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公开(公告)号:US20220162477A1
公开(公告)日:2022-05-26
申请号:US17442105
申请日:2020-03-23
Applicant: FUJIMI INCORPORATED
Inventor: Yoshiko YAMAGUCHI , Osamu GOTO , Kohsuke TSUCHIYA , Taiki ICHITSUBO
IPC: C09G1/02 , C09K3/14 , H01L21/02 , H01L21/304
Abstract: The polishing composition provided by the present invention contains an abrasive, a polyvinyl alcohol polymer as a water-soluble polymer, a basic compound, and water, and further contains a trivalent or higher polyvalent organic acid (salt).