公开(公告)号：US09410261B2

公开(公告)日：2016-08-09

申请号：US14528028

申请日：2014-10-30

Applicant: GLOBALFOUNDRIES INC.

Inventor： Gareth G. Hougham ,  Gerard McVicker ,  Anna Pratt

IPC: C25D17/12 ,  G03F7/20 ,  G03F7/00 ,  C25D1/00 ,  C25D5/02 ,  C25D13/00

CPC classification number: C25D17/12 ,  C25D1/003 ,  C25D5/022 ,  C25D13/00 ,  G03F7/0037 ,  G03F7/2022 ,  G03F7/203 ,  Y10T428/24562

Abstract: A negative electrophoretic photoresist is applied over a plurality of protruding disposable template portions on a substrate. A silo structure is placed on planar portions of the negative electrophoretic photoresist that laterally surround the plurality of protruding disposable template portions. The negative electrophoretic photoresist is lithographically exposed employing the silo structure and a first lithographic mask, which includes a transparent substrate with isolated opaque patterns thereupon. After removal of the silo structure, the negative electrophoretic photoresist is lithographically exposed employing a second lithographic mask, which includes a pattern of transparent areas overlying the planar portions of the negative electrophoretic photoresist less the areas for bases of metal structure to be subsequently formed by electroplating. The negative electrophoretic photoresist is developed to form cavities therein, and metal structures are formed by electroplating within the cavities. The negative electrophoretic photoresist and the plurality of protruding disposable template portions can be subsequently removed.