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公开(公告)号：US08609325B2
公开(公告)日：2013-12-17
申请号：US12915270
申请日：2010-10-29
Applicant: Fong-Cheng Lee , Ching-Yu Chang
Inventor： Fong-Cheng Lee , Ching-Yu Chang
IPC: G03F7/26
CPC classification number: G03F7/2002 , G03F7/11 , G03F7/16 , G03F7/167 , G03F7/20
Abstract: A lithography method of manufacturing integrated circuits is disclosed. A photoalignment layer is formed on a substrate. A treatment is performed to reorganize and align the photoalignment molecules. A photoresist layer may be formed on the photoalignment layer in a bi-layer separate coating or with the photoalignment layer in a bound-bind structure.
Abstract translation: 公开了一种制造集成电路的光刻方法。 在基板上形成光取向层。 进行处理以重新组织和对准光对准分子。 光致抗蚀剂层可以形成在双层分离涂层中的光取向层上，或者在结合结合结构中形成在光取向层中。
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公开(公告)号：US08323870B2
公开(公告)日：2012-12-04
申请号：US12916759
申请日：2010-11-01
Applicant: Fong-Cheng Lee , Ching-Yu Chang
Inventor： Fong-Cheng Lee , Ching-Yu Chang
CPC classification number: G03F7/0382 , G03F7/0392 , G03F7/325
Abstract: The present disclosure provides a resist utilized in a photolithography patterning process. The resist includes a polymeric material having a plurality of zipper molecules, each including a first zipper portion and a second zipper portion, wherein the first and second zipper portions each include a plurality of zipper branches bonded together in pairs and cleavable to one of thermal energy, radiation energy, and chemical reaction.
Abstract translation: 本公开提供了在光刻图案化工艺中使用的抗蚀剂。 抗蚀剂包括具有多个拉链分子的聚合材料，每个拉链分子包括第一拉链部分和第二拉链部分，其中第一和第二拉链部分各自包括成对地结合在一起的多个拉链分支并且可切割成热能之一 ，辐射能和化学反应。
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公开(公告)号：US20120107742A1
公开(公告)日：2012-05-03
申请号：US12916759
申请日：2010-11-01
Applicant: Fong-Cheng Lee , Ching-Yu Chang
Inventor： Fong-Cheng Lee , Ching-Yu Chang
CPC classification number: G03F7/0382 , G03F7/0392 , G03F7/325
Abstract: The present disclosure provides a resist utilized in a photolithography patterning process. The resist includes a polymeric material having a plurality of zipper molecules, each including a first zipper portion and a second zipper portion, wherein the first and second zipper portions each include a plurality of zipper branches bonded together in pairs and cleavable to one of thermal energy, radiation energy, and chemical reaction.
Abstract translation: 本公开提供了在光刻图案化工艺中使用的抗蚀剂。 抗蚀剂包括具有多个拉链分子的聚合材料，每个拉链分子包括第一拉链部分和第二拉链部分，其中第一和第二拉链部分各自包括成对地结合在一起的多个拉链分支并且可切割成热能之一 ，辐射能和化学反应。
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