公开(公告)号：US20230312423A1

公开(公告)日：2023-10-05

申请号：US17917880

申请日：2021-04-08

申请人： FERROTEC MATERIAL TECHNOLOGIES CORPORATION

发明人： Wataru YAMAGISHI ,  Kazumasa MORI ,  Shunichi ETO

IPC分类号： C04B35/584 ,  G01R1/073 ,  G01R1/04 ,  C04B35/48

CPC分类号： C04B35/584 ,  G01R1/07371 ,  G01R1/0433 ,  C04B35/48 ,  C04B2235/3244 ,  C04B2235/3873 ,  C04B2235/762 ,  C04B2235/9607 ,  C04B2235/945

摘要： A ceramic containing, in mass %:



Si3N4: 20.0 to 60.0%,
ZrO2: 25.0 to 70.0%,
at least one selected from SiC and AlN: 2.0 to 17.0%, where AlN is 10.0% or less,
at least one selected from MgO, Y2O3, CeO2, CaO, HfO2, TiO2, Al2O3, SiO2, MoO3, CrO, CoO, ZnO, Ga2O3, Ta2O5, NiO and V2O5: 5.0 to 15.0%, wherein Fn calculated from the following equation (1) satisfies 0.02 to 0.40. This ceramic can be laser machined with high efficiency.






Fn=(SiC+3AlN)/(Si3N4+ZrO2)  (1)

公开(公告)号：US20240177974A1

公开(公告)日：2024-05-30

申请号：US18432159

申请日：2024-02-05

申请人： FERROTEC MATERIAL TECHNOLOGIES CORPORATION

发明人： Wataru YAMAGISHI ,  Kazumasa MORI ,  Hitoshi KOUNO ,  Shunichi ETO

IPC分类号： H01J37/32 ,  C04B35/48 ,  C04B35/581 ,  C04B35/583 ,  C04B35/584 ,  H01L21/683

CPC分类号： H01J37/32477 ,  C04B35/48 ,  C04B35/581 ,  C04B35/583 ,  C04B35/584 ,  H01J37/32715 ,  H01L21/6833 ,  C04B2235/3244 ,  C04B2235/3826 ,  C04B2235/386 ,  C04B2235/3865 ,  C04B2235/3873 ,  C04B2235/94

摘要： A wafer support includes a base material including a machinable ceramic, a protective layer covering a surface of the base material, and conductive members and placed at least partially inside the base material. The protective layer includes a material that is less corrodible by plasma than the base material.

公开(公告)号：US20210188714A1

公开(公告)日：2021-06-24

申请号：US16762802

申请日：2018-11-07

申请人： FERROTEC MATERIAL TECHNOLOGIES CORPORATION

发明人： Wataru YAMAGISHI ,  Kazumasa MORI ,  Shunichi ETO

IPC分类号： C04B35/488 ,  G01R1/04 ,  G01R1/073 ,  C04B35/584

摘要： A ceramic contains, in mass percent: Si3N4: 20.0 to 60.0%, ZrO2: 25.0 to 70.0%, and one or more oxides selected from MgO, Y2O3, CeO2, CaO, HfO2, TiO2, Al2O3, SiO2, MoO3, CrO, CoO, ZnO, Ga2O3, Ta2O5, NiO, and V2O5: 5.0 to 15.0%. The ceramic has a coefficient of thermal expansion as high as that of silicon and an excellent mechanical strength, allows fine machining with high precision, and prevents particles from being produced.

公开(公告)号：US20200241047A1

公开(公告)日：2020-07-30

申请号：US16757168

申请日：2018-10-19

申请人： FERROTEC MATERIAL TECHNOLOGIES CORPORATION

发明人： Wataru YAMAGISHI ,  Kazumasa MORI ,  Shunichi ETO

IPC分类号： G01R1/073 ,  C04B35/583 ,  G01R31/28 ,  G01R1/067

摘要： A ceramic according to the present invention includes, in mass %, BN: 20.0 to 55.0%, SiC: 5.0 to 40.0%, ZrO2 and/or Si3N4: 3.0 to 60.0%. The ceramic has a coefficient of thermal expansion at −50 to 500° C. of 1.0×10−6 to 5.0×10−6/° C., is excellent in low electrostatic properties (106 to 1014 Ω·cm in volume resistivity) and free-machining properties, and is thus suitable to be used for, for example, a probe guiding member for guiding probes of a probe card, and a socket for package inspection.