SELECTIVE SHIELDING OF AMBIENT LIGHT AT CHIP LEVEL

    公开(公告)号:US20200013908A1

    公开(公告)日:2020-01-09

    申请号:US16027363

    申请日:2018-07-04

    Abstract: A semiconductor device having a substrate with at least one photo-detecting region and at least one bond pad is provided. A first passivation layer is deposited over the substrate and over step portions at the edges of the bond pad and a trench having sidewalls and a bottom surface is formed in the substrate. A light shielding layer is deposited over the first passivation layer and covering the trench sidewalls. The light shielding layer has end portions at the photo-detecting region, at step portions at the edges of the bond pad and at the bottom surface of the trench. A second passivation layer is deposited over the light shielding layer. A third passivation layer is deposited over the end portions of the light shielding layer at the photo-detecting region and at the step portions at edges of the bond pad.

    IMAGE SENSOR WITH REDUCED CAPACITANCE TRANSFER GATE

    公开(公告)号:US20210193713A1

    公开(公告)日:2021-06-24

    申请号:US16721837

    申请日:2019-12-19

    Abstract: An image sensor pixel comprises a semiconductor substrate and a gate having a dielectric layer with a first section and a second section over the semiconductor substrate. The first section of the dielectric layer is thinner than the second section. A photodiode is disposed substantially beneath the gate. A gate well region is disposed beneath the gate and overlying the photodiode. A first doped semiconductor region separates the gate well region from a second doped semiconductor region. The second doped semiconductor region is in the semiconductor substrate and is adjacent to the gate.

    MEMORY CELLS WITH EXTENDED ERASE GATE, AND PROCESS OF FABRICATION

    公开(公告)号:US20210066324A1

    公开(公告)日:2021-03-04

    申请号:US16553189

    申请日:2019-08-28

    Abstract: A flash memory device is provided. The device comprises a substrate and a source region in the substrate. A first gate stack is positioned above the substrate and adjacent to the source region. A dual function gate structure having an upper portion and a lower portion is positioned above the source region. The upper portion of the dual function gate structure overlaps the first gate stack and the lower portion is adjacent to the first gate stack. A second gate is positioned above the substrate on an opposite side of the first gate stack from the dual function gate. A drain region is in the substrate adjacent to the second gate.

    OPTOELECTRONIC DEVICES HAVING AN ELECTRODE WITH APERTURES

    公开(公告)号:US20210328083A1

    公开(公告)日:2021-10-21

    申请号:US16852551

    申请日:2020-04-20

    Abstract: The present disclosure generally relates to structures and semiconductor devices for use in optoelectronic/photonic applications and integrated circuit (IC) chips. More particularly, the present disclosure relates to optoelectronic devices having an electrode that is capable of filtering electromagnetic waves. The present disclosure provides a structure having a substrate, an optical detector upon the substrate, and an electrode upon an upper surface of the optical detector. The electrode defines at least one aperture configured to filter electromagnetic waves traversing the aperture. The optical detector is structured to detect the electromagnetic waves filtered by the aperture.

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