公开(公告)号：US20140213704A1

公开(公告)日：2014-07-31

申请号：US14229419

申请日：2014-03-28

Applicant: FUJIFILM Corporation

Inventor： Ichiro AMASAKI ,  Keizo KIMURA

IPC: C07D403/04 ,  C08K5/3492 ,  C07D409/14 ,  C07D403/14 ,  C07D417/04 ,  C07D413/04

CPC classification number: C07D403/04 ,  C07D403/14 ,  C07D409/14 ,  C07D413/04 ,  C07D417/04 ,  C08K5/34926

Abstract: A compound represented by the following general formula (1), in the general formula (1), X1a and X1b represent a hydrogen atom or a substituent, Y1 represents a substituent having a dissociative proton, Z1a and Z1b each independently represent heteroatom or a carbon atom, Q1 represents an atomic group which is required to form an aromatic heterocycle together with Z1a and Z1b.

Abstract translation: 由通式（1）中的下列通式（1）表示的化合物，X1a和X1b表示氢原子或取代基，Y1表示具有解离性质子的取代基，Z1a和Z1b各自独立地表示杂原子或碳 原子，Q1表示与Z1a和Z1b一起形成芳族杂环所需的原子团。

公开(公告)号：US20230094960A1

公开(公告)日：2023-03-30

申请号：US18058763

申请日：2022-11-24

Applicant: FUJIFILM Corporation

Inventor： Ichiro AMASAKI ,  Keizo KIMURA ,  Daisuke SASAKI ,  Yukio TANI

IPC: C08K5/45 ,  C07D413/14 ,  C07D409/14 ,  C08K5/357 ,  G02B1/04

Abstract: The present disclosure provides a composition containing a compound represented by General Formula (1) and a polymer compound, in which a content of a chloride ion is less than 1.5 ppm with respect to a total mass of the composition, and provides a compound. In General Formula (1), Het1 represents a divalent aromatic heterocyclic residue of a 5-membered ring or a 6-membered ring, Xa, Xb, Xc, and Xd each independently represent a heteroatom, Ya, Yb, Yc, Yd, Ye and Yf each independently represent a heteroatom or a carbon atom, and two 6-membered rings bonded to Het1 each independently may have a double bond.

公开(公告)号：US20140213703A1

公开(公告)日：2014-07-31

申请号：US14229187

申请日：2014-03-28

Applicant: FUJIFILM Corporation

Inventor： Ichiro AMASAKI ,  Keizo KIMURA

IPC: C08K5/3492

CPC classification number: C08K5/34926 ,  C07D251/24 ,  C07D409/14 ,  C08K5/3492

Abstract: There is provided a new triazine-based compound which is useful as an ultraviolet absorber having excellent light resistance, heat resistance and ultraviolet ray shielding effect. A compound represented by the following general formula (1), in the general formula (1), L1 represents a divalent to decavalent aromatic ring residue or a divalent to decavalent heterocycle residue, n1 represents an integer of 2 to 10, X1 represents a hydrogen atom or a substituent, R1a, R1b, R1c and R1d each independently represent a hydrogen atom or a substituent and may be bonded to each other to form a ring.

Abstract translation: 提供了一种新的三嗪基化合物，其可用作具有优异的耐光性，耐热性和紫外线屏蔽效果的紫外线吸收剂。 由通式（1）中的通式（1）表示的化合物，L1表示二价至十价芳香环残基或二价至十价杂环残基，n1表示2〜10的整数，X1表示氢 原子或取代基，R1a，R1b，R1c和R1d各自独立地表示氢原子或取代基，并且可以彼此键合形成环。

公开(公告)号：US20140084578A1

公开(公告)日：2014-03-27

申请号：US14036166

申请日：2013-09-25

Applicant: FUJIFILM Corporation

Inventor： Kazunari YAGI ,  Shinya HAYASHI ,  Yutaro NORIZUKI ,  Takashi IIZUMI ,  Ichiro AMASAKI ,  Hiroshi YAMADA ,  Shigeaki TANAKA

IPC: C09D11/00 ,  B41J2/175

CPC classification number: C09D11/328 ,  B41J2/17503 ,  C09B31/153 ,  C09D11/40

Abstract: There is provided a compound represented by the following formula (1): wherein each of R1a to R1k independently represents a hydrogen atom or a monovalent substituent, the substituents may combine with each other to form a ring, each of M1a and M1b independently represents a hydrogen atom or a monovalent counter cation, Y1 represents a nitrogen atom or a carbon atom having a hydrogen atom or monovalent substituent, A1 represents an aromatic group, and the aromatic group represented by A1 may contain a heteroatom or may have a substituent.

Abstract translation: 提供由下式（1）表示的化合物：其中R1a至R1k各自独立地表示氢原子或一价取代基，取代基可以相互结合形成环，M1a和M1b各自独立地表示 氢原子或一价抗衡阳离子，Y1表示氮原子或具有氢原子或一价取代基的碳原子，A1表示芳香族基，由A1表示的芳香族基可以含有杂原子，也可以具有取代基。