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公开(公告)号：US06396068B1
公开(公告)日：2002-05-28
申请号：US09678419
申请日：2000-10-02
申请人： William C. Sweatt , Glenn D. Kubiak
发明人： William C. Sweatt , Glenn D. Kubiak
IPC分类号： G01J100
CPC分类号： G21K5/04
摘要： An illumination system includes several discharge sources that are multiplexed together to reduce the amount of debris generated. The system includes: (a) a first electromagnetic radiation source array that includes a plurality of first activatable radiation source elements that are positioned on a first movable carriage; (b) a second electromagnetic radiation source array that includes a plurality of second activatable radiation source elements that are positioned on a second movable carriage; (c) means for directing electromagnetic radiation from the first electromagnetic radiation source array and electromagnetic radiation from the second electromagnetic radiation source array toward a common optical path; (d) means for synchronizing (i) the movements of the first movable carriage and of the second movable carriage and (ii) the activation of the first electromagnetic radiation source array and of the second electromagnetic radiation source array to provide an essentially continuous illumination of electromagnetic radiation along the common optical path.
摘要翻译： 照明系统包括多个放电源，其被多路复用在一起以减少产生的碎屑的量。 该系统包括：（a）第一电磁辐射源阵列，其包括定位在第一可移动滑架上的多个第一可激活的辐射源元件; （b）第二电磁辐射源阵列，其包括定位在第二可移动滑架上的多个第二可激活的辐射源元件; （c）用于将来自第一电磁辐射源阵列的电磁辐射和来自第二电磁辐射源阵列的电磁辐射引向公共光路的装置; （d）用于同步（i）第一可移动滑架和第二可移动滑架的运动的装置，以及（ii）第一电磁辐射源阵列和第二电磁辐射源阵列的激活，以提供基本上连续的照明 沿着公共光路的电磁辐射。
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公开(公告)号：US06563907B1
公开(公告)日：2003-05-13
申请号：US10005600
申请日：2001-12-07
申请人： Glenn D. Kubiak , William C. Sweatt
发明人： Glenn D. Kubiak , William C. Sweatt
IPC分类号： G21G400
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70083 , H05H2240/00
摘要： Employing a source of radiation, such as an electric discharge source, that is equipped with a capillary region configured into some predetermined shape, such as an arc or slit, can significantly improve the amount of flux delivered to the lithographic wafers while maintaining high efficiency. The source is particularly suited for photolithography systems that employs a ringfield camera. The invention permits the condenser which delivers critical illumination to the reticle to be simplified from five or more reflective elements to a total of three or four reflective elements thereby increasing condenser efficiency. It maximizes the flux delivered and maintains a high coupling efficiency. This architecture couples EUV radiation from the discharge source into a ring field lithography camera.
摘要翻译： 使用诸如放电源的辐射源（如放电源）配置有一些预定形状的诸如电弧或狭缝的毛细管区域，可以显着提高输送到光刻晶片的磁通量，同时保持高效率。 该光源特别适用于采用环形相机的光刻系统。 本发明允许将对光罩进行临界照明的冷凝器从五个或更多个反射元件简化为总共三个或四个反射元件，从而提高冷凝器效率。 它最大限度地提高了焊剂的流动，保持了高的耦合效率。 该架构将EUV辐射从放电源耦合到环形光刻照相机中。
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公开(公告)号：US06285737B1
公开(公告)日：2001-09-04
申请号：US09489163
申请日：2000-01-21
申请人： William C. Sweatt , Glenn D. Kubiak
发明人： William C. Sweatt , Glenn D. Kubiak
IPC分类号： G02B508
CPC分类号： B82Y10/00 , G02B17/00 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70166 , G03F7/702 , G03F7/70916 , G03F7/70983
摘要： Condenser system, for use with a ringfield camera in projection lithography, employs quasi grazing-incidence collector mirrors that are coated with a suitable reflective metal such as ruthenium to collect radiation from a discharge source to minimize the effect of contaminant accumulation on the collecting mirrors.
摘要翻译： 用于投影光刻中的环形相机的冷凝器系统采用准放射入射收集器反射镜，其被诸如钌的合适的反射金属涂覆以收集来自放电源的辐射，以最小化污染物积聚对收集反射镜的影响。
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4.发明授权公开(公告)号：US06875544B1
公开(公告)日：2005-04-05
申请号：US10264536
申请日：2002-10-03
IPC分类号： G03F1/14 , G03F1/16 , G03F7/20 , G03F9/00 , H01L21/027
摘要： A method for the fabrication of three-dimensional microstructures by deep X-ray lithography (DXRL) comprises a masking process that uses a patterned mask with inclined mask holes and off-normal exposures with a DXRL beam aligned with the inclined mask holes. Microstructural features that are oriented in different directions can be obtained by using multiple off-normal exposures through additional mask holes having different orientations. Various methods can be used to block the non-aligned mask holes from the beam when using multiple exposures. A method for fabricating a precision 3D X-ray mask comprises forming an intermediate mask and a master mask on a common support membrane.
摘要翻译： 通过深X射线光刻（DXRL）制造三维微结构的方法包括使用具有倾斜掩模孔的图案化掩模和具有与倾斜掩模孔对准的DXRL光束的不正常曝光的掩模工艺。 通过使用具有不同取向的附加掩模孔使用多次非正规曝光，可以获得在不同方向上定向的微结构特征。 当使用多次曝光时，可以使用各种方法来阻挡来自光束的未对准掩模孔。 制造精密3D X射线掩模的方法包括在公共支撑膜上形成中间掩模和母掩模。
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公开(公告)号：US06859120B2
公开(公告)日：2005-02-22
申请号：US10356157
申请日：2003-01-31
CPC分类号： G02B6/3524 , G02B6/3528 , G02B6/3556 , G02B6/3572 , G02B6/3584
摘要： An optical switch using Risley prisms and rotary microactuators to independently rotate the wedge prisms of each Risley prism pair is disclosed. The optical switch comprises an array of input Risley prism pairs that selectively redirect light beams from a plurality of input ports to an array of output Risley prism pairs that similarly direct the light beams to a plurality of output ports. Each wedge prism of each Risley prism pair can be independently rotated by a variable-reluctance stepping rotary microactuator that is fabricated by a multi-layer LIGA process. Each wedge prism can be formed integral to the annular rotor of the rotary microactuator by a DXRL process.
摘要翻译： 公开了一种使用Risley棱镜和旋转微型致动器来独立旋转每个Risley棱镜对的楔形棱镜的光学开关。 光开关包括输入Risley棱镜对的阵列，其选择性地将来自多个输入端口的光束重定向到类似地将光束引导到多个输出端口的输出Risley棱镜对的阵列。 每个Risley棱镜对的每个楔形棱镜可以通过由多层LIGA工艺制造的可变磁阻步进旋转微型致动器独立旋转。 每个楔形棱镜可以通过DXRL工艺与旋转微型致动器的环形转子一体形成。
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公开(公告)号：US06589716B2
公开(公告)日：2003-07-08
申请号：US09742778
申请日：2000-12-20
IPC分类号： G03C500
CPC分类号： G02B27/62 , G02B6/12004 , G02B6/1221 , G02B6/138 , G02B6/4204 , G02B2006/12102 , G02B2006/12107 , G02B2006/12114 , G03F7/0005 , G03F7/0017 , G03F7/203 , G03F7/2039
摘要： Microoptical systems with clear aperture of about one millimeter or less are fabricated from a layer of photoresist using a lithographic process to define the optical elements. A deep X-ray source is typically used to expose the photoresist. Exposure and development of the photoresist layer can produce planar, cylindrical, and radially symmetric micro-scale optical elements, comprising lenses, mirrors, apertures, diffractive elements, and prisms, monolithically formed on a common substrate with the mutual optical alignment required to provide the desired system functionality. Optical alignment can be controlled to better than one micron accuracy. Appropriate combinations of structure and materials enable optical designs that include corrections for chromatic and other optical aberrations. The developed photoresist can be used as the basis for a molding operation to produce microoptical systems made of a range of optical materials. Finally, very complex microoptical systems can be made with as few as three lithographic exposures.
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7.发明授权公开(公告)号：US06469827B1
公开(公告)日：2002-10-22
申请号：US09631617
申请日：2000-08-04
IPC分类号： G02B508
CPC分类号： G03F7/70158 , G02B27/30 , G03F7/70066 , G03F7/70191 , G03F7/702 , G03F7/70575 , G03F7/70875 , G21K1/06 , G21K1/10 , G21K2201/06 , G21K2201/064 , G21K2201/067
摘要： A condenser system for generating a beam of radiation includes a source of radiation light that generates a continuous spectrum of radiation light; a condenser comprising one or more first optical elements for collecting radiation from the source of radiation light and for generating a beam of radiation; and a diffractive spectral filter for separating first radiation light having a particular wavelength from the continuous spectrum of radiation light. Cooling devices can be employed to remove heat generated. The condenser system can be used with a ringfield camera in projection lithography.
摘要翻译： 用于产生辐射束的聚光器系统包括产生连续的辐射光谱的辐射光源; 冷凝器，包括用于收集来自辐射源的辐射并用于产生辐射束的一个或多个第一光学元件; 以及用于将具有特定波长的第一辐射光与辐射光的连续光谱分离的衍射光谱滤波器。 可以使用冷却装置来除去产生的热量。 冷凝器系统可与投影光刻中的环形相机一起使用。
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公开(公告)号：US6060224A
公开(公告)日：2000-05-09
申请号：US231909
申请日：1999-01-14
CPC分类号： G03F7/70091 , G02B26/0841 , G03F7/70291 , Y10S359/904
摘要： The present invention provides a method for maskless lithography. A plurality of individually addressable and rotatable micromirrors together comprise a two-dimensional array of micromirrors. Each micromirror in the two-dimensional array can be envisioned as an individually addressable element in the picture that comprises the circuit pattern desired. As each micromirror is addressed it rotates so as to reflect light from a light source onto a portion of the photoresist coated wafer thereby forming a pixel within the circuit pattern. By electronically addressing a two-dimensional array of these micromirrors in the proper sequence a circuit pattern that is comprised of these individual pixels can be constructed on a microchip. The reflecting surface of the micromirror is configured in such a way as to overcome coherence and diffraction effects in order to produce circuit elements having straight sides.
摘要翻译： 本发明提供一种无掩模光刻的方法。 多个独立可寻址和可旋转的微镜一起包括微镜的二维阵列。 可以将二维阵列中的每个微镜视为包括所需电路图案的图像中的可单独寻址的元件。 随着每个微镜被寻址，其旋转以将来自光源的光反射到光刻胶涂覆的晶片的一部分上，从而在电路图案内形成像素。 通过以适当的顺序电子地寻址这些微镜的二维阵列，可以在微芯片上构建由这些单独像素构成的电路图案。 微镜的反射表面被配置为克服相干和衍射效应，以便产生具有直边的电路元件。
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公开(公告)号：US5473475A
公开(公告)日：1995-12-05
申请号：US10935
申请日：1993-01-29
申请人： William C. Sweatt , Lynn Seppala
发明人： William C. Sweatt , Lynn Seppala
CPC分类号： G02B27/0983 , G02B27/09 , G02B27/0911 , G02B5/10 , H01S3/005 , H01S3/094034
摘要： A technique is disclosed herein in which a circular optical beam, for example a copper vapor laser (CVL) beam, is converted to a beam having a profile other than circular, e.g. square or triangular. This is accomplished by utilizing a single optical mirror having a reflecting surface designed in accordance with a specifically derived formula in order to make the necessary transformation, without any substantial light loss and without changing substantially the intensity profile of the circular beam which has a substantially uniform intensity profile. In this way, the output beam can be readily directed into the dye cell of a dye laser.
摘要翻译： 本文公开了一种技术，其中圆形光束，例如铜蒸气激光（CVL）光束被转换成具有除圆形外形的光束，例如， 正方形或三角形。 这是通过利用具有根据具体导出的公式设计的反射表面的单个光学镜来实现的，以便进行必要的变换，而没有任何实质的光损失，并且基本上不改变具有基本上均匀的圆形光束的强度分布 强度分布。 以这种方式，输出光束可以容易地被引导到染料激光器的染料单元中。
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10.发明授权Dye lasing arrangement including an optical assembly for altering the cross-section of its pumping beam and method 失效染料激光装置包括用于改变其泵浦光束横截面的光学组件和方法
公开(公告)号：US5148442A
公开(公告)日：1992-09-15
申请号：US363310
申请日：1989-06-08
CPC分类号： H01S3/213 , H01S3/094034
摘要： An optical assembly is disclosed herein along with a method of operation for use in a dye lasing arrangement, for example a dye laser oscillator or a dye amplifier, in which a continuous stream of dye is caused to flow through a given zone in a cooperating dye chamber while the zone is being illuminated by light from a pumping beam which is directed into the given zone. This in turn causes the dye therein to lase and thereby produce a new dye beam in the case of a dye laser oscillator or amplify a dye beam in the case of a dye amplifier. The optical assembly so disclosed is designed to alter the pump beam such that the beam enters the dye chamber with a different cross-sectional configuration, preferably one having a more uniform intensity profile, than its initially produced cross-sectional configuration. To this end, the assembly includes a network of optical components which first act on the beam while the latter retains its initially produced cross-sectional configuration for separating it into a plurality of predetermined segments and then recombines the separated components in a predetermined way which causes the recombined beam to have the different cross-sectional configuration.
摘要翻译： 本文公开了一种光学组件以及用于染料激光装置中的操作方法，例如染料激光振荡器或染料放大器，其中连续的染料流流过协作染料中的给定区域 该区域被来自被引导到给定区域中的泵送光束的光照亮。 这又导致染料在其中染色，从而在染料激光振荡器的情况下产生新的染料束，或者在染料放大器的情况下放大染料束。 如此公开的光学组件被设计成改变泵浦光束，使得光束以不同于其最初产生的横截面构造的不同横截面构造（优选地具有更均匀的强度分布）进入染料室。 为此，组件包括首先作用在梁上的光学部件的网络，而后者保持其初始产生的横截面构造，用于将其分离成多个预定的段，然后以预定的方式重新组合分离的部件，这导致 重组梁具有不同的横截面构造。
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