公开(公告)号：US20240049386A1

公开(公告)日：2024-02-08

申请号：US18360061

申请日：2023-07-27

Applicant: Fujifilm Corporation

Inventor： Akio KATAYAMA ,  Takashi ARIDOMI

IPC: H05K1/09 ,  C08K7/04 ,  C08K3/08 ,  H05K1/03 ,  H05K3/28

CPC classification number: H05K1/09 ,  C08K7/04 ,  C08K3/08 ,  H05K1/0346 ,  H05K3/28 ,  C08K2003/0806 ,  C08K2201/001 ,  C08K2201/011 ,  H05K2201/0154 ,  H05K2201/068

Abstract: An object of the present invention is to provide a laminate excellent in a shape stability of a conductive pattern and excellent in transparency even after heating. There is provided a laminate including a base material and a conductive pattern containing a metal nanobody and a resin, where a total light transmittance of the base material is 75% or more, and a glass transition temperature of the base material is 120° C. or higher, and provided an electronic device including the laminate. The glass transition temperature of the base material is preferably 200° C. or higher, and the coefficient of thermal expansion of the base material at 100° C. to 200° C. is preferably 10×10−6 (/K) or more and 50×10−6 (/K) or less.

公开(公告)号：US20230305403A1

公开(公告)日：2023-09-28

申请号：US18057495

申请日：2022-11-21

Applicant: FUJIFILM Corporation

Inventor： Akio KATAYAMA ,  Soji ISHIZAKA ,  Morimasa SATO

IPC: G03F7/095 ,  G03F7/20 ,  G03F7/26

CPC classification number: G03F7/095 ,  G03F7/26 ,  G03F7/2022

Abstract: Provided are a pattern forming method which includes a step of preparing a laminate having a first photosensitive layer, a substrate having a region transparent to an exposure wavelength, and a second photosensitive layer in this order, a step of exposing the first photosensitive layer, a step of exposing the second photosensitive layer, a step of developing the exposed first photosensitive layer to form a first resin pattern, and a step of developing the exposed second photosensitive layer to form a second resin pattern, and in which a dominant wavelength λ1 of an exposure wavelength in the step of exposing the first photosensitive layer and a dominant wavelength λ2 of an exposure wavelength in the step of exposing the second photosensitive layer satisfy a relation of λ1 ≠ λ2, a laminate, and applications of these.

公开(公告)号：US20220400553A1

公开(公告)日：2022-12-15

申请号：US17751817

申请日：2022-05-24

Applicant: FUJIFILM Corporation

Inventor： Akio KATAYAMA ,  Morimasa SATO

IPC: H05K3/06 ,  G03F7/40 ,  G03F7/20

Abstract: There are provided a manufacturing method for a substrate having a conductive pattern, a manufacturing method for an electronic device, and a substrate having a conductive pattern, which are excellent in the dimensional stability of the conductive pattern after applying an electric current, as well as a protective film for a metal nanobody.
Provided are the manufacturing method for a substrate having a conductive pattern, comprising a step 1a of forming a conductive layer a containing a metal nanobody and a resin 1 on a substrate; a step 1b of forming a resin layer b containing a resin 2 on the conductive layer a; a step 2a of forming a photosensitive resin layer c on the resin layer b; a step 3 of obtaining a resin pattern c′ of the photosensitive resin layer by exposure and development treatment on the photosensitive resin layer c; a step 4 of removing the metal nanobody in the conductive layer a by etching to form a conductive pattern d; and a step 5a of softening or swelling at least one of the resin 1 or the resin 2, the manufacturing method for an electronic device, the substrate having a conductive pattern, and the protective film for a metal nanobody.