专利检索 ap:("Francois Doniat" OR "Matthew L. Fisher" OR "Alan D. Zdunek" OR "Alexandro A. Barajas" OR "Ian Suni" OR "Xiangfeng Chu" OR "Abhinav Tripathi" OR "Yuzhuo Li") AND inv:"Alexandro A. Barajas" 第 1 页

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发明申请
ELECTROLYTE FORMULATION FOR ELECTROCHEMICAL MECHANICAL PLANARIZATION 审中-公开
标题翻译：电化学机电平衡的电解质配方

公开(公告)号：US20080142375A1

公开(公告)日：2008-06-19

申请号：US11864254

申请日：2007-09-28

申请人： Francois Doniat , Matthew L. Fisher , Alan D. Zdunek , Alexandro A. Barajas , Ian Suni , Xiangfeng Chu , Abhinav Tripathi , Yuzhuo Li

发明人： Francois Doniat , Matthew L. Fisher , Alan D. Zdunek , Alexandro A. Barajas , Ian Suni , Xiangfeng Chu , Abhinav Tripathi , Yuzhuo Li

IPC分类号： B23H3/00

CPC分类号： C09G1/02 , C25F3/30 , H01L21/32125

摘要： Compositions and methods suitable for the electrochemical mechanical planarization of a conductive material layer on a semiconductor workpiece. Compositions contain a phosphonic acid based electrolyte, a corrosion inhibitor, a chelating agent, a pH adjusting agent, and a solvent as the remainder.

摘要翻译： 适用于半导体工件上导电材料层的电化学机械平面化的组合物和方法。组合物含有基于膦酸的电解质，腐蚀抑制剂，螯合剂，pH调节剂和作为其余的溶剂。