公开(公告)号：US20230331930A1

公开(公告)日：2023-10-19

申请号：US18028920

申请日：2021-06-09

Applicant: FUJIMI INCORPORATED

Inventor： Hisanori TANSHO ,  Kohsuke TSUCHIYA ,  Hiroki YAMAGUCHI ,  Reiko AKIZUKI ,  Ryunosuke ANDO

IPC: C08J3/07 ,  C09G1/02

CPC classification number: C08J3/07 ,  C09G1/02 ,  C08J2329/04

Abstract: To provide a polyvinyl alcohol composition effectively suppressed in generation of an aggregated product, in a method for producing a wetting agent for a semiconductor, containing a polyvinyl alcohol composition.
A method for producing a wetting agent for a semiconductor, containing a polyvinyl alcohol composition, wherein the polyvinyl alcohol composition is obtained through an addition-in-liquid step of adding into the inside of any one solution of a first liquid containing polyvinyl alcohol and water and a second liquid other than the first liquid, the other liquid of the first liquid and the second liquid.