公开(公告)号：US20050046845A1

公开(公告)日：2005-03-03

申请号：US10882685

申请日：2004-07-02

申请人： Gerrit Nijmeijer ,  Anastasius Jacobus Bruinsma ,  Christiaan Hoogendam ,  Jeroen Broekhuijse ,  Sigurd Dressler ,  Edwin Eduard Nicolaas Krijnen ,  Robbert Van Leeuwen ,  Roeland Vanneer ,  Cornelis Ottens

发明人： Gerrit Nijmeijer ,  Anastasius Jacobus Bruinsma ,  Christiaan Hoogendam ,  Jeroen Broekhuijse ,  Sigurd Dressler ,  Edwin Eduard Nicolaas Krijnen ,  Robbert Van Leeuwen ,  Roeland Vanneer ,  Cornelis Ottens

IPC分类号： G03F7/207 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G01B11/02

CPC分类号： G03F9/7088 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70858 ,  G03F9/7015 ,  G03F9/7096 ,  H01L21/682

摘要： A lithographic apparatus includes a measurement system including at least one optical component and at least one electrical component. The electrical component is configured to dissipate heat. The optical component is mounted on a first frame of the apparatus, and the electrical component is mounted on a second frame of the apparatus that is thermally and mechanically decoupled from the first frame. An optical coupling is provided between the first frame and the second frame.

摘要翻译： 光刻设备包括测量系统，该测量系统包括至少一个光学部件和至少一个电气部件。 电气部件被配置为散热。 光学部件安装在设备的第一框架上，并且电气部件安装在与第一框架热和机械分离的设备的第二框架上。 在第一框架和第二框架之间设置光耦合器。

公开(公告)号：US20060072087A1

公开(公告)日：2006-04-06

申请号：US10954654

申请日：2004-10-01

申请人： Jacob Frederik Klinkhamer ,  Anastasius Jacobus Bruinsma ,  Martinus Hendrikus Leenders ,  Hubert Van Mierlo

发明人： Jacob Frederik Klinkhamer ,  Anastasius Jacobus Bruinsma ,  Martinus Hendrikus Leenders ,  Hubert Van Mierlo

IPC分类号： G03B27/42

CPC分类号： G03B27/42 ,  G03F9/7084 ,  G03F9/7088

摘要： An embodiment of the invention may be applied to measure the positions of features in a alignment region on a mask with a sensor. The positions of the features in the alignment region are known from the design. A feature of which the position is measured, is identified by comparing the relative positions between measured features with relative positions known from the design. The known position of the identified feature is subtracted from a measured position of the identified feature to give the position of the mask.

摘要翻译： 可以应用本发明的实施例来测量具有传感器的掩模上的对准区域中的特征的位置。 从设计中已知对准区域中的特征的位置。 通过将测量的特征与从设计已知的相对位置进行比较来识别测量位置的特征。 从所识别的特征的测量位置减去识别的特征的已知位置，以给出掩模的位置。

公开(公告)号：US20060138347A1

公开(公告)日：2006-06-29

申请号：US11022593

申请日：2004-12-29

申请人： Anastasius Jacobus Bruinsma ,  Frank Staals ,  Robert Wijk ,  Stoyan Nihtianov

发明人： Anastasius Jacobus Bruinsma ,  Frank Staals ,  Robert Wijk ,  Stoyan Nihtianov

IPC分类号： G01N23/00 ,  G21G5/00

CPC分类号： G01B17/00 ,  G01S15/46 ,  G03F9/7034

摘要： The invention relates to a level sensor for use in a lithographic apparatus that determines a surface height of a substrate. The level sensor includes an emitter and a receiver, wherein the emitter is arranged to emit a signal directed to a predetermined position on the surface of the substrate, such that the signal is at least partially reflected by the substrate to render a reflected signal. The receiver is arranged to receive at least part of the reflected signal, and the level sensor is arranged to determine the surface height of the substrate with respect to the level sensor based on the emitted and received signal. The signal includes a pressure wave.