-
公开(公告)号：US06778695B1
公开(公告)日：2004-08-17
申请号：US09471529
申请日：1999-12-23
IPC分类号： G06K900
CPC分类号： G01R31/311
摘要： Design-based reticle inspection allows for a more efficient prioritization than typical human labor intensive reticle inspection techniques. A processed netlist for an integrated circuit (IC) and/or layout of the IC is used to determine the relative priorities of reticle defects identified by a reticle inspection device. In one embodiment, the processed netlist is a netlist that is derived by a verification tool based on a layout of the IC design. The processed netlist can include component coordinates that indicate the position of the components of the IC. In one embodiment, the processed layout includes derived geometry, for example, critical dimensions and/or device identifications that can be used to determine regions of interest. In one embodiment, defects are prioritized based on the location of the defects with respect to functional portions of the integrated circuit. For example, regions of interest can be determined around certain IC structures (e.g., transistor gates, minimum dimension lines, line corners). In one embodiment, defects within the regions of interest can be repaired while defects outside of the care zone can be ignored. More complex defect prioritization can be provided by prioritizing defects, for example, by size within the regions of interest. By prioritizing defects by areas of interest, the number of defects analyzed by a human operator and/or simulator can be decreased thereby decreasing the cost of reticle inspection and repair.
摘要翻译： 基于设计的掩模版检查可以比典型的人力密集型掩模版检查技术更有效地确定优先级。 用于IC的集成电路（IC）和/或布局的处理网表用于确定由掩模版检查装置识别的掩模版缺陷的相对优先级。 在一个实施例中，经处理的网表是基于IC设计的布局由验证工具导出的网表。 经处理的网表可以包括指示IC的组件的位置的组件坐标。 在一个实施例中，经处理的布局包括导出的几何形状，例如可用于确定感兴趣区域的关键尺寸和/或设备标识。 在一个实施例中，基于缺陷相对于集成电路的功能部分的位置优先考虑缺陷。 例如，可以围绕某些IC结构（例如，晶体管栅极，最小尺寸线，线角）来确定感兴趣的区域。 在一个实施例中，可以修复感兴趣区域内的缺陷，同时可以忽略护理区外的缺陷。 可以通过对缺陷进行优先排序来提供更复杂的缺陷优先级，例如按照感兴趣区域内的大小。 通过将感兴趣区域的缺陷设定为优先级，可以减少由操作人员和/或模拟器分析的缺陷的数量，从而降低掩模版检查和修复的成本。
-
2.发明授权Birefringent structures formed by photo-exposure of polymer films and method for fabrication thereof 失效通过聚合物膜的曝光形成的双折射结构及其制造方法
公开(公告)号：US5105298A
公开(公告)日：1992-04-14
申请号：US379527
申请日：1989-07-12
CPC分类号： G02B5/3083 , G02B1/04 , Y10S359/90
摘要： A birefringent structure useful as a waveplate, grating, a hologram, a beam separator, a digital data storage medium or the like is formed by photo-exposure causing photo-reaction between photons and polymeric structures. In a specific embodiment, birefringence is induced by applying optical energy to a polymer film such as a polysilane with sufficient intensity to excite nonlinear absorption in the polymer film such that a pattern of the exposing optical energy is recorded in the polymer film. The optical energy is of a distinct polarThis invention was made under contract with or supported by the United States Air Force office of Scientific Research under Contract No. AFOSR-88-0354. The Government has certain rights in this invention.
摘要翻译： 用作波片，光栅，全息图，光束分离器，数字数据存储介质等的双折射结构通过光子曝光形成，引起光子和聚合物结构之间的光反应。 在具体实施方案中，通过将光能施加到具有足够强度的聚硅烷的聚合物膜，以激发聚合物膜中的非线性吸收，从而将曝光光能的图案记录在聚合物膜中，来诱导双折射。 光能具有明显的极化状态，使得非线性光学效应证明极化状态。 在另一个实施例中，将光能的干涉图案施加到聚合物膜，使得其保留曝光照明的偏振状态图案的记录。 根据本发明的方法，优选的聚合物暴露于干涉图案，以便通过非线性吸收来激发聚合物，以引起与曝光光的偏振对准的聚合物链的优先降解。 在优选实施方案中使用的合适的聚合物材料存在于聚硅烷聚合物族中。 材料被转换以保持关于曝光照明的偏振状态的信息的过程被认为是分子水平或原子水平的双光子吸收机制。
-
公开(公告)号：US09160847B2
公开(公告)日：2015-10-13
申请号：US14307921
申请日：2014-06-18
CPC分类号： H04M3/4938 , H04M1/72583 , H04M3/493 , H04M3/4931 , H04M2203/253 , H04M2203/254 , H04W4/16 , H04W4/20
摘要： The invention is a method of creating a dialstring for use with mobile smartphones and other computer-enabled telephones. A software app designed to implement the method recognizes input from the user that identifies an organization to be called, and accesses a stored representation of a corresponding IVR phone tree. The app then presents a graphical representation of all or part of the phone tree on the display of the telephone in a language that is different than the language used in the phone tree. The user can then respond by providing selective inputs that cause the app to synthesize all or part of the dialstring needed to navigate the phone tree to the desired destination. Once a dialing option has been synthesized to the user's satisfaction, the user may provide additional input that the system interprets as an instruction to open a phone call and dial the synthesized number.
摘要翻译： 本发明是创建用于移动智能电话和其他计算机使能电话的拨号串的方法。 设计用于实现该方法的软件应用识别来自用户的输入，其识别要被呼叫的组织，并且访问存储的相应IVR电话树的表示。 然后，应用程序以不同于电话树中使用的语言的语言呈现电话显示器上电话树全部或部分的图形表示。 然后，用户可以通过提供使得应用程序合成将电话树导航到所需目的地所需的全部或部分拨号串来进行响应。 一旦拨号选项已被合成以满足用户的要求，用户可以提供系统解释的附加输入作为打开电话呼叫并拨打合成号码的指令。
-
公开(公告)号：US07174531B2
公开(公告)日：2007-02-06
申请号：US10811418
申请日：2004-03-26
IPC分类号： G06F17/50
摘要： An embodiment of the present invention described and shown in the specification is a system for optimizing data used in creating a photolithographic mask. The system reads a definition of a layer of wafer to be created with a photolithographic mask and defines a number of polygons corresponding to conventional patterns on a mask and polygons corresponding to areas on the mask that are phase shifters. A number of data layers are created and the polygons that define phase shifting areas that shift the phase of light by differing amounts of are grouped in different data layers. Once separated, the system analyzes the polygons in each data layer against one or more design rules and assigns a phase shift amount to all the polygons in a data layer in accordance with the analysis. The polygon definitions in each data layer are then given to a mask maker to fabricate a photolithographic mask. It is emphasized that this abstract is being provided to comply with the rules requiring an abstract and will not be used to interpret or limit the scope or meaning of the claims under 37 C.F.R. § 1.72(b).
摘要翻译： 在说明书中描述和示出的本发明的实施例是用于优化用于创建光刻掩模的数据的系统。 系统读取要用光刻掩模创建的晶片层的定义，并且定义与掩模上的常规图案对应的多个多边形以及对应于作为移相器的掩模上的区域的多边形。 创建了许多数据层，并且将不同量的光的相位定义相移区域的多边形分组在不同的数据层中。 一旦分离，系统根据一个或多个设计规则分析每个数据层中的多边形，并根据分析为数据层中的所有多边形分配相移量。 然后将每个数据层中的多边形定义提供给掩模制造商以制造光刻掩模。 要强调的是，提供本摘要是为了遵守规定抽象要求的规则，不得用于解释或限制37 C.F.R.所述的权利要求的范围或含义。 §1.72（b）。
-
5.发明授权Phase-shifting transparent lithographic mask for writing contiguous structures from noncontiguous mask areas 失效用于从非连续掩模区域写入连续结构的相移透明光刻掩模
公开(公告)号：US5362584A
公开(公告)日：1994-11-08
申请号：US42316
申请日：1993-04-02
CPC分类号： G03F1/34 , G03F7/70283
摘要： A plurality of noncontiguous polygonal regions of phase-shifting material have edges spaced apart less than the distance at which images of said edges would separate. The edges of the regions of phase-shifting material have differing arbitrarily selectable angular orientations (nonparallel as well as parallel) on a nonphase-shifting material. The noncontiguous phase-shifting regions may be arranged in a matrix of parallel columns and rows to facilitate fabrication and facilitate writing of the phase-shifting regions in any arbitrary pattern on an image plane. At least one of the phase-shifting regions constitutes a connective phase-shifting region with edges spaced from edges of adjacent ones of the phase-shifting regions to create a pattern with a continuous body of photoresist covering areas corresponding to the phase-shifting regions upon exposure of the mask. The phase-shifting regions may have different transmission coefficients to provide differing degrees of transparency or different degrees of phase shift to provide differing degrees of image intensity.
摘要翻译： 相移材料的多个不连续的多边形区域具有小于所述边缘的图像将分离的距离的边缘间隔开的边缘。 相移材料区域的边缘在不相移材料上具有不同的任意选择的角取向（非平行和平行）。 不连续的相移区域可以以平行列和行的矩阵布置，以便于制造并且便于在图像平面上以任何任意图案写入相移区域。 相移区域中的至少一个构成连接相移区域，其边缘与相移的相移区域的边缘间隔开，以产生具有连续的光致抗蚀剂层的图案，其覆盖对应于相移区域的区域 面具曝光。 相移区域可以具有不同的透射系数，以提供不同程度的透明度或不同程度的相移以提供不同程度的图像强度。
-
公开(公告)号：US07392168B2
公开(公告)日：2008-06-24
申请号：US09898431
申请日：2001-07-02
摘要： A computer system reads data corresponding to an IC layout target layer and performs an etch simulation on the target layer. Etch biases are calculated and the inverse of the etch biases are used to produce a new target layer. The new target layer is provided as an input to an optical process correction (OPC) loop that corrects the data for image/resist distortions until a simulation indicates that a pattern of objects created on a wafer matches the new target layer. In another embodiment of the invention, original IC layout data is provided to both the OPC loop and an etch simulation. Etch biases calculated by the etch simulation are used in the OPC loop in order to produce mask/reticle data that will be compensated for both optical and resist distortions as well as for etch distortions.
摘要翻译： 计算机系统读取对应于IC布局目标层的数据，并对目标层进行蚀刻模拟。 计算蚀刻偏差，并使用蚀刻偏差的倒数来产生新的目标层。 新的目标层被提供作为光学过程校正（OPC）循环的输入，其校正用于图像/抗蚀剂失真的数据，直到模拟指示在晶片上创建的对象的图案与新的目标层匹配。 在本发明的另一个实施例中，原始IC布局数据被提供给OPC循环和蚀刻模拟。 通过蚀刻模拟计算出的蚀刻偏差用于OPC循环，以便产生掩模/掩模版数据，该数据将被补偿光学和光刻胶失真以及蚀刻失真。
-
公开(公告)号：US5031993A
公开(公告)日：1991-07-16
申请号：US438300
申请日：1989-11-16
申请人： Rahul Asthana , Robert D. Miller , Franklin M. Schellenberg , Glenn T. Sincerbox , James M. Zavislan
发明人： Rahul Asthana , Robert D. Miller , Franklin M. Schellenberg , Glenn T. Sincerbox , James M. Zavislan
CPC分类号： G11B11/10543 , G01J4/00 , G11B11/10576
摘要： An improved apparatus and method for detecting the polarization state of an optical wavefront is disclosed, which is especially suitable for use in an integrated magneto-optic recording head. An optically transparent waveguide structure transmits TE and TM modes of the wavefront propagated as a beam coupled into the waveguide by a TE/TM grating coupler. In the waveguide structure is a periodic structure comprising a birefringent mode separator that splits the propagating beam into TE and TM modes. The mode separator comprises an array of uniformly spaced volumes of identical configuration. Photosensitive devices detect the intensity of the light contained within each of the separated beams. The signals from these photosensitive devices are used to determine the state of polarization of the optical wavefront. The periodic structure may, if desired, comprise regions of alternating birefringence, such as a Bragg grating, either in a waveguide layer or a cladding layer. Focal power is introduced (1) by providing focal power in the input grating coupler to the waveguide with a curved grating structure, (2) by varying the pitch of the birefringent mode separator extending in a direction transverse to the optical axis of the propagating beam, or (3) by introducing a surface grating with a varying pitch in a direction transverse of the optical axis.
-
公开(公告)号：US4791631A
公开(公告)日：1988-12-13
申请号：US91239
申请日：1987-08-31
申请人： Jean-Claude J. E. Baumert , Gary C. Bjorklund , Wilfried Lenth , William P. Risk, III , Franklin M. Schellenberg
发明人： Jean-Claude J. E. Baumert , Gary C. Bjorklund , Wilfried Lenth , William P. Risk, III , Franklin M. Schellenberg
CPC分类号： H01S3/108
摘要： A process and apparatus are disclosed for producing a beam of coherent radiation at essentially 459 nm by mixing, in a nonlinear crystal consisting essentially of KTP, two laser beams, one at essentially 1064 nm and the other at essentially 808 nm. The 1064 nm radiation is derived from a Nd:YAG laser that consists of an input mirror, an output mirror and a Nd:YAG crystal, and contains also the KTP crystal. The Nd:YAG laser is pumped by an essentially 808 nm semiconductor diode laser beam, which passes through the input mirror and through the KTP crystal into the Nd:YAG laser crystal where it is absorbed. The 1064 nm radiation oscillating inside the Nd:YAG laser resonator is mixed either with the said 808 nm pump beam or with 808 nm radiation provided by a second semiconductor diode laser whose light is coupled with the 1064 nm beam using a beamsplitter. The essentially 459 nm beam passes through the output mirror to a utilization device.
-
公开(公告)号：US20150004948A1
公开(公告)日：2015-01-01
申请号：US14307921
申请日：2014-06-18
CPC分类号： H04M3/4938 , H04M1/72583 , H04M3/493 , H04M3/4931 , H04M2203/253 , H04M2203/254 , H04W4/16 , H04W4/20
摘要： The invention is a method of creating a dialstring for use with mobile smartphones and other computer-enabled telephones. A software app designed to implement the method recognizes input from the user that identifies an organization to be called, and accesses a stored representation of a corresponding IVR phone tree. The app then presents a graphical representation of all or part of the phone tree on the display of the telephone in a language that is different than the language used in the phone tree. The user can then respond by providing selective inputs that cause the app to synthesize all or part of the dialstring needed to navigate the phone tree to the desired destination. Once a dialing option has been synthesized to the user's satisfaction, the user may provide additional input that the system interprets as an instruction to open a phone call and dial the synthesized number.
摘要翻译： 本发明是创建用于移动智能电话和其他计算机使能电话的拨号串的方法。 设计用于实现该方法的软件应用识别来自用户的输入，其识别要被呼叫的组织，并且访问存储的相应IVR电话树的表示。 然后，应用程序以不同于电话树中使用的语言的语言呈现电话显示器上电话树全部或部分的图形表示。 然后，用户可以通过提供使得应用程序合成将电话树导航到所需目的地所需的全部或部分拨号串来进行响应。 一旦拨号选项已被合成以满足用户的要求，用户可以提供系统解释的附加输入作为打开电话呼叫并拨打合成号码的指令。
-
公开(公告)号：US06728946B1
公开(公告)日：2004-04-27
申请号：US09703294
申请日：2000-10-31
IPC分类号： G06F1750
摘要： An embodiment of the present invention described and shown in the specification is a system for optimizing data used in creating a photolithographic mask. The system reads a definition of a layer of wafer to be created with a photolithographic mask and defines a number of polygons corresponding to conventional patterns on a mask and polygons corresponding to areas on the mask that are phase shifters. A number of data layers are created and the polygons that define phase shifting areas that shift the phase of light by differing amounts of are grouped in different data layers. Once separated, the system analyzes the polygons in each data layer against one or more design rules and assigns a phase shift amount to all the polygons in a data layer in accordance with the analysis. The polygon definitions in each data layer are then given to a mask maker to fabricate a photolithographic mask. It is emphasized that this abstract is being provided to comply with the rules requiring an abstract and will not be used to interpret or limit the scope or meaning of the claims under 37 C.F.R. §1.72(b).
摘要翻译： 在说明书中描述和示出的本发明的实施例是用于优化用于创建光刻掩模的数据的系统。 系统读取要用光刻掩模创建的晶片层的定义，并且定义与掩模上的常规图案对应的多个多边形以及对应于作为移相器的掩模上的区域的多边形。 创建了许多数据层，并且定义将不同量的光相移的相移区域的多边形分组在不同的数据层中。 一旦分离，系统根据一个或多个设计规则分析每个数据层中的多边形，并根据分析为数据层中的所有多边形分配相移量。 然后将每个数据层中的多边形定义提供给掩模制造商以制造光刻掩模。 要强调的是，提供本摘要是为了遵守规定抽象要求的规则，不得用于解释或限制37 C.F.R.所述的权利要求的范围或含义。 §1.72（b）。
-
-
-
-
-
-
-
-
-
搜索结果
12 条记录 (耗时 0.022 秒)