Wafer level lens, production method of wafer level lens, and imaging unit
    2.
    发明授权
    Wafer level lens, production method of wafer level lens, and imaging unit 有权
    晶圆级透镜,晶圆级透镜的生产方法和成像单元

    公开(公告)号:US08936371B2

    公开(公告)日:2015-01-20

    申请号:US14279524

    申请日:2014-05-16

    Inventor: Yoichi Maruyama

    Abstract: A sufficient light-shielding property is obtained by a wafer level lens having at least one lens module having a substrate and a plurality of lenses formed on the substrate in which the wafer level lens has a black resist layer formed on the surface of the lens module or on the surface of the substrate and the black resist layer is formed with a pattern having an opening at a part intersecting the optical axis of the lens, and generation of defects such as ghosts, flares and the like due to a reflected light can be prevented and an increase in the production cost can be suppressed.

    Abstract translation: 通过具有至少一个具有基板的透镜模块和形成在基板上的多个透镜的晶片级透镜获得足够的遮光性,其中晶片级透镜在透镜模块的表面上形成有黑色抗蚀剂层 或者在基板的表面上,并且黑色抗蚀剂层形成有在与透镜的光轴相交的部分处具有开口的图案,并且由于反射光而产生诸如重影,闪光等的缺陷可以是 可以抑制生产成本的增加。

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