Doped metal-insulator-transition latch circuitry
    2.
    发明授权
    Doped metal-insulator-transition latch circuitry 有权
    掺杂的金属 - 绝缘体转换锁存电路

    公开(公告)号:US09552852B2

    公开(公告)日:2017-01-24

    申请号:US14534205

    申请日:2014-11-06

    Abstract: Some embodiments of the present invention may include one, or more, of the following features, characteristics or advantages: (i) latch device including multiple Ecrit material regions all electrically connected to a common terminal (sometimes structured and shaped in the form of a storage plate conductor); (ii) bi-stable three-terminal latch device using two Ecrit property regions; (iii) three-terminal, two-Ecrit-region latch device where, for each Ecrit region, (Vdd−Vss) divided by (region thickness, dn) is greater than the region's Ecrit value; or (iv) use of multiple Ecrit material region latch devices to provide data storage instrumentality in a static memory device.

    Abstract translation: 本发明的一些实施例可以包括以下特征,特征或优点中的一个或多个:(i)闩锁装置,包括多个Ecrit材料区域,所述Ecrit材料区域全部电连接到公共端子(有时结构化并以存储器的形式形成 板导体); (ii)使用两个Ecrit属性区域的双稳态三端锁存装置; (iii)三端,双E区域锁存装置,其中对于每个Ecrit区域(Vdd-Vss)除以(区域厚度dn)大于该区域的Ecrit值; 或(iv)使用多个Ecrit材料区域锁存器件来在静态存储器件中提供数据存储器具。

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