公开(公告)号：US20220305584A1

公开(公告)日：2022-09-29

申请号：US17211657

申请日：2021-03-24

Applicant: FEI Company

Inventor： Tomas Gancarcik ,  Ivan Dekan ,  David Krobot ,  Tomas Trnkocy ,  Steven J. Randolph ,  Remco Geurts

IPC: B23K26/12 ,  B23K26/36 ,  B23K26/346 ,  B23K17/00

Abstract: Deposition of debris produced in laser ablation of a workpiece situated in a vacuum chamber is reduced by introduction a background gas into the vacuum chamber prior to or during laser ablation. The background gas can be introduced diffusely into the vacuum chamber and can reduce contamination of surfaces such as a surface of an optical window that faces the workpiece during processing. Directed introduction of a background gas can be used as well and in some cases the same or a different background gas is directed to a workpiece surface at the same or different pressure than that associated with diffuse introduction of the background gas to reduce contamination of the workpiece surface with laser ablation debris.

公开(公告)号：US11380511B2

公开(公告)日：2022-07-05

申请号：US16828571

申请日：2020-03-24

Applicant: FEI Company

Inventor： Kun Liu ,  Steven J. Randolph

IPC: H01J37/075 ,  H01J37/28

Abstract: A charged particle beam source, such as for use in an electron microscope, can include an electrically conductive support member coupled to a base, a mounting member coupled to the support member and defining a bore, and an emitter member received in the bore and retained by a fixative material layer flowed around the emitter member in the bore.

公开(公告)号：US20230011267A1

公开(公告)日：2023-01-12

申请号：US17836611

申请日：2022-06-09

Applicant: FEI Company

Inventor： Kun Liu ,  Steven J. Randolph

IPC: H01J37/075 ,  H01J37/28

Abstract: A charged particle beam source, such as for use in an electron microscope, can include a mounting member defining a first opening at a free end of the mounting member and a bore extending from the first opening into the mounting member along a longitudinal axis of the mounting member. A second opening can be defined in a side wall of the mounting member and can extend between an outer surface of the mounting member and the bore, the second opening being spaced apart from the first opening along the longitudinal axis of the mounting member. An emitter member can be received in the bore and aligned along the longitudinal axis of the mounting member. A fixative material can be received in the bore and in the second opening to retain the emitter member in the bore.

公开(公告)号：US20210305006A1

公开(公告)日：2021-09-30

申请号：US16828571

申请日：2020-03-24

Applicant: FEI Company

Inventor： Kun Liu ,  Steven J. Randolph

IPC: H01J37/075 ,  H01J37/28

Abstract: A charged particle beam source, such as for use in an electron microscope, can include an electrically conductive support member coupled to a base, a mounting member coupled to the support member and defining a bore, and an emitter member received in the bore and retained by a fixative material layer flowed around the emitter member in the bore.