公开(公告)号：US20140173533A1

公开(公告)日：2014-06-19

申请号：US13717816

申请日：2012-12-18

Applicant: GLOBALFOUNDRIES INC.

Inventor： Yuyang Sun ,  Chidambaram Kallingal ,  Marc Tarabbia

IPC: G06F17/50

CPC classification number: G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

Abstract: Approaches for cleaning/resolving lithographic hotspots (e.g., during a simulation phase of semiconductor design) are provided. Typically, a hotspot will be identified in a first polygon (having a first color) of a lithographic pattern or contour. Once a hotspot has been identified, a location (e.g., another portion of the first polygon or in a second polygon of the lithographic pattern having the first color) proximate the hotspot will be identified to place a stitch marker. Once the location has been identified, a stitch marker will be placed at that location. Then, a color of the stitch marked location will be changed to a second color, and the resulting lithographic pattern can be further processed to clean/resolve the hotspot.

Abstract translation: 提供了清洁/分辨光刻热点的方法（例如，在半导体设计的模拟阶段期间）。 通常，将在光刻图案或轮廓的第一多边形（具有第一颜色）中识别热点。 一旦确定了热点，将识别靠近热点的位置（例如，具有第一颜色的第一多边形的另一部分或具有第一颜色的第二多边形），以放置针迹标记。 一旦识别出位置，将在该位置放置一个针迹标记。 然后，将针迹标记位置的颜色改变为第二颜色，并且可以进一步处理所得到的平版印刷图案以清洁/解析热点。

公开(公告)号：US08869075B2

公开(公告)日：2014-10-21

申请号：US13717816

申请日：2012-12-18

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Yuyang Sun ,  Chidambaram Kallingal ,  Marc Tarabbia

IPC: G06F17/50

CPC classification number: G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

Abstract: Approaches for cleaning/resolving lithographic hotspots (e.g., during a simulation phase of semiconductor design) are provided. Typically, a hotspot will be identified in a first polygon (having a first color) of a lithographic pattern or contour. Once a hotspot has been identified, a location (e.g., another portion of the first polygon or in a second polygon of the lithographic pattern having the first color) proximate the hotspot will be identified to place a stitch marker. Once the location has been identified, a stitch marker will be placed at that location. Then, a color of the stitch marked location will be changed to a second color, and the resulting lithographic pattern can be further processed to clean/resolve the hotspot.

Abstract translation: 提供了清洁/分辨光刻热点的方法（例如，在半导体设计的模拟阶段期间）。 通常，将在光刻图案或轮廓的第一多边形（具有第一颜色）中识别热点。 一旦确定了热点，将识别靠近热点的位置（例如，具有第一颜色的第一多边形的另一部分或具有第一颜色的第二多边形），以放置针迹标记。 一旦识别出位置，将在该位置放置一个针迹标记。 然后，将针迹标记位置的颜色改变为第二颜色，并且可以进一步处理所得到的平版印刷图案以清洁/解析热点。