公开(公告)号：US20210130751A1

公开(公告)日：2021-05-06

申请号：US16492338

申请日：2018-01-23

Applicant: FUJIMI INCORPORATED

Inventor： Yukinobu YOSHIZAKI ,  Koichi SAKABE ,  Satoru YARITA ,  Kenichi KOMOTO

IPC: C11D11/00 ,  C11D7/26 ,  C11D7/34 ,  C11D7/36 ,  C11D7/10 ,  C11D7/32 ,  C11D7/20 ,  H01L21/02

Abstract: The present invention provides a means by which it is possible to sufficiently suppress an organic residue while favorably decreasing a ceria residue on a polished object to be polished obtained after being polished using a polishing composition containing ceria.
The present invention relates to a composition for surface treatment, which is for a surface treatment of a polished object to be polished obtained after being polished using a polishing composition containing ceria, contains a carboxy group-containing (co)polymer having a structural unit derived from a monomer having a carboxy group or a salt group of the carboxy group, a SOx or NOy partial structure-containing compound having a partial structure represented by SOx or NOy (where x and y each independently denote a real number 1 to 5), and a dispersing medium, and has a pH of 1 or more and 8 or less.

公开(公告)号：US20190300821A1

公开(公告)日：2019-10-03

申请号：US16337241

申请日：2017-06-29

Applicant: FUJIMI INCORPORATED

Inventor： Yukinobu YOSHIZAKI ,  Koichi SAKABE ,  Satoru YARITA ,  Kenichi KOMOTO

IPC: C11D1/12 ,  C11D3/22 ,  C11D3/37 ,  C11D1/34 ,  C11D3/00

Abstract: The present invention relates to a surface treatment composition including: at least one water-soluble polymer selected from the following Group A; at least one anionic surfactant selected from the following Group B; and water. Group A: water-soluble polysaccharides, polyvinyl alcohols and derivatives thereof, and polyvinylpyrrolidones and derivatives thereof (with the proviso that compounds included in the following Group B are excluded)Group B: compounds having a sulfonic acid (salt) group, compounds having a sulfuric acid ester (salt) group, compounds having a phosphonic acid (salt) group, compounds having a phosphoric acid (salt) group, and compounds having a phosphinic acid (salt) group. According to the present invention, a surface treatment composition capable of efficiently removing foreign bodies, such as particles and organic residues, remaining on the surface of an object to be polished after polishing is provided.

公开(公告)号：US20210139739A1

公开(公告)日：2021-05-13

申请号：US16492835

申请日：2018-01-23

Applicant: FUJIMI INCORPORATED

Inventor： Yukinobu YOSHIZAKI ,  Koichi SAKABE ,  Satoru YARITA ,  Kenichi KOMOTO

IPC: C09G1/02

Abstract: The present invention provides a polishing composition with which it is possible to decrease a level difference to be unintentionally generated between dissimilar materials and a level difference to be unintentionally generated between coarse and dense portions of a pattern. The present invention relates to a polishing composition which contains abrasive grains having an average primary particle size of 5 to 50 nm, a level difference modifier containing a compound with a specific structure, having an aromatic ring and a sulfo group or a salt group thereof which is directly bonded to this aromatic ring, and a dispersing medium and of which the pH is less than 7.

公开(公告)号：US20190093051A1

公开(公告)日：2019-03-28

申请号：US16132863

申请日：2018-09-17

Applicant: FUJIMI INCORPORATED

Inventor： Yukinobu YOSHIZAKI ,  Koichi SAKABE ,  Satoru YARITA ,  Kenichi KOMOTO

IPC: C11D3/37 ,  C11D11/00 ,  C11D3/20

Abstract: A surface treatment composition according to the present invention is used for treating a surface of a polished object to be polished which is obtained after polishing with a polishing composition including ceria, using the surface treatment composition including a (co)polymer having a monomer-derived structural unit having a carboxyl group or a salt group thereof, a residue removing accelerator composed of a specific compound having a hydroxyl group, and a dispersing medium, wherein pH is less than 7.