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    VACUUM APPARATUS OF ROTARY MOTION ENTRY
    1.
    发明申请
    VACUUM APPARATUS OF ROTARY MOTION ENTRY 有权
    旋转运动入口的真空装置

    公开(公告)号：US20110079963A1

    公开(公告)日：2011-04-07

    申请号：US12615811

    申请日：2009-11-10

    申请人： Kuan-Chou Chen ,  Fu-Ching Tung ,  Chia-Ming Chen ,  Pei-Shan Wu ,  Tean-Mu Shen ,  Jung-Chen Ho

    发明人： Kuan-Chou Chen ,  Fu-Ching Tung ,  Chia-Ming Chen ,  Pei-Shan Wu ,  Tean-Mu Shen ,  Jung-Chen Ho

    IPC分类号： F16C33/10 ,  F16J15/32

    CPC分类号： F16C33/76 ,  F16C2300/62 ,  Y10S277/913

    摘要： A vacuum apparatus of rotary motion entry is disclosed, which comprises: a shaft sleeve, disposed on a cavity wall of a vacuum system; a rotary shaft, ensheathed by the shaft sleeve; and a transmission set, connected to the rotary shaft for driving the same; wherein, the rotary shaft is disposed passing through a hole formed on the base of the shaft sleeve while there are a first bearing, a second bearing, a sealing ring and a shaft seal being arranged separately inside the hole. Moreover, the shaft seal has a flake-like lip flange formed extending toward the center of the hole, that is capable of being extended away from the vacuum system by the inserting of the rotary shaft into the hole, and thereby, enabling the lip flange to engage with the rotary shaft tightly by the atmospheric pressure and thus isolating the outside world from the vacuum system.

    摘要翻译： 公开了一种旋转运动进入的真空装置，其包括：设置在真空系统的空腔壁上的轴套; 旋转轴，由轴套套管; 以及与驱动该旋转轴的旋转轴连接的变速器组; 其特征在于，所述旋转轴设置成穿过形成在所述轴套的基部上的孔，同时在所述孔内分开设置有第一轴承，第二轴承，密封环和轴密封件。 此外，轴密封件具有形成为朝向孔中心延伸的片状唇缘凸缘，其能够通过将旋转轴插入孔而远离真空系统延伸，从而使得唇缘凸缘 与大气压力紧密地与旋转轴啮合，从而将外界与真空系统隔离开来。

    GAS SHOWER MODULE
    2.
    发明申请
    GAS SHOWER MODULE 审中-公开
    气体淋浴模块

    公开(公告)号：US20100126418A1

    公开(公告)日：2010-05-27

    申请号：US12369990

    申请日：2009-02-12

    申请人： Ming-Tung CHIANG ,  Jung-Chen Chien ,  Jung-Chen Ho ,  Chih-Yung Huang

    发明人： Ming-Tung CHIANG ,  Jung-Chen Chien ,  Jung-Chen Ho ,  Chih-Yung Huang

    IPC分类号： C23C16/54

    CPC分类号： C23C16/45565 ,  C23C16/45559 ,  C23C16/45561

    摘要： A gas shower module for gas deposition chamber with gas channel is disclosed, which comprises: a distributor with at least one diffusion cell positioned therein along first axial direction and a plurality of inlets respectively connecting to the gas channel and the diffusion cell; and a shower with at least one shower channel positioned therein along second axial direction, gas-inlet passages connected to the diffusion cell and the shower channel, and gas-outlet passages connected to the shower channel and gas deposition chamber; wherein the distributor is connected to the shower so that the diffusion cell will be connected to the shower channel through gas-inlet passages and the first axial direction is not be parallel to the second axial direction.

    摘要翻译： 公开了一种具有气体通道的气体沉积室的气体淋浴组件，其包括：分配器，其具有沿着第一轴向方向定位在其中的至少一个扩散单元和分别连接到气体通道和扩散单元的多个入口; 以及具有沿着第二轴向位于其中的至少一个淋浴通道的淋浴，连接到扩散池和淋浴通道的气体入口通道，以及连接到淋浴通道和气体沉积室的气体出口通道; 其中所述分配器连接到所述淋浴器，使得所述扩散单元将通过气体入口通道连接到所述淋浴通道，并且所述第一轴向方向不平行于所述第二轴向方向。

    PLASMA ENHANCED ATOMIC LAYER DEPOSITION APPARATUS AND THE CONTROLLING METHOD THEREOF
    3.
    发明申请
    PLASMA ENHANCED ATOMIC LAYER DEPOSITION APPARATUS AND THE CONTROLLING METHOD THEREOF 审中-公开
    等离子体增强原子层沉积装置及其控制方法

    公开(公告)号：US20120070590A1

    公开(公告)日：2012-03-22

    申请号：US12970403

    申请日：2010-12-16

    申请人： Jen-Rong Huang ,  Tean-Mu Shen ,  Kang-Feng Lee ,  Chin-Chong Chiang ,  Sheng-Lang Lee ,  Jung-Chen Ho ,  Ching-Chiun Wang

    发明人： Jen-Rong Huang ,  Tean-Mu Shen ,  Kang-Feng Lee ,  Chin-Chong Chiang ,  Sheng-Lang Lee ,  Jung-Chen Ho ,  Ching-Chiun Wang

    IPC分类号： C23C16/448 ,  C23C16/02

    CPC分类号： C23C16/45536 ,  C23C16/45551

    摘要： This prevent disclosure provides a plasma enhanced atomic layer deposition apparatus and the controlling method thereof. The plasma enhanced atomic layer deposition apparatus includes: a plurality of reaction chambers, each of the reaction chambers having a first reaction space and a second reaction space; an adjustable partition unit controlled to separate or communicate the first and the second reaction spaces; and a plurality of heating carriers respectively disposed in the plurality of reaction chambers. The method manipulates the movement of the partition plate, leading to separation or communication between the first and second reaction spaces, so as to avoid the interference or inter-reaction between process gases and the resultant particles contaminating the substrates.

    摘要翻译： 这种防止公开提供等离子体增强原子层沉积装置及其控制方法。 等离子体增强原子层沉积装置包括：多个反应室，每个反应室具有第一反应空间和第二反应空间; 被调节以分离或通信第一和第二反应空间的可调分隔单元; 以及分别设置在多个反应室中的多个加热载体。 该方法操纵分隔板的运动，导致第一和第二反应空间之间的分离或连通，以避免处理气体和所得颗粒污染基板之间的干扰或相互作用。

    TRANSMISSION MECHANISM AND THE DEPOSITION APPARATUS USING THE SAME
    5.
    发明申请
    TRANSMISSION MECHANISM AND THE DEPOSITION APPARATUS USING THE SAME 审中-公开
    传输机制和使用它的沉积装置

    公开(公告)号：US20120240855A1

    公开(公告)日：2012-09-27

    申请号：US13177006

    申请日：2011-07-06

    申请人： Chen-Chung Du ,  Ming-Tung Chiang ,  Muh-Wang Liang ,  Kuan-Chou Chen ,  Tean-Mu Shen ,  Jung-Chen Ho

    发明人： Chen-Chung Du ,  Ming-Tung Chiang ,  Muh-Wang Liang ,  Kuan-Chou Chen ,  Tean-Mu Shen ,  Jung-Chen Ho

    IPC分类号： C23C16/50 ,  F16H57/00

    CPC分类号： C23C14/564 ,  C23C14/568 ,  C23C16/4401 ,  C23C16/54 ,  Y10T74/19642

    摘要： The deposition apparatus has a plurality of said transmission mechanisms arranged therein in a symmetrical manner. Each transmission mechanism comprises: a drive shaft, formed with a tapered end; a driving wheel, configured with a shaft hole for the tapered end to bore coaxially therethrough; a plurality of slide pieces, radially mounted to the driving wheel; a first elastic member, mounted enabling the plural slide pieces to be ensheathed thereby; a second elastic member, disposed between the first elastic member and the first axial end of the drive shaft while being mounted to the periphery of the driving wheel; an enclosure, configured with an opening; wherein, the driving wheel that is moving in a reciprocating manner drives the sliding pieces to slide in radial directions, thereby, causing the outer diameter of the first elastic member to change accordingly and enabling the opening of the enclosure to open or close in consequence.

    摘要翻译： 沉积装置具有以对称的方式布置在其中的多个所述传动机构。 每个传动机构包括：形成有锥形端的驱动轴; 驱动轮，其构造有用于锥形端轴同轴地穿过其中的轴孔; 多个滑动件，径向安装在驱动轮上; 第一弹性构件，其安装成使得能够使多个滑动件嵌套; 第二弹性构件，其安装在所述第一弹性构件和所述驱动轴的所述第一轴向端之间，同时安装到所述驱动轮的周边; 一个配有开口的外壳; 其中，以往复方式移动的驱动轮驱动滑动件在径向方向上滑动，从而使第一弹性构件的外径相应地变化，从而能够打开或关闭外壳。

    PLASMA PROCESSING APPARATUS
    7.
    发明申请
    PLASMA PROCESSING APPARATUS 审中-公开
    等离子体加工设备

    公开(公告)号：US20120132366A1

    公开(公告)日：2012-05-31

    申请号：US13157878

    申请日：2011-06-10

    申请人： Pei-Shan Wu ,  Fu-Ching Tung ,  Jung-Chen Ho ,  Tean-Mu Shen ,  Chia-Ming Chen

    发明人： Pei-Shan Wu ,  Fu-Ching Tung ,  Jung-Chen Ho ,  Tean-Mu Shen ,  Chia-Ming Chen

    IPC分类号： C23F1/08 ,  C23C16/50 ,  C23C16/455

    CPC分类号： H01J37/3244 ,  C23C16/45565 ,  C23C16/45574 ,  C23C16/45578 ,  C23C16/50 ,  C23C16/513 ,  H01J37/32357

    摘要： A plasma processing apparatus is disclosed, which includes: a cathode module comprising a plurality of first channels which generate plasma; an anode having a chamber which contains the cathode and having at least one plasma outlet corresponding to the first channels; an electrode connected to a high-frequency electrical power and the cathode; and a plurality of second channels penetrating through the anode; wherein each first channel and each second channel are disposed alternately. A first gas is introduced into the first channels ionized under high frequency electrical power. In the first channels, the free electrons collided brings high density of plasma. The generated plasma is expelled through the plasma outlet to form a plasma diffusion region. A second gas is introduced into the plasma diffusion region through the second channels to take part in the reaction of plasma.

    摘要翻译： 公开了一种等离子体处理装置，其包括：阴极模块，包括产生等离子体的多个第一通道; 阳极，其具有容纳阴极并具有至少一个对应于第一通道的等离子体出口的室; 连接到高频电源的电极和阴极; 和穿过阳极的多个第二通道; 其中每个第一通道和每个第二通道交替设置。 将第一气体引入到在高频电力下离子化的第一通道。 在第一个通道中，自由电子碰撞带来了高密度的等离子体。 产生的等离子体通过等离子体出口排出以形成等离子体扩散区域。 通过第二通道将第二气体引入等离子体扩散区域以参与等离子体的反应。

    Vacuum apparatus of rotary motion entry
    8.
    发明授权
    Vacuum apparatus of rotary motion entry 有权
    旋转运动进入真空装置

    公开(公告)号：US08146923B2

    公开(公告)日：2012-04-03

    申请号：US12615811

    申请日：2009-11-10

    申请人： Kuan-Chou Chen ,  Fu-Ching Tung ,  Chia-Ming Chen ,  Pei-Shan Wu ,  Tean-Mu Shen ,  Jung-Chen Ho

    发明人： Kuan-Chou Chen ,  Fu-Ching Tung ,  Chia-Ming Chen ,  Pei-Shan Wu ,  Tean-Mu Shen ,  Jung-Chen Ho

    IPC分类号： F16J15/54

    CPC分类号： F16C33/76 ,  F16C2300/62 ,  Y10S277/913

    摘要： A vacuum apparatus of rotary motion entry is disclosed, which comprises: a shaft sleeve, disposed on a cavity wall of a vacuum system; a rotary shaft, ensheathed by the shaft sleeve; and a transmission set, connected to the rotary shaft for driving the same; wherein, the rotary shaft is disposed passing through a hole formed on the base of the shaft sleeve while there are a first bearing, a second bearing, a sealing ring and a shaft seal being arranged separately inside the hole. Moreover, the shaft seal has a flake-like lip flange formed extending toward the center of the hole, that is capable of being extended away from the vacuum system by the inserting of the rotary shaft into the hole, and thereby, enabling the lip flange to engage with the rotary shaft tightly by the atmospheric pressure and thus isolating the outside world from the vacuum system.

    摘要翻译： 公开了一种旋转运动进入的真空装置，其包括：设置在真空系统的空腔壁上的轴套; 旋转轴，由轴套套管; 以及与驱动该旋转轴的旋转轴连接的变速器组; 其特征在于，所述旋转轴设置成穿过形成在所述轴套的基部上的孔，同时在所述孔内分开设置有第一轴承，第二轴承，密封环和轴密封件。 此外，轴密封件具有形成为朝向孔中心延伸的片状唇缘凸缘，其能够通过将旋转轴插入孔而远离真空系统延伸，从而使得唇缘凸缘 与大气压力紧密地与旋转轴啮合，从而将外界与真空系统隔离开来。

    Diaphragm valve
    10.
    发明授权
    Diaphragm valve 失效
    隔膜阀

    公开(公告)号：US06854713B2

    公开(公告)日：2005-02-15

    申请号：US10394001

    申请日：2003-03-24

    申请人： Chun-Hung Lin ,  Chen-Der Tsai ,  Chin-Ching Wu ,  Jung-Chen Ho ,  Hann-Tsong Wang

    发明人： Chun-Hung Lin ,  Chen-Der Tsai ,  Chin-Ching Wu ,  Jung-Chen Ho ,  Hann-Tsong Wang

    IPC分类号： F16K1/42 ,  F16K7/16 ,  F16K7/12

    CPC分类号： F16K7/16 ,  F16K1/425

    摘要： The diaphragm valve uses a metal dish-type diaphragm set to control the inflow and outflow of fluid. The metal dish-type diaphragm set is above an air flow channel to control the stem above the metal dish-type diaphragm set, and the air will be blocked by pressing the metal dish-type diaphragm to make it fit the metal valve base in the air flow channel; this non-metal valve base is fixed in the air flow channel by a fixed shrunk ring with a taper cross section, and the in-between metal diaphragm in the metal dish-type diaphragm set is annular in the center to reduce the metallic friction between metal diaphragms, to increase application times and to lower the leakage rate of the diaphragm valve.

    摘要翻译： 隔膜阀采用金属盘式隔膜套来控制流体的流入和流出。 金属盘式隔膜组件位于空气流通道上方，用于控制金属盘式隔膜组件上方的杆，空气将通过按压金属盘型隔膜而阻塞，使其与金属阀座底座相配合 气流通道; 该非金属阀座通过具有锥形横截面的固定收缩环固定在空气流动通道中，并且金属盘形隔膜组中的金属隔膜在中心是环形的，以减少金属间的金属摩擦 金属隔膜，以增加施工时间并降低隔膜阀的泄漏率。