NANOIMPRINTING METHOD
    2.
    发明申请
    NANOIMPRINTING METHOD 审中-公开
    纳米法

    公开(公告)号:US20130292877A1

    公开(公告)日:2013-11-07

    申请号:US13932688

    申请日:2013-07-01

    Abstract: A mold equipped with a substrate having a fine pattern of protrusions and recesses and a mold release layer formed along the pattern of protrusions and recesses on the surface thereof is employed to press resist coated on a substrate, to form a resist pattern, to which the pattern of protrusions and recesses is transferred. The thickness of the mold release layer and the pressing force with which the mold is pressed against the resist are controlled such that the line width of the resist pattern becomes a desired value. The width of the lines of the resist pattern is controlled by this configuration.

    Abstract translation: 采用具有突起和凹陷的精细图案的基板和沿其表面上的突起和凹陷的图案形成的脱模层的模具来压制涂覆在基板上的抗蚀剂,以形成抗蚀剂图案, 转移突起和凹陷的图案。 控制脱模层的厚度和将模具压在抗蚀剂上的压力使得抗蚀剂图案的线宽变为期望值。 通过该结构来控制抗蚀剂图案的线的宽度。

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