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公开(公告)号:US20220115329A1
公开(公告)日:2022-04-14
申请号:US17070377
申请日:2020-10-14
Applicant: GLOBALFOUNDRIES U.S. Inc.
Inventor: Johnatan A. KANTAROVSKY , Vibhor JAIN , Siva P. ADUSUMILLI , Ajay RAMAN , Sebastian T. VENTRONE , Yves T. NGU
IPC: H01L23/552 , H01L23/00 , H01L49/02 , H01L23/522
Abstract: The present disclosure relates to integrated circuits, and more particularly, to an anti-tamper x-ray blocking package for secure integrated circuits and methods of manufacture and operation. In particular, the present disclosure relates to a structure including: one or more devices on a front side of a semiconductor material; a plurality of patterned metal layers under the one or more devices, located and structured to protect the one or more devices from an active intrusion; an insulator layer between the plurality of patterned metal layers; and at least one contact providing an electrical connection through the semiconductor material to a front side of the plurality of metals.
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公开(公告)号:US20210335731A1
公开(公告)日:2021-10-28
申请号:US16855185
申请日:2020-04-22
Applicant: GLOBALFOUNDRIES U.S. INC.
Inventor: Vibhor JAIN , Ajay RAMAN , Sebastian T. VENTRONE , John J. ELLIS-MONAGHAN , Siva P. ADUSUMILLI , Yves T. NGU
IPC: H01L23/00
Abstract: The present disclosure relates to an active x-ray attack prevention structure for secure integrated circuits. In particular, the present disclosure relates to a structure including a functional circuit, and at least one latchup sensitive diode circuit configured to induce a latchup condition in the functional circuit, placed in proximity of the functional circuit.
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公开(公告)号:US20240250157A1
公开(公告)日:2024-07-25
申请号:US18099366
申请日:2023-01-20
Applicant: GlobalFoundries U.S. Inc.
Inventor: Uppili S. RAGHUNATHAN , Vibhor JAIN , Yves T. NGU , Johnatan A. KANTAROVSKY , Sebastian T. VENTRONE
CPC classification number: H01L29/7302 , H01L23/345 , H01L27/075 , H01L29/0649 , H01L29/0821 , H01L29/737
Abstract: The present disclosure relates to semiconductor structures and, more particularly, to heater terminal contacts, methods of operation and methods of manufacture. The structure includes: a heterojunction bipolar transistor having a collector, sub-collector region, emitter and base region; and heater terminal contacts electrically coupled to the sub-collector region.
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公开(公告)号:US20240249992A1
公开(公告)日:2024-07-25
申请号:US18099389
申请日:2023-01-20
Applicant: GlobalFoundries U.S. Inc.
Inventor: Uppili S. RAGHUNATHAN , Vibhor JAIN , Yves T. NGU , Johnatan A. KANTAROVSKY , Sebastian T. VENTRONE
IPC: H01L23/34 , H01L29/737
CPC classification number: H01L23/345 , H01L29/7371
Abstract: The present disclosure relates to semiconductor structures and, more particularly, to heater elements, methods of operation and methods of manufacture. The structure includes: an active device; a heater element under the active device and within a semiconductor substrate; and a contact to the heater element and the active device.
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公开(公告)号:US20230317627A1
公开(公告)日:2023-10-05
申请号:US17707273
申请日:2022-03-29
Applicant: GLOBALFOUNDRIES U.S. Inc.
Inventor: Uppili S. RAGHUNATHAN , Vibhor JAIN , Siva P. ADUSUMILLI , Yves T. NGU , Johnatan A. KANTAROVSKY , Sebastian T. VENTRONE
IPC: H01L23/552 , H01L29/737 , H01L29/06 , H01L21/764
CPC classification number: H01L23/552 , H01L29/7371 , H01L29/0649 , H01L21/764
Abstract: The present disclosure relates to semiconductor structures and, more particularly, to devices with airgap structures and methods of manufacture. The structure includes: a semiconductor substrate with a trap-rich region; one or more airgap structures within the semiconductor substrate; at least one deep trench isolation structure laterally surrounding the one or more airgap structures and extending into the semiconductor substrate; and a device over the one or more airgap structures.
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公开(公告)号:US20220320015A1
公开(公告)日:2022-10-06
申请号:US17223596
申请日:2021-04-06
Applicant: GLOBALFOUNDRIES U.S. Inc.
Inventor: Vibhor JAIN , Yusheng BIAN , Yves T. NGU , Sunil K. SINGH , Sebastian T. VENTRONE , Johnatan A. KANTAROVSKY
IPC: H01L23/00
Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a backside structure for optical attack mitigation and methods of manufacture. The structure includes: at least one device on a front side of a semiconductor substrate; and a plurality of grating layers under the at least one device. The plurality of grating layers includes at least a first material having a first refractive index alternating with a second material having a second refractive index.
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