公开(公告)号：US20220267644A1

公开(公告)日：2022-08-25

申请号：US17632843

申请日：2020-07-30

Applicant: FUJIMI INCORPORATED

Inventor： Shinji FURUTA ,  Takashi HAYAKAWA ,  Keiji ASHITAKA ,  Naoya MIWA ,  Kohsuke TSUCHIYA ,  Hisanori TANSHO ,  Reiko AKIZUKI

IPC: C09G1/02 ,  B01J20/28 ,  B01D69/02

Abstract: Provided is a method for filtering an additive-containing liquid that can achieve a polishing composition exhibiting excellent defect reducing capability while maintaining a practical filter life. The method for filtering a polishing additive-containing liquid provided by the present invention includes the step of: filtering the polishing additive-containing liquid with a filter that satisfies the following conditions (1) and (2). (1) The average pore diameter P measured by a palm porometer is 0.15 μm or less. (2) The pore diameter gradient (Sin/Sout), which is the ratio of the inlet-side average pore diameter (SO to the outlet-side average pore diameter (Sout), both diameters being measured through observation with an SEM, is 3 or less.