch angle and a yaw angle of the remote probe.
摘要:
A dimensional measuring device sends a beam of light to a remote probe having a retroreflector and a pitch/yaw sensor. The pitch/yaw sensor passes the light through an aperture and a lens to a position sensor that generates an electrical signal indicative of the position of the received light. A processor uses the electrical signal to determine a pitch angle and a yaw angle of the remote probe.
摘要:
A spherically mounted retroreflector (SMR) includes a replicated optic, a substrate, and an adhesive. The replicated optic, which includes a cube-corner retroreflector, has a base area smaller than the retroreflector area. The substrate has a partially spherical outer surface and a cavity sized to accept the replicated optic. An adhesive attaches the optic to the substrate.
摘要:
A target and method of manufacturing the target is provided. The method of manufacturing includes providing the cube cornered retroreflector, the cube cornered retroreflector including a first, second and third planar reflectors. Each planar reflector capable of reflecting light, each planar reflector perpendicular to the other two planar reflectors, each planar reflector intersecting the other two planar reflectors in a common vertex, and each planar reflector having two intersection junctions. Each intersection junction shared with an adjacent planar reflector for a total of three intersection junctions within the cube corner retroreflector. The method further including the step of directing ions from a focused ion beam etching (FIBE) device onto the first intersection junction defined by the first planar reflector and second planar reflector. A first material is removed from at least a first portion of the first intersection junction to define a first non-reflecting portion.