公开(公告)号：US20230266675A1

公开(公告)日：2023-08-24

申请号：US18310573

申请日：2023-05-02

Applicant: FUJIFILM Corporation

Inventor： Shinichi SUGIYAMA ,  Takashi NAKAMURA

IPC: G03F7/20 ,  G03F7/039 ,  G03F7/00

CPC classification number: G03F7/70608 ,  G03F7/0397 ,  G03F7/70681 ,  H01L21/0273

Abstract: Provided is an inspection method for simply measuring an ultra-small foreign substance in a composition selected from the group consisting of an actinic ray-sensitive or radiation-sensitive composition and a thermosetting composition. In addition, provided are a method for producing a composition and a method for verifying a composition, using the inspection method. The inspection method is an inspection method for a composition selected from the group consisting of an actinic ray-sensitive or radiation-sensitive composition and a thermosetting composition, the inspection method including a step X1 for applying the composition to a substrate X to form a coating film, a step X2 for removing the coating film from the substrate X using a removal solvent including an organic solvent, and a step X3 for measuring the number of defects on the substrate X after the removal of the coating film using a defect inspection device. In a case where the composition is the actinic ray-sensitive or radiation-sensitive composition, the step X2 is applied in a state where the coating film has not been subjected to an exposure treatment by irradiation with actinic rays or radiation, and in a case where the composition is the thermosetting composition, the step X2 is applied in a state where the coating film has not been subjected to a thermosetting treatment.

公开(公告)号：US20190258165A1

公开(公告)日：2019-08-22

申请号：US16402215

申请日：2019-05-02

Applicant: FUJIFILM Corporation

Inventor： Takashi NAKAMURA ,  Tetsuya KAMIMURA ,  Satomi TAKAHASHI

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/20 ,  G03F7/16

Abstract: An object of the present invention is to provide a chemical liquid which makes it possible to form a thinner resist film having a uniform thickness on a substrate by using a small amount of resist composition and demonstrates excellent defect inhibition performance. Another object of the present invention is to provide a pattern forming method. A chemical liquid of the present invention contains a mixture of two or more kinds of organic solvents, in which the organic solvents are selected from the group consisting of compounds represented by Formulae (1) to (7), compounds represented by Formulae (9) to (11), a 3- to 5-membered cyclic ketone compound that may have a substituent, a cyclic ketone compound with 6 or more members that may have a substituent, a lactone compound, and a lactam compound, the chemical liquid contains or does not contain an ether-based compound other than the compounds represented by Formula (1), Formula (5), Formula (7), and Formulae (9) to (11), and in a case where the chemical liquid contains the ether-based compound, a content of the ether-based compound in the chemical liquid is less than 10 mass ppm with respect to a total mass of the chemical liquid.

公开(公告)号：US20160033870A1

公开(公告)日：2016-02-04

申请号：US14884345

申请日：2015-10-15

Applicant: FUJIFILM CORPORATION

Inventor： Takashi NAKAMURA ,  Tsukasa YAMANAKA

IPC: G03F7/38 ,  G03F7/20 ,  G03F7/32 ,  G03F7/16

CPC classification number: G03F7/38 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2041 ,  G03F7/325

Abstract: A pattern formation method which includes a process of forming an actinic ray sensitive or radiation sensitive film by coating a substrate with an actinic ray sensitive or radiation sensitive resin composition which contains a resin where the degree of solubility with respect to a developer which includes one or more types of organic solvents decreases due to an effect of an acid, a compound which generates an acid by irradiation with actinic rays or radiation, and a solvent, a process of exposing the actinic ray sensitive or radiation sensitive film via an immersion liquid, a process of heating the actinic ray sensitive or radiation sensitive film, and a process of developing the actinic ray sensitive or radiation sensitive film using the developer which includes an organic solvent in this order, in which a process of cleaning the actinic ray sensitive or radiation sensitive film is included after the film forming process and before the exposing process and/or after the exposing process and before the heating process.

Abstract translation: 一种图形形成方法，其包括通过用包含树脂的光化射线敏感或辐射敏感性树脂组合物涂布基材来形成光化射线敏感或辐射敏感膜的方法，其中相对于显影剂的溶解度包括一种或 更多类型的有机溶剂由于酸，通过用光化射线或辐射照射而产生酸的化合物和溶剂的作用而降低，溶剂，通过浸渍液曝露光化学敏感或辐射敏感膜的方法， 加热光化射线敏感或辐射敏感膜的方法，以及使用包括有机溶剂的显影剂依次显影光化射线敏感或辐射敏感膜的过程，其中清洁光化学射线敏感或辐射敏感膜的过程 在成膜过程之后和曝光过程之前和/或曝光过程之后包括胶片 ss和加热过程之前。