公开(公告)号：US20140234761A1

公开(公告)日：2014-08-21

申请号：US14261896

申请日：2014-04-25

Applicant: FUJIFILM Corporation

Inventor： Michihiro SHIRAKAWA ,  Keita KATO ,  Tadahiro ODANI ,  Atsushi NAKAMURA ,  Hidenori TAKAHASHI ,  Kaoru IWATO

IPC: G03F7/095 ,  G03F7/30

CPC classification number: G03F7/095 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/091 ,  G03F7/094 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325 ,  H01L21/0271

Abstract: A pattern forming method contains: (i) a step of forming a first film on a substrate by using a first resin composition (I), (ii) a step of forming a second film on the first film by using a second resin composition (II) different from the resin composition (I), (iii) a step of exposing a multi-layered film having the first film and the second film, and (iv) a step of developing the first film and the second film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 图案形成方法包括：（i）通过使用第一树脂组合物（I）在基材上形成第一膜的步骤，（ii）通过使用第二树脂组合物在第一膜上形成第二膜的步骤 II），（iii）暴露具有第一膜和第二膜的多层膜的步骤，和（iv）在暴露的第一膜和第二膜中显影第一膜和第二膜的步骤 通过使用含有机溶剂的显影剂形成负图案的多层膜。

公开(公告)号：US20150248056A1

公开(公告)日：2015-09-03

申请号：US14713215

申请日：2015-05-15

Applicant: FUJIFILM Corporation

Inventor： Michihiro SHIRAKAWA ,  Keita KATO ,  Tadahiro ODANI ,  Atsushi NAKAMURA ,  Hidenori TAKAHASHI ,  Kaoru IWATO

IPC: G03F7/095 ,  G03F7/075 ,  G03F7/038

CPC classification number: G03F7/095 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/091 ,  G03F7/094 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325 ,  H01L21/0271

Abstract: A pattern forming method contains: (i) a step of forming a first film on a substrate by using a first resin composition (I), (ii) a step of forming a second film on the first film by using a second resin composition (II) different from the resin composition (I), (iii) a step of exposing a multi-layered film having the first film and the second film, and (iv) a step of developing the first film and the second film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 图案形成方法包括：（i）通过使用第一树脂组合物（I）在基材上形成第一膜的步骤，（ii）通过使用第二树脂组合物在第一膜上形成第二膜的步骤 II），（iii）暴露具有第一膜和第二膜的多层膜的步骤，和（iv）在暴露的第一膜和第二膜中显影第一膜和第二膜的步骤 通过使用含有机溶剂的显影剂形成负图案的多层膜。

公开(公告)号：US20140242359A1

公开(公告)日：2014-08-28

申请号：US14268512

申请日：2014-05-02

Applicant: FUJIFILM CORPORATION

Inventor： Atsushi NAKAMURA ,  Tadahiro ODANI

IPC: G03F7/40

CPC classification number: G03F7/40 ,  G03F7/0397 ,  G03F7/325 ,  G03F7/405 ,  Y10T428/24851

Abstract: Provided is a method of forming a pattern, including (a) forming, into a film, an actinic-ray- or radiation-sensitive resin composition comprising a resin that when acted on by an acid, increases its polarity and a compound that when exposed to actinic rays or radiation, generates an acid, (b) exposing the film to light, (c) developing the exposed film with a developer comprising an organic solvent to thereby form a negative pattern, and (d) coating the pattern with a composition comprising a resin comprising any of repeating units of general formula (I) below, a crosslinker component and an alcohol solvent to thereby induce crosslinking with the resin as a constituent of the pattern and thus form a crosslinked layer, in which R1 represents any of an alkyl group, an alkoxy group, an alkylcarbonyloxy group and an alkoxycarbonyl group.

Abstract translation: 提供一种形成图案的方法，包括（a）在膜中形成包含树脂的光化学射线或辐射敏感性树脂组合物，所述树脂组合物当被酸作用时增加其极性，并且暴露于其中的化合物 产生酸，（b）使膜暴露于光，（c）用包含有机溶剂的显影剂显影曝光的膜，从而形成负图案，和（d）用组合物涂覆图案 包含下述通式（I）的重复单元，交联剂成分和醇类溶剂中的任一种的树脂，由此引起与树脂作为图案的组成的交联，从而形成交联层，其中R1表示 烷基，烷氧基，烷基羰基氧基和烷氧基羰基。

公开(公告)号：US20140227637A1

公开(公告)日：2014-08-14

申请号：US14257314

申请日：2014-04-21

Applicant: FUJIFILM Corporation

Inventor： Keita KATO ,  Michihiro SHIRAKAWA ,  Tadahiro ODANI ,  Atsushi NAKAMURA ,  Hidenori TAKAHASHI ,  Kaoru IWATO

IPC: G03F7/09 ,  G03F7/20

CPC classification number: G03F7/094 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/095 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325

Abstract: A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 图案形成方法包括：（i）通过使用第一树脂组合物（I）在基材上形成底部抗反射涂层的步骤，（ii）在底部抗反射涂层上形成抗蚀剂膜的步骤， 使用第二树脂组合物（II），（iii）暴露具有底部抗反射涂层和抗蚀剂膜的多层膜的步骤，以及（iv）显影底部抗反射涂层和抗蚀剂的步骤 通过使用含有机溶剂的显影剂来形成负图案的曝光的多层膜中的膜。

公开(公告)号：US20140113223A1

公开(公告)日：2014-04-24

申请号：US14141748

申请日：2013-12-27

Applicant: FUJIFILM Corporation

Inventor： Keita KATO ,  Michihiro SHIRAKAWA ,  Tadahiro ODANI ,  Atsushi NAKAMURA ,  Hidenori TAKAHASHI ,  Kaoru IWATO

IPC: G03F7/32

CPC classification number: G03F7/325 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/095

Abstract: There is provided a pattern forming method comprising: (i) a step of forming a first film on a substrate by using a first resin composition (I), (ii) a step of forming a second film on the first film by using a second resin composition (II) different from the resin composition (I), (iii) a step of exposing a multi-layered film having the first film and the second film, and (iv) a step of developing the first film and the second film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 提供一种图案形成方法，包括：（i）通过使用第一树脂组合物（I）在基材上形成第一膜的步骤，（ii）通过使用第二树脂在第一膜上形成第二膜的步骤 不同于树脂组合物（I）的树脂组合物（II），（iii）暴露具有第一膜和第二膜的多层膜的步骤，以及（iv）使第一膜和第二膜显影的步骤 在曝光的多层膜中，通过使用含有机溶剂的显影剂形成负图案。