公开(公告)号：US20150370036A1

公开(公告)日：2015-12-24

申请号：US14825255

申请日：2015-08-13

Applicant: FUJIFILM Corporation

Inventor： Shiki UEKI

IPC: G02B7/183

CPC classification number: G02B7/183 ,  F24S23/81 ,  F24S25/20 ,  G02B5/10 ,  Y02E10/47

Abstract: A reflecting mirror for solar radiation collection includes a film mirror and a frame-shaped support member adapted to support a peripheral edge of the film mirror. The film mirror has a film thickness of 0.10 to 0.30 mm, and the support member is in contact with the film mirror and has a curved face which is convexed outward in a horizontal direction with respect to an opening face of the support member, with the curved face having a radius of curvature of not less than 8 mm. The reflecting mirror for solar radiation collection has a good heat resistance, involves less warpage of a film mirror, and predominates in specular reflectivity and light-collecting characteristics.

Abstract translation: 用于太阳辐射收集的反射镜包括胶片镜和适于支撑胶片镜的周缘的框状支撑件。 薄膜反射镜的膜厚为0.10〜0.30mm，支撑部件与薄膜反射镜相接触，并且具有相对于支撑部件的开口面在水平方向向外凸出的曲面， 具有不小于8mm的曲率半径的曲面。 用于太阳辐射收集的反射镜具有良好的耐热性，涉及较少的胶片镜的翘曲，并且在镜面反射率和聚光特性方面占优势。

公开(公告)号：US20150338624A1

公开(公告)日：2015-11-26

申请号：US14816497

申请日：2015-08-03

Applicant: FUJIFILM Corporation

Inventor： Shiki UEKI

IPC: G02B19/00 ,  G02B5/08 ,  G02B1/14 ,  G02B7/183

CPC classification number: G02B19/0042 ,  B32B7/12 ,  B32B15/08 ,  B32B2255/10 ,  B32B2255/205 ,  B32B2307/416 ,  B32B2551/08 ,  F24S23/82 ,  F24S25/20 ,  G02B1/14 ,  G02B5/085 ,  G02B5/0875 ,  G02B7/182 ,  G02B7/183 ,  G02B19/0019 ,  Y02E10/47 ,  Y02E10/52

Abstract: A reflecting mirror for solar radiation collection includes: a film mirror for solar radiation collection having a polygonal shape and including a resin substrate, a metallic reflective layer and a surface covering layer; and a support member having a frame shape and adapted to support a peripheral edge of the film mirror.

Abstract translation: 一种用于太阳辐射收集的反射镜包括：具有多边形形状并包括树脂基板，金属反射层和表面覆盖层的用于太阳辐射收集的膜反射镜; 以及支撑构件，其具有框架形状并且适于支撑所述胶片镜的外围边缘。

公开(公告)号：US20130326874A1

公开(公告)日：2013-12-12

申请号：US13968664

申请日：2013-08-16

Applicant: FUJIFILM Corporation

Inventor： Shiki UEKI ,  Takeshi HAMA ,  Takeyoshi KANO

IPC: H05K3/46

CPC classification number: H05K3/4685 ,  H05K3/108 ,  H05K3/421 ,  H05K3/423 ,  H05K3/4652 ,  Y10T29/49128 ,  Y10T29/49147 ,  Y10T29/49155 ,  Y10T29/49165

Abstract: A method for producing a multilayer substrate involves: a base-material pretreatment step in which a hole forming step and a metal adhesion step are performed in no particular order, the hole forming step being a step of subjecting a core base material having at least an insulating layer and a first metal layer to a hole opening process, the metal adhesion step being a step in which a predetermined metal or metal ion is made to adhere to the other surface of the insulating layer; a desmearing step of performing desmearing by plasma etching; a cleaning step of cleaning the core base material by using an acidic solution; and a plating step of applying a plating catalyst or a precursor thereof onto the insulating layer and performing plating.

Abstract translation: 制造多层基板的方法包括：基材预处理步骤，其中孔形成步骤和金属粘合步骤以特定顺序进行，所述孔形成步骤是将具有至少一个 绝缘层和第一金属层进行开孔处理，金属粘合步骤是使预定的金属或金属离子粘附到绝缘层的另一个表面的步骤; 通过等离子体蚀刻进行去污的脱蜡步骤; 通过使用酸性溶液清洗核心基材的清洗步骤; 以及将电镀催化剂或其前体施加到绝缘层上并进行电镀的电镀步骤。