公开(公告)号：US20190212651A1

公开(公告)日：2019-07-11

申请号：US15867854

申请日：2018-01-11

Applicant: GLOBALFOUNDRIES INC.

Inventor： Robert FINLAY ,  Erik Robert HOSLER ,  Sheldon MEYERS ,  Scott KENNY

IPC: G03F7/16 ,  B05D3/00 ,  B05D1/00 ,  B05B3/02 ,  G03F7/20

CPC classification number: G03F7/164 ,  B05B3/02 ,  B05C11/02 ,  B05D1/005 ,  B05D3/207 ,  G03F7/16 ,  G03F7/162 ,  G03F7/2004

Abstract: An EUV photoresist composition includes paramagnetic particles that are adapted to block EUV radiation. The magnetic manipulation of the paramagnetic particles within a deposited layer of EUV photoresist can beneficially impact focus control and the achievable line width roughness during subsequent photolithographic processing. A spin-coating apparatus for dispensing the EUV photoresist composition onto a substrate includes a plurality of concentric electromagnets located beneath the substrate that influence the distribution of the paramagnetic particles in the photoresist layer.

公开(公告)号：US20170252785A1

公开(公告)日：2017-09-07

申请号：US15062257

申请日：2016-03-07

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Erik Robert HOSLER

IPC: B08B13/00 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70033 ,  G03F7/70175

Abstract: Method and apparatus for in-situ EUV collector cleaning utilizing a cryogenic process and a magnetic trap are disclosed. Embodiments include providing a light source collector including a reflective surface; applying a cooling agent to a surface of the collector for accelerating transformations of characteristics of contaminants on the reflective surface; applying a purging agent to the reflective surface for dislodging the transformed contaminants; and removing the dislodged contaminants to a collection pod remote from the reflective surface.

公开(公告)号：US20160259251A1

公开(公告)日：2016-09-08

申请号：US14637459

申请日：2015-03-04

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Erik Robert HOSLER

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70008 ,  G03F7/70208 ,  G03F7/70991 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  H05G2/008

Abstract: Methods for receiving a high-energy EUV beam and distributing EUV sub-beams to photolithography scanners and the resulting device are disclosed. Embodiments include receiving a high-energy primary EUV beam at a primary splitting optical assembly; splitting the primary EUV beam into primary EUV sub-beams; reflecting the primary EUV sub-beams to beam-splitting optical arrays; splitting the primary EUV sub-beams into secondary EUV sub-beams; reflecting the secondary EUV sub-beams to EUV distribution optical arrays; and distributing simultaneously the secondary EUV sub-beams to scanners.

Abstract translation: 公开了用于接收高能EUV光束并将EUV子光束分布到光刻扫描仪和所得到的装置的方法。 实施例包括在主分裂光学组件处接收高能量的初级EUV光束; 将主EUV波束分为主EUV子波束; 将主要EUV子光束反射到分束光学阵列; 将主EUV子光束分成次级EUV子光束; 将次级EUV子光束反射到EUV分配光学阵列; 并且将次级EUV子光束同时分配到扫描仪。