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公开(公告)号：US20250042917A1
公开(公告)日：2025-02-06
申请号：US18912279
申请日：2024-10-10
Applicant: Genentech, Inc.
Inventor： Steven MCKERRALL , Brian Salvatore SAFINA , Aleksandr KOLESNIKOV , Birong ZHANG , Wenfeng LIU , Kwong Wah LAI
IPC: C07D498/04 , A61K31/4375 , A61K31/5365 , A61P9/00 , A61P11/00 , A61P25/00 , A61P25/24 , A61P29/00 , C07D471/04
Abstract: The invention provides a compound of formula (I): or a pharmaceutically acceptable salt thereof; wherein, A, B, ring C, R3, R4, R5, R6, and R7 have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.
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公开(公告)号：US20210253597A1
公开(公告)日：2021-08-19
申请号：US17153536
申请日：2021-01-20
Applicant: GENENTECH, INC.
Inventor： Steven MCKERRALL , Brian Salvatore SAFINA , Aleksandr KOLESNIKOV , Birong ZHANG , Wenfeng LIU , Kwong Wah LAI
IPC: C07D498/04 , C07D471/04 , A61P11/00 , A61P9/00 , A61P25/24 , A61P25/00 , A61P29/00
Abstract: The invention provides a compound of formula (I): or a pharmaceutically acceptable salt thereof; wherein, A, B, ring C, R3, R4, R5, R6, and R7 have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.
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公开(公告)号：US20190031607A1
公开(公告)日：2019-01-31
申请号：US16150070
申请日：2018-10-02
Applicant: GENENTECH, INC. , XENON PHARMACEUTICALS INC.
Inventor： Jean-Christophe ANDREZ , Philippe BERGERON , Paul Robert BICHLER , Sultan CHOWDHURY , Christoph Martin DEHNHARDT , Thilo FOCKEN , Wei GONG , Michael Edward GRIMWOOD , Abid HASAN , Ivan William HEMEON , Qi JIA , Brian Salvatore SAFINA , Shaoyi SUN , Michael Scott WILSON , Alla Yurevna ZENOVA
IPC: C07D207/16 , C07C235/52 , C07D209/02 , C07D401/10 , C07D205/04 , C07D207/22 , C07D211/20 , C07C235/42 , C07D211/38 , C07D409/06 , C07D265/30 , C07D413/12 , C07D263/26 , C07C235/54 , C07D417/12 , C07D305/08 , C07D213/69 , C07D403/04 , C07D231/06 , C07D209/52 , C07D221/22 , C07D209/54 , C07D403/12 , C07D211/60 , C07D207/10 , C07D401/12 , C07D471/08 , C07D413/14 , C07D207/08 , C07D405/10 , C07D403/14 , C07D451/02 , C07D401/14 , C07D263/04 , C07D277/06
CPC classification number: C07D207/16 , C07C235/42 , C07C235/52 , C07C235/54 , C07C2601/02 , C07C2601/04 , C07C2603/74 , C07D205/04 , C07D207/08 , C07D207/10 , C07D207/22 , C07D209/02 , C07D209/52 , C07D209/54 , C07D211/20 , C07D211/38 , C07D211/60 , C07D213/69 , C07D221/22 , C07D231/06 , C07D263/04 , C07D263/26 , C07D265/30 , C07D277/06 , C07D305/08 , C07D401/10 , C07D401/12 , C07D401/14 , C07D403/04 , C07D403/12 , C07D403/14 , C07D405/10 , C07D409/06 , C07D413/12 , C07D413/14 , C07D417/12 , C07D451/02 , C07D471/08
Abstract: The invention provides compounds having the general Formula (I); and pharmaceutically acceptable salts thereof; wherein the variables RA, RAA, subscript n, subscript q, ring A, X2, L, subscript m, X1, R1, R2, R3, R4, R5, D and E have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.
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公开(公告)号：US20180346416A1
公开(公告)日：2018-12-06
申请号：US16057693
申请日：2018-08-07
Applicant: GENENTECH, INC. , XENON PHARMACEUTICALS INC.
Inventor： Christoph Martin DEHNHARDT , Sultan CHOWDHURY , Thilo FOCKEN , Michael Edward GRIMWOOD , Ivan William HEMEON , Brian Salvatore SAFINA , Daniel P. SUTHERLIN
IPC: C07C307/06 , C07D277/24 , C07D401/12 , C07D305/08 , C07D213/64 , C07D213/63 , C07D277/62 , C07D277/34 , C07D405/12 , C07D231/56 , C07D215/20 , C07D213/74 , C07D213/69 , C07D209/08 , C07D205/04 , C07D413/12 , C07D217/02
CPC classification number: C07C307/06 , C07C2601/04 , C07D205/04 , C07D209/08 , C07D213/63 , C07D213/64 , C07D213/69 , C07D213/74 , C07D215/20 , C07D217/02 , C07D231/56 , C07D277/24 , C07D277/34 , C07D277/62 , C07D305/08 , C07D401/12 , C07D405/12 , C07D413/12
Abstract: The invention provides methods for treating pain using compounds having the general formula: and pharmaceutically acceptable salts thereof, wherein the variables RA, subscript n, ring A, X2, L, subscript m, X1, ring D, R1, and RN have the meaning as described herein.
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Patent Agency Ranking
公开(公告)号：US20210171516A1
公开(公告)日：2021-06-10
申请号：US17031348
申请日：2020-09-24
Applicant: GENENTECH, INC. , XENON PHARMACEUTICALS INC.
Inventor： Philippe BERGERON , Kristen BURFORD , Sultan CHOWDHURY , Christoph Martin DEHNHARDT , Thilo FOCKEN , Michael Edward GRIMWOOD , Abid HASAN , Kwong Wah LAI , Zhiguo LIU , Steven MCKERRALL , Teresa Phuongtram NGUYEN , Brian Salvatore SAFINA , Daniel SUTHERLIN , Tao WANG
IPC: C07D417/12 , C07D417/14 , A61P17/04 , C07D401/12 , C07D405/14 , C07D491/107
Abstract: The invention provides a compound of formula: or a salt thereof, wherein the variables RAA, n, ring A, ring B, R1a, R1b, R2, R3, R4, R5, R6, R7, R8, and R9 have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.
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公开(公告)号：US20210093618A1
公开(公告)日：2021-04-01
申请号：US16677487
申请日：2019-11-07
Applicant: GENENTECH, INC. , XENON PHARMACEUTICALS INC.
Inventor： Jean-Christophe ANDREZ , Paul Robert BICHLER , Chien-An CHEN , Sultan CHOWDHURY , Shannon Marie DECKER , Christoph Martin DEHNHARDT , Thilo FOCKEN , Michael Edward GRIMWOOD , Ivan William HEMEON , Qi JIA , Jun LI , Zhiguo LIU , Daniel F. ORTWINE , Brian Salvatore SAFINA , Daniel SUTHERLIN , Tao SHENG , Shaoyi SUN , Andrew D. WHITE , Michael Scott WILSON , Alla Yurevna ZENOVA , Jiuxiang ZHU
IPC: A61K31/445 , C07D295/26 , A61K31/4015 , C07D211/22 , C07D233/68 , C07D305/08 , C07D205/12 , A61K31/4523 , C07D405/12 , C07D413/06 , C07D451/02 , C07D405/04 , C07D211/54 , C07D403/12 , C07D487/08 , C07D237/08 , C07D205/04 , C07D211/32 , A61K31/4412 , A61K31/415 , C07D401/04 , A61K31/337 , A61K31/495 , C07D211/60 , A61K31/4545 , C07D403/04 , C07D413/12 , C07D401/12 , C07D265/30 , C07D417/06 , C07D451/06 , C07D211/42 , A61K31/397 , C07F7/08 , C07D211/96 , C07D241/04 , C07D401/06 , C07D453/02 , C07D207/12 , C07D295/155
Abstract: The invention provides compounds having the general formula I: and pharmaceutically acceptable salts thereof, wherein the variables RA, RAA, subscript n, ring A, X2, L, subscript m, X1, R1, R2, R3, R4, R5, and RN have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.
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公开(公告)号：US20210078947A1
公开(公告)日：2021-03-18
申请号：US16702286
申请日：2019-12-03
Applicant: GENENTECH, INC. , XENON PHARMACEUTICALS INC.
Inventor： Jean-Christophe ANDREZ , Philippe BERGERON , Paul Robert BICHLER , Sultan CHOWDHURY , Christoph Martin DEHNHARDT , Thilo FOCKEN , Wei GONG , Michael Edward GRIMWOOD , Abid HASAN , Ivan William HEMEON , Qi JIA , Brian Salvatore SAFINA , Shaoyi SUN , Michael Scott WILSON , Alla Yurevna ZENOVA
IPC: C07D207/16 , C07D403/12 , C07D413/14 , C07D221/22 , C07D401/12 , C07D413/12 , C07C235/52 , C07D205/04 , C07D277/06 , C07D209/02 , C07D305/08 , C07D401/14 , C07D231/06 , C07D403/04 , C07D403/14 , C07D409/06 , C07D417/12 , C07D451/02 , C07D263/04 , C07D263/26 , C07C235/42 , C07C235/54 , C07D265/30 , C07D207/08 , C07D207/10 , C07D207/22 , C07D209/52 , C07D209/54 , C07D211/20 , C07D211/38 , C07D211/60 , C07D213/69 , C07D401/10 , C07D405/10 , C07D471/08
Abstract: The invention provides compounds having the general Formula (I); and pharmaceutically acceptable salts thereof; wherein the variables RA, RAA, subscript n, subscript q, ring A, X2, L, subscript m, X1, R1, R2, R3, R4, R5, D and E have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.
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公开(公告)号：US20200087239A1
公开(公告)日：2020-03-19
申请号：US16685335
申请日：2019-11-15
Applicant: GENENTECH, INC. , XENON PHARMACEUTICALS INC.
Inventor： Ivan William HEMEON , Brian Salvatore SAFINA , Daniel SUTHERLIN
IPC: C07C62/38 , C07C69/757 , C07C62/34 , C07C229/48 , C07D211/22 , C07C317/44 , C07C323/61 , A61P25/00 , A61P29/00 , A61P17/04 , C07C313/04
Abstract: The invention provides compounds having the general formula I: and pharmaceutically acceptable salts thereof, wherein the variables RAA, n, ring A, X1, L, m, X2, R2, R3, R4, R5, X, and R6 have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.
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公开(公告)号：US20190300544A1
公开(公告)日：2019-10-03
申请号：US16370756
申请日：2019-03-29
Applicant: GENENTECH, INC.
Inventor： Steven MCKERRALL , Brian Salvatore SAFINA , Aleksandr KOLESNIKOV , Birong ZHANG , Wenfeng LIU , Kwong Wah LAI
IPC: C07D498/04 , C07D471/04 , A61P25/24 , A61P9/00 , A61P11/00
Abstract: The invention provides a compound of formula (I): or a pharmaceutically acceptable salt thereof; wherein, A, B, ring C, R3, R4, R5, R6, and R7 have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.
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