公开(公告)号：US20050136543A1

公开(公告)日：2005-06-23

申请号：US10739852

申请日：2003-12-18

申请人： Francisco Torres ,  Karl Littau ,  Eric Shrader

发明人： Francisco Torres ,  Karl Littau ,  Eric Shrader

IPC分类号： G01N13/04 ,  G01N33/48 ,  G01N37/00 ,  G01N33/00

CPC分类号： G01N13/04 ,  G01N7/10 ,  Y10T436/11

摘要： A method and apparatus for measuring the presence or absence of reaction between a first and second material of interest by measuring osmotic pressure changes in a reaction cell. The reaction cell is capable of measuring the small changes in pressure that occur due to osmotic pressure shifts during a catalytic or binding reaction at species concentrations down to approximately 10−7 M.

摘要翻译： 一种通过测量反应池中的渗透压变化来测量感兴趣的第一和第二材料之间是否存在反应的方法和装置。 反应池能够测量在催化或结合反应期间由于渗透压移动而产生的压力变化的小变化，其浓度低至约10 -7 M。

公开(公告)号：US20050136544A1

公开(公告)日：2005-06-23

申请号：US10739853

申请日：2003-12-18

申请人： Francisco Torres ,  Eric Shrader ,  Karl Littau

发明人： Francisco Torres ,  Eric Shrader ,  Karl Littau

IPC分类号： G01N13/04 ,  G01N35/00 ,  G01N37/00 ,  G01N33/00

CPC分类号： G01N13/04 ,  Y10S436/807

摘要： A method and apparatus for measuring the presence or absence of reaction between a first and second material of interest by measuring osmotic pressure changes of reaction detector. The reaction detector is capable of measuring the small changes in pressure that occur due to osmotic pressure shifts during a catalytic or binding reaction at species concentrations down to approximately 10−7 M.

摘要翻译： 通过测量反应检测器的渗透压变化来测量感兴趣的第一和第二材料之间是否存在反应的方法和装置。 反应检测器能够测量在催化或结合反应过程中在物质浓度低至约10 -7 M时由于渗透压移动而发生的压力变化很小。

公开(公告)号：US07615375B2

公开(公告)日：2009-11-10

申请号：US10739852

申请日：2003-12-18

申请人： Francisco E. Torres ,  Karl Littau ,  Eric Shrader

发明人： Francisco E. Torres ,  Karl Littau ,  Eric Shrader

IPC分类号： G01N7/00

CPC分类号： G01N13/04 ,  G01N7/10 ,  Y10T436/11

摘要： A method and apparatus for measuring the presence or absence of reaction between a first and second material of interest by measuring osmotic pressure changes in a reaction cell. The reaction cell is capable of measuring the small changes in pressure that occur due to osmotic pressure shifts during a catalytic or binding reaction at species concentrations down to approximately 10−7 M.

摘要翻译： 一种通过测量反应池中的渗透压变化来测量感兴趣的第一和第二材料之间是否存在反应的方法和装置。 反应池能够测量在催化或结合反应期间在物质浓度低至约10 -7 M时由于渗透压移动而发生的压力变化小。

公开(公告)号：US20090260425A1

公开(公告)日：2009-10-22

申请号：US12493668

申请日：2009-06-29

申请人： Francisco E. Torres ,  Eric Shrader ,  Karl Littau

发明人： Francisco E. Torres ,  Eric Shrader ,  Karl Littau

IPC分类号： G01N13/04

CPC分类号： G01N13/04 ,  Y10S436/807

摘要： An apparatus and system for measuring the presence or absence of reaction between a first and second material of interest by measuring osmotic pressure changes of reaction detector. The reaction detector is capable of measuring the small changes in pressure that occur due to osmotic pressure shifts during a catalytic or binding reaction at species concentrations down to approximately 10−7 M.

摘要翻译： 一种用于通过测量反应检测器的渗透压变化来测量感兴趣的第一和第二材料之间是否存在反应的装置和系统。 反应检测器能够测量在催化或结合反应期间由于渗透压变化而产生的压力变化小于约10-7M的物质浓度。

公开(公告)号：US07553669B2

公开(公告)日：2009-06-30

申请号：US10739853

申请日：2003-12-18

申请人： Francisco E. Torres ,  Eric Shrader ,  Karl Littau

发明人： Francisco E. Torres ,  Eric Shrader ,  Karl Littau

IPC分类号： G01N33/00 ,  G01N7/00 ,  C12Q1/68

CPC分类号： G01N13/04 ,  Y10S436/807

摘要： A method and apparatus for measuring the presence or absence of reaction between a first and second material of interest by measuring osmotic pressure changes of reaction detector. The reaction detector is capable of measuring the small changes in pressure that occur due to osmotic pressure shifts during a catalytic or binding reaction at species concentrations down to approximately 10−7 M.

摘要翻译： 通过测量反应检测器的渗透压变化来测量感兴趣的第一和第二材料之间是否存在反应的方法和装置。 反应检测器能够测量在催化或结合反应期间由于渗透压变化而产生的压力变化小于约10-7M的物质浓度。

公开(公告)号：US07851226B2

公开(公告)日：2010-12-14

申请号：US12546713

申请日：2009-08-25

申请人： Francisco E. Torres ,  Karl Littau ,  Eric Shrader

发明人： Francisco E. Torres ,  Karl Littau ,  Eric Shrader

IPC分类号： G01N7/00

CPC分类号： G01N13/04 ,  G01N7/10 ,  Y10T436/11

摘要： A method and apparatus for measuring the presence or absence of reaction between a first and second material of interest by measuring osmotic pressure changes in a reaction cell. The reaction cell is capable of measuring the small changes in pressure that occur due to osmotic pressure shifts during a catalytic or binding reaction at species concentrations down to approximately 10−7 M.

摘要翻译： 一种通过测量反应池中的渗透压变化来测量感兴趣的第一和第二材料之间是否存在反应的方法和装置。 反应池能够测量在催化或结合反应期间在物质浓度低至约10 -7 M时由于渗透压移动而发生的压力变化小。

公开(公告)号：US07794662B2

公开(公告)日：2010-09-14

申请号：US12493668

申请日：2009-06-29

申请人： Francisco E. Torres ,  Eric Shrader ,  Karl Littau

发明人： Francisco E. Torres ,  Eric Shrader ,  Karl Littau

IPC分类号： G01N7/00 ,  G01N33/00 ,  G01N13/04

CPC分类号： G01N13/04 ,  Y10S436/807

摘要： An apparatus and system for measuring the presence or absence of reaction between a first and second material of interest by measuring osmotic pressure changes of reaction detector. The reaction detector is capable of measuring the small changes in pressure that occur due to osmotic pressure shifts during a catalytic or binding reaction at species concentrations down to approximately 10−7 M.

摘要翻译： 一种用于通过测量反应检测器的渗透压变化来测量感兴趣的第一和第二材料之间是否存在反应的装置和系统。 反应检测器能够测量在催化或结合反应期间由于渗透压变化而产生的压力变化小于约10-7M的物质浓度。

公开(公告)号：US20090320573A1

公开(公告)日：2009-12-31

申请号：US12546713

申请日：2009-08-25

申请人： Francisco E. Torres ,  Karl Littau ,  Eric Shrader

发明人： Francisco E. Torres ,  Karl Littau ,  Eric Shrader

IPC分类号： G01N13/04

CPC分类号： G01N13/04 ,  G01N7/10 ,  Y10T436/11

摘要： A method and apparatus for measuring the presence or absence of reaction between a first and second material of interest by measuring osmotic pressure changes in a reaction cell. The reaction cell is capable of measuring the small changes in pressure that occur due to osmotic pressure shifts during a catalytic or binding reaction at species concentrations down to approximately 10−7 M.

摘要翻译： 一种通过测量反应池中的渗透压变化来测量感兴趣的第一和第二材料之间是否存在反应的方法和装置。 反应池能够测量在催化或结合反应期间在物质浓度低至约10 -7 M时由于渗透压移动而发生的压力变化小。

公开(公告)号：US08551556B2

公开(公告)日：2013-10-08

申请号：US11943453

申请日：2007-11-20

申请人： Eric Shrader ,  Uma Srinivasan ,  Clark Crawford ,  Scott Limb

发明人： Eric Shrader ,  Uma Srinivasan ,  Clark Crawford ,  Scott Limb

IPC分类号： B05D5/12 ,  B05D5/06 ,  B05D5/00

CPC分类号： G03F7/2018 ,  H05K3/0079 ,  H05K3/108 ,  H05K3/184 ,  H05K2203/013 ,  H05K2203/0577 ,  H05K2203/0588

摘要： High aspect ratio structures can be obtained by print-patterning masking features in feature stacks such that each feature has a lateral edge which is aligned in a plane roughly perpendicular to the plane of the substrate on which the features are formed. Due to the differential lateral spreading between features formed on a substrate and formed atop other features, the print head is indexed less than the radius of a droplet to a position where a droplet ejected by the print head forms an upper feature atop a lower feature such that the lateral edges of the upper and lower features are aligned in the plane roughly perpendicular to the plane of the substrate. Feature stacks of two or more features may provide a vertical (or re-entrant) sidewall mask for formation of high aspect ratio structures, by e.g., electroplating, etc.

摘要翻译： 可以通过在特征堆叠中打印图案化掩模特征来获得高纵横比结构，使得每个特征具有在大致垂直于其上形成有特征的基底的平面的平面中对准的横向边缘。 由于形成在基板上并形成在其它特征上的特征之间的差异横向扩展，打印头被折射小于液滴的半径到由打印头喷射的液滴在下部特征顶部形成上部特征的位置，例如 上和下特征的侧边缘在大致垂直于基板的平面的平面中对准。 两个或更多个特征的特征堆叠可以提供用于形成高纵横比结构的垂直（或重入）侧壁掩模，例如通过电镀等。

公开(公告)号：US20090123873A1

公开(公告)日：2009-05-14

申请号：US11938195

申请日：2007-11-09

申请人： Eric Shrader ,  Uma Srinivasan ,  Clark Crawford ,  Scott Limb

发明人： Eric Shrader ,  Uma Srinivasan ,  Clark Crawford ,  Scott Limb

IPC分类号： G03F7/26 ,  H05K1/02

CPC分类号： H05K3/0082 ,  H05K3/0023 ,  H05K3/28 ,  H05K3/42 ,  H05K2201/09545 ,  H05K2203/013 ,  H05K2203/0191 ,  H05K2203/0551 ,  H05K2203/0783

摘要： A method for masking regions of photoresist in the manufacture of a soldermask for printed circuit boards is disclosed. Following application of photoresist over patterned traces on a substrate, a sheet-like thin film is applied over the photosensitive material. The thin film may adhere to the photosensitive material by way of the adhesive state of the photosensitive material or by way of an adhesive applied to the photosensitive material or the thin film or carried by the thin film. Digital mask printing may proceed on the surface of the thin film. The photosensitive material may then be exposed through the printed photomask, the thin film (with photomask) removed, and the photosensitive material developed.

摘要翻译： 公开了一种在制造用于印刷电路板的焊接掩模时掩蔽光致抗蚀剂区域的方法。 在基板上的图案化迹线上施加光致抗蚀剂之后，将片状薄膜施加在感光材料上。 薄膜可以通过感光材料的粘合状态或通过施加到感光材料或薄膜上的粘合剂或由薄膜承载的粘合剂粘附到感光材料上。 数字掩模印刷可以在薄膜的表面上进行。 然后可以通过印刷的光掩模曝光感光材料，除去薄膜（带有光掩模），并且感光材料显影。