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    METHOD FOR PRODUCING SILICA SOL
    1.
    发明申请
    METHOD FOR PRODUCING SILICA SOL 有权

    公开(公告)号：US20230056027A1

    公开(公告)日：2023-02-23

    申请号：US17950784

    申请日：2022-09-22

    Applicant: FUJIMI INCORPORATED

    Inventor： Yusuke KAWASAKI ,  Shogo TSUBOTA ,  Masaaki ITO ,  Jun SHINODA ,  Keiji ASHITAKA

    IPC: C01B33/145 ,  C01B33/141

    Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol. The present invention relates to a method for producing a silica sol, including synthesizing a silica sol by, in a reaction liquid containing an alkoxysilane or a condensate thereof, water, and an alkali catalyst, allowing the alkoxysilane or condensate thereof to react with the water in the presence of the alkali catalyst, wherein the alkali catalyst is not additionally supplied after the start of the synthesis until the finish time of the synthesis, and during 90% or more of the time between when 5 minutes have elapsed from the time point when the electrical conductivity of the reaction liquid reaches a local maximum for the first time and the finish time of the synthesis, the proportion of the value of the electrical conductivity of the reaction liquid is more than 90% relative to the value of the electrical conductivity at the time when 5 minutes have elapsed from the time point when the local maximum is reached.

    POLISHING COMPOSITION
    3.
    发明申请
    POLISHING COMPOSITION 审中-公开

    公开(公告)号：US20190144728A1

    公开(公告)日：2019-05-16

    申请号：US16245030

    申请日：2019-01-10

    Applicant: FUJIMI INCORPORATED

    Inventor： Keiji ASHITAKA ,  Shogo TSUBOTA

    IPC: C09K3/14 ,  B24B37/04 ,  C09G1/02 ,  H01L21/3105

    CPC classification number: C09K3/1463 ,  B24B37/044 ,  C09G1/02 ,  C09K3/1436 ,  H01L21/31053

    Abstract: Disclosed herein is a polishing composition comprising a pH of 6 or less, sulfonic acid-modified colloidal silica obtained by immobilizing sulfonic acid on surfaces of silica particles, and water, wherein the sulfonic acid-modified colloidal silica is derived from sulfonic acid-modified aqueous anionic silica sol produced by a production method comprising: a first reaction step of obtaining a reactant by heating raw colloidal silica having a number distribution ratio of 10% or less of microparticles having a particle diameter of 40% or less relative to a volume average particle diameter based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope in the presence of a silane coupling agent having a functional group chemically convertible to a sulfonic acid group; and a second reaction step of converting the functional group to a sulfonic acid group by treating the reactant.

    POLISHING COMPOSITION
    4.
    发明申请
    POLISHING COMPOSITION 审中-公开

    公开(公告)号：US20170342304A1

    公开(公告)日：2017-11-30

    申请号：US15544425

    申请日：2016-01-19

    Applicant: FUJIMI INCORPORATED

    Inventor： Keiji ASHITAKA ,  Shogo TSUBOTA

    IPC: C09K3/14 ,  B24B37/04 ,  C09G1/02 ,  H01L21/3105

    Abstract: To provide a technique with which in a case where sulfonic acid-modified aqueous anionic sol is used as abrasive grain, in a polishing composition for polishing an object to be polished that contains SiN, the stability of the SiN polishing rate with time can be improved, and the content of hydrogen peroxide can be decreased.In a polishing composition having a pH of 6 or less, sulfonic acid-modified colloidal silica obtained by immobilizing sulfonic acid on surfaces of silica particles, and water are allowed to be contained, at this time, as the sulfonic acid-modified colloidal silica, the one derived from sulfonic acid-modified aqueous anionic silica sol produced by a production method including a first reaction step of obtaining a reactant by heating raw colloidal silica having a number distribution ratio of 10% or less of microparticles having a particle diameter of 40% or less relative to a volume average particle diameter based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope in the presence of a silane coupling agent having a functional group chemically convertible to a sulfonic acid group; and a second reaction step of converting the functional group to a sulfonic acid group by treating the reactant is used.

    PLATE-LIKE TITANIUM PYROPHOSPHATE AND METHOD FOR PRODUCING THE SAME
    5.
    发明公开
    PLATE-LIKE TITANIUM PYROPHOSPHATE AND METHOD FOR PRODUCING THE SAME 审中-公开

    公开(公告)号：US20240182305A1

    公开(公告)日：2024-06-06

    申请号：US18285052

    申请日：2022-03-22

    Applicant: FUJIMI INCORPORATED

    Inventor： Hiroki KOBAYAKAWA ,  Ryo NOMURA ,  Yasuhide UEMURA ,  Naoya MIWA ,  Keiji ASHITAKA

    IPC: C01B25/42

    CPC classification number: C01B25/42 ,  C01P2002/20 ,  C01P2002/72 ,  C01P2004/03 ,  C01P2004/51 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2006/12

    Abstract: The present invention enables to provide plate-like titanium pyrophosphate, having both high uniformity in size and specific particle shape, which is expected to be highly useful. The present invention relates to plate-like titanium pyrophosphate having an aspect ratio of 5 or more expressed as a ratio of the in-plane length DPL50 of primary particles, at which the cumulative frequency from the smaller particle size side is 50% in a volume-based cumulative particle size distribution, to the thickness DPT50 of primary particles, at which the cumulative frequency from the smaller particle size side is 50% in a volume-based cumulative particle size distribution (the in-plane length DPL50 of primary particles/the thickness DPT50 of primary particles), wherein the relationship among the particle size D10 of secondary particles, at which the cumulative frequency from the smaller particle size side is 10% in a volume-based cumulative particle size distribution, the particle size D50 of secondary particles, at which the cumulative frequency from the smaller particle size side is 50% in a volume-based cumulative particle size distribution, and the particle size D90 of secondary particles, at which the cumulative frequency from the smaller particle size side is 90% in a volume-based cumulative particle size distribution, satisfies a specific relationship; and a method for producing the same.

    METHOD FOR PRODUCING SILICA SOL
    7.
    发明申请
    METHOD FOR PRODUCING SILICA SOL 审中-公开

    公开(公告)号：US20200308009A1

    公开(公告)日：2020-10-01

    申请号：US16818114

    申请日：2020-03-13

    Applicant: FUJIMI INCORPORATED

    Inventor： Yusuke KAWASAKI ,  Shogo TSUBOTA ,  Masaaki ITO ,  Jun SHINODA ,  Keiji ASHITAKA

    IPC: C01B33/145

    Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol. The present invention relates to a method for producing a silica sol, including synthesizing a silica sol by, in a reaction liquid containing an alkoxysilane or a condensate thereof, water, and an alkali catalyst, allowing the alkoxysilane or condensate thereof to react with the water in the presence of the alkali catalyst, wherein the alkali catalyst is not additionally supplied after the start of the synthesis until the finish time of the synthesis, and during 90% or more of the time between when 5 minutes have elapsed from the time point when the electrical conductivity of the reaction liquid reaches a local maximum for the first time and the finish time of the synthesis, the proportion of the value of the electrical conductivity of the reaction liquid is more than 90% relative to the value of the electrical conductivity at the time when 5 minutes have elapsed from the time point when the local maximum is reached.

    SILICA SOL
    9.
    发明公开
    SILICA SOL 审中-公开

    公开(公告)号：US20240262698A1

    公开(公告)日：2024-08-08

    申请号：US18429695

    申请日：2024-02-01

    Applicant: FUJIMI INCORPORATED

    Inventor： Shogo TSUBOTA ,  Masaaki ITO ,  Keiji ASHITAKA ,  Yusuke KAWASAKI ,  Kazuaki IWASAKI

    IPC: C01B33/141

    CPC classification number: C01B33/141 ,  C01P2004/64 ,  C01P2006/22 ,  C01P2006/80

    Abstract: A silica sol which does not gelate, has a high purity, and contains a high concentration of silica particles is provided. A silica sol containing silica particles and water, wherein a product of an average primary particle size of the silica particles and an average circularity of the silica particles is 15.0 or more and 31.2 or less, a concentration of the silica particles is 20 mass % or more, a total organic carbon amount per silica particle is less than 10 mass ppm, when the concentration of the silica particles is 20 mass %, a viscosity at 25° C. is 300 mPa·s or less, and a concentration of a metal impurity is less than 1 mass ppm.

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