公开(公告)号：US20100123381A1

公开(公告)日：2010-05-20

申请号：US12411797

申请日：2009-03-26

申请人： FU-CHING TUNG ,  Tean-Mu Shen ,  Jung-Chen Ho ,  Pei-Shan Wu ,  Chia-Ming Chen ,  Kuan-Chou Chen ,  Jung-Chen Chien ,  Muh-Wang Liang

发明人： FU-CHING TUNG ,  Tean-Mu Shen ,  Jung-Chen Ho ,  Pei-Shan Wu ,  Chia-Ming Chen ,  Kuan-Chou Chen ,  Jung-Chen Chien ,  Muh-Wang Liang

IPC分类号： H01J17/26

CPC分类号： H01J37/32449 ,  H01J37/3244

摘要： A cathode discharge device is provided. The cathode discharge apparatus includes an anode, a cathode and plural cathode chambers. The cathode is located inside the anode, where the cathode has plural flow channels and at least one flow channel hole, and the plural flow channels are connected to one another through the flow channel hole. The plural cathode chambers are located inside the cathode, wherein each of the cathode chambers has a chamber outlet and a chamber inlet connected with at least one of the flow channels.

摘要翻译： 提供阴极放电装置。 阴极放电装置包括阳极，阴极和多个阴极室。 阴极位于阳极的内部，其中阴极具有多个流动通道和至少一个流动通道孔，并且多个流动通道通过流动通道孔相互连接。 多个阴极室位于阴极内，其中每个阴极室具有腔室出口和与至少一个流动通道连接的室入口。

公开(公告)号：US20090151637A1

公开(公告)日：2009-06-18

申请号：US12129009

申请日：2008-05-29

申请人： CHIH-CHEN CHANG ,  TUNG-CHUAN WU ,  FU-CHING TUNG ,  MUH-WANG LIANG ,  CHING-HUEI WU ,  CHAN-HSING LO ,  TEAN-MU SHEN ,  JUNG-CHEN CHIEN ,  JUNG-CHEN HO

发明人： CHIH-CHEN CHANG ,  TUNG-CHUAN WU ,  FU-CHING TUNG ,  MUH-WANG LIANG ,  CHING-HUEI WU ,  CHAN-HSING LO ,  TEAN-MU SHEN ,  JUNG-CHEN CHIEN ,  JUNG-CHEN HO

IPC分类号： C23C16/00 ,  H01L21/3065

CPC分类号： H05H1/46 ,  H01J37/32192 ,  H01J37/32229 ,  H01J37/32477

摘要： A microwave-excited plasma source using a ridged wave-guide line-type microwave plasma reactor is disclosed. The microwave-excited plasma source comprises a reaction chamber, a ridged wave-guide and a separation plate. The ridged wave-guide is disposed on the reaction chamber, and comprises a frame portion, a ridge portion and a line-shaped slot. The line-shaped slot is disposed on a first side of the frame portion, and the ridge portion facing the line-shaped slot is disposed on a second side of the frame portion. The separation plate is disposed on the line-shaped slot. Moreover, the ridged wave-guide is suitable for concentrating microwave power, which is transmitted to the reaction chamber through the line-shaped slot in order to excite plasma.

摘要翻译： 公开了一种使用脊波导线型微波等离子体反应器的微波激发等离子体源。 微波激发的等离子体源包括反应室，脊波导和分离板。 脊状波导布置在反应室上，包括框架部分，脊部分和线状槽。 线状槽设置在框架部分的第一侧上，并且面向线状槽的脊部设置在框架部分的第二侧上。 分隔板设置在线状槽上。 此外，脊状波导适用于集中微波功率，其通过线状槽传输到反应室以激发等离子体。

公开(公告)号：US20100164381A1

公开(公告)日：2010-07-01

申请号：US12470776

申请日：2009-05-22

申请人： CHIH-CHEN CHANG ,  TUNG-CHUAN WU ,  CHAN-HSING LO ,  CHING-HUEI WU ,  MUH-WANG LIANG ,  FU-CHING TUNG ,  SHIH-CHIN LIN ,  JEN-RONG HUANG

发明人： CHIH-CHEN CHANG ,  TUNG-CHUAN WU ,  CHAN-HSING LO ,  CHING-HUEI WU ,  MUH-WANG LIANG ,  FU-CHING TUNG ,  SHIH-CHIN LIN ,  JEN-RONG HUANG

IPC分类号： H05H1/46

CPC分类号： H05H1/46 ,  H01J37/32192 ,  H01J37/32229

摘要： A long linear-type microwave plasma source using a variably-reduced-height rectangular waveguide as the plasma reactor has been developed. Microwave power is fed from the both sides of the waveguide and is coupled into plasma through a long slot cut on the broad side of the waveguide. The reduced height of the waveguide is variable in order to control the coupling between microwave and plasma so that the plasma uniformity can remain a high quality when extending the length of the linear-type plasma source.

摘要翻译： 已经开发了使用可变降低高度的矩形波导作为等离子体反应器的长线性型微波等离子体源。 微波功率从波导的两侧馈送，并通过在波导的宽侧切割的长槽耦合到等离子体中。 波导的降低的高度是可变的，以便控制微波和等离子体之间的耦合，使得当延伸线性型等离子体源的长度时，等离子体均匀性可以保持高质量。