公开(公告)号：US07385196B2

公开(公告)日：2008-06-10

申请号：US10911480

申请日：2004-08-05

申请人： Goroku Shimoma ,  Tadashi Otaka ,  Mitsugu Sato ,  Hideo Todokoro ,  Shunichi Watanabe ,  Tadanori Takahashi ,  Masahiro Kawawa ,  Masanori Gunji ,  Terumichi Nishino

发明人： Goroku Shimoma ,  Tadashi Otaka ,  Mitsugu Sato ,  Hideo Todokoro ,  Shunichi Watanabe ,  Tadanori Takahashi ,  Masahiro Kawawa ,  Masanori Gunji ,  Terumichi Nishino

IPC分类号： H01J37/28

CPC分类号： H01J37/28 ,  H01J2237/2814

摘要： A width-measurement method of reducing or eliminating an error in measurement of a width of an object on a sample resulting from the dimension of the beam diameter, wherein a width-measured value of the object to be width-measured which has been obtained on the basis of a secondary signal obtained from secondary particles emitted from the sample having thereon the object to be width-measured is corrected with a value with respect to a dimension value of a beam diameter.

摘要翻译： 一种宽度测量方法，用于减少或消除由光束直径尺寸导致的样品宽度测量误差，其中宽度测量对象的宽度测量值已经在 从其上具有待宽度测量对象的样品发射的二次粒子获得的二次信号的基础用相对于束直径的尺寸值的值进行校正。

公开(公告)号：US06791084B2

公开(公告)日：2004-09-14

申请号：US10246453

申请日：2002-09-19

申请人： Goroku Shimoma ,  Tadashi Otaka ,  Mitsugu Sato ,  Hideo Todokoro ,  Shunichi Watanabe ,  Tadanori Takahashi ,  Masahiro Kawawa ,  Masanori Gunji ,  Terumichi Nishino

发明人： Goroku Shimoma ,  Tadashi Otaka ,  Mitsugu Sato ,  Hideo Todokoro ,  Shunichi Watanabe ,  Tadanori Takahashi ,  Masahiro Kawawa ,  Masanori Gunji ,  Terumichi Nishino

IPC分类号： H01J3728

CPC分类号： H01J37/28 ,  H01J2237/2814

摘要： A width-measurement method of reducing or eliminating an error in measurement of a width of an object on a sample resulting from the dimension of the beam diameter, wherein a width-measured value of the object to be width-measured which has been obtained on the basis of a secondary signal obtained from secondary particles emitted from the sample having thereon the object to be width-measured is corrected with a value with respect to a dimension value of a beam diameter.

摘要翻译： 一种宽度测量方法，用于减少或消除由光束直径尺寸导致的样品宽度测量误差，其中宽度测量对象的宽度测量值已经在 从其上具有待宽度测量对象的样品发射的二次粒子获得的二次信号的基础用相对于束直径的尺寸值的值进行校正。

公开(公告)号：US20050006581A1

公开(公告)日：2005-01-13

申请号：US10911480

申请日：2004-08-05

申请人： Goroku Shimoma ,  Tadashi Otaka ,  Mitsugu Sato ,  Hideo Todokoro ,  Shunichi Watanabe ,  Tadanori Takahashi ,  Masahiro Kawawa ,  Masanori Gunji ,  Terumichi Nishino

发明人： Goroku Shimoma ,  Tadashi Otaka ,  Mitsugu Sato ,  Hideo Todokoro ,  Shunichi Watanabe ,  Tadanori Takahashi ,  Masahiro Kawawa ,  Masanori Gunji ,  Terumichi Nishino

IPC分类号： G01B15/00 ,  H01J37/22 ,  H01J37/28 ,  H01L21/66 ,  G01N23/00

CPC分类号： H01J37/28 ,  H01J2237/2814

摘要： A width-measurement method of reducing or eliminating an error in measurement of a width of an object on a sample resulting from the dimension of the beam diameter, wherein a width-measured value of the object to be width-measured which has been obtained on the basis of a secondary signal obtained from secondary particles emitted from the sample having thereon the object to be width-measured is corrected with a value with respect to a dimension value of a beam diameter.

摘要翻译： 一种宽度测量方法，用于减少或消除由光束直径尺寸导致的样品宽度测量误差，其中宽度测量对象的宽度测量值已经在 从其上具有待宽度测量对象的样品发射的二次粒子获得的二次信号的基础用相对于束直径的尺寸值的值进行校正。

公开(公告)号：US09176075B2

公开(公告)日：2015-11-03

申请号：US13390958

申请日：2010-06-21

申请人： Masanori Gunji ,  Tomonari Morioka ,  Hiroshi Akiyama ,  Hideki Fukushima

发明人： Masanori Gunji ,  Tomonari Morioka ,  Hiroshi Akiyama ,  Hideki Fukushima

IPC分类号： G01N21/00 ,  G01N21/956 ,  G01N21/94

CPC分类号： G01N21/95623 ,  G01N21/94

摘要： Provided are a contamination inspection method and a contamination inspection device for highly accurately detecting a defect in a wafer, a liquid crystal substrate and media or the like including patterns, for example, a semiconductor device or the like. The first aspect of the present invention is a contamination inspection device comprising: an irradiation optical system for irradiating lights on the inspection target substrate; and a spatial filter for shading diffracted lights form the inspection target substrate. Herein, the spatial filter comprises: a plurality of light shading materials; a control member for changing at least one of parameters selected from a shape, an angle and an interval with respect to the light shading material, and a control unit for controlling the control members.

摘要翻译： 提供了用于高精度地检测包括图案的晶片，液晶基板和介质等的缺陷的污染检查方法和污染检查装置，例如半导体装置等。 本发明的第一方面是一种污染检查装置，包括：照射光学系统，用于在检查对象基板上照射光; 并且用于遮蔽衍射光的空间滤光器形成检查对象基板。 这里，空间滤波器包括：多个遮光材料; 用于改变相对于遮光材料的形状，角度和间隔中选择的参数中的至少一个的控制构件，以及用于控制控制构件的控制单元。

公开(公告)号：US07212725B2

公开(公告)日：2007-05-01

申请号：US10155231

申请日：2002-05-28

申请人： Masanori Gunji ,  Hideo Kataoka ,  Takahisa Yoneyama

发明人： Masanori Gunji ,  Hideo Kataoka ,  Takahisa Yoneyama

IPC分类号： H04N5/91

CPC分类号： G11B27/34 ,  G11B27/034 ,  G11B27/105 ,  G11B27/3027 ,  G11B27/329 ,  G11B2220/211 ,  G11B2220/213 ,  G11B2220/2516 ,  G11B2220/2562 ,  G11B2220/455 ,  H04N5/781 ,  H04N5/782 ,  H04N5/85

摘要： The remaining capacity of a recording medium is calculated when picture recording reservation is made so as to permit the user to easily understand the reservation status and whether the reservation recording is possible or not. An apparatus of this invention can record and reproduce compressed video information on a contained hard disk in a format of the same DVD standard and can record and reproduce compressed video information on a removable DVD. Further, it is possible to specify a disk and make picture recording reservation and a reservation table thereof is stored in a memory. Then, picture recording reservation time information and the remaining capacity of the disk are calculated and whether or not reservation picture recording can be made can be displayed in a list form.

摘要翻译： 当进行图像记录预约时计算记录介质的剩余容量，以便允许用户容易地理解预约状态以及是否可以进行预约记录。 本发明的设备可以以相同的DVD标准的格式在所包含的硬盘上记录和再现压缩的视频信息，并且可以在可移动DVD上记录和再现压缩的视频信息。 此外，可以指定盘并使图像记录预约，并且其预约表被存储在存储器中。 然后，计算图像记录预约时间信息和盘的剩余容量，并且可以以列表形式显示预约图像记录。

公开(公告)号：US20060239649A1

公开(公告)日：2006-10-26

申请号：US11447271

申请日：2006-06-06

申请人： Masanori Gunji ,  Hideo Kataoka ,  Takahisa Yoneyama

发明人： Masanori Gunji ,  Hideo Kataoka ,  Takahisa Yoneyama

IPC分类号： H04N7/00

CPC分类号： H04N5/85 ,  G11B27/034 ,  G11B27/329 ,  G11B27/34 ,  G11B2220/2562 ,  H04N9/8042

摘要： When a program (title) is divided into a plurality of chapters, an actual program is reproduced in a moving picture reproduction region. When a chapter boundary is determined, and an Enter key of a remote controller is operated by pointing a cursor to “divide” in a button region, a thumb nail is displayed in a thumb nail display region. In this manner, a chapter can be easily visually created.

公开(公告)号：US07875156B2

公开(公告)日：2011-01-25

申请号：US12027644

申请日：2008-02-07

申请人： Masanori Gunji ,  Katsunori Nakajima ,  Yasuhiko Nara ,  Tsutomu Saito ,  Shigeru Izawa

发明人： Masanori Gunji ,  Katsunori Nakajima ,  Yasuhiko Nara ,  Tsutomu Saito ,  Shigeru Izawa

IPC分类号： C23C14/34

CPC分类号： G01R1/06705 ,  Y10T29/49826

摘要： A probe storage container can supply a probe in a prober apparatus without being exposed to an atmospheric air. Preferably, the probe is stored in the probe storage container by removing an oxide film in a leading end portion of the probe in accordance with a dry treatment using an ion source, for example, without being exposed to the atmospheric air. It is thus possible to replace and attach the probe with respect to the prober apparatus without being exposed to the atmospheric air, avoiding formation of an oxide film on a surface of the probe. Further, a worker attaching the probe to the prober apparatus can work without being directly in contact with the probe, and it is possible to prevent the leading end portion of the probe from being broken. Accordingly, it is possible to stably measure an electric characteristic of a semiconductor device or the like on the wafer.

摘要翻译： 探头存储容器可以在探测设备中提供探针而不暴露于大气中。 优选地，通过根据例如使用离子源的干燥处理而不暴露于大气中，通过除去探针的前端部分中的氧化膜来将探针存储在探针存储容器中。 因此，可以相对于探针装置替换和附接探针而不暴露于大气中，避免在探针的表面上形成氧化膜。 此外，将探头附接到探测器装置的工作者可以在不直接与探针接触的情况下工作，并且可以防止探针的前端部分破裂。 因此，可以稳定地测量晶片上的半导体器件等的电特性。

公开(公告)号：US20080260354A1

公开(公告)日：2008-10-23

申请号：US12018694

申请日：2008-01-23

申请人： Masanori Gunji ,  Hideo Kataoka ,  Takahisa Yoneyama

发明人： Masanori Gunji ,  Hideo Kataoka ,  Takahisa Yoneyama

IPC分类号： H04N7/26

CPC分类号： G11B27/034 ,  G11B27/105 ,  G11B27/28 ,  G11B27/329 ,  G11B27/34 ,  G11B2220/216 ,  G11B2220/2562 ,  G11B2220/2575 ,  G11B2220/455 ,  H04N5/781 ,  H04N5/85 ,  H04N9/8042 ,  H04N9/8063 ,  H04N9/8205 ,  H04N9/8227

摘要： A chapter is made automatically, using a location at which recording is paused and then resumed, as a chapter border.

摘要翻译： 自动进行章节，使用暂停录制的位置，然后恢复为章节边框。

公开(公告)号：US20120147364A1

公开(公告)日：2012-06-14

申请号：US13390958

申请日：2010-06-21

申请人： Masanori Gunji ,  Tomonari Morioka ,  Hiroshi Akiyama ,  Hideki Fukushima

发明人： Masanori Gunji ,  Tomonari Morioka ,  Hiroshi Akiyama ,  Hideki Fukushima

IPC分类号： G01N21/94

CPC分类号： G01N21/95623 ,  G01N21/94

摘要： Provided are a contamination inspection method and a contamination inspection device for highly accurately detecting a defect in a wafer, a liquid crystal substrate and media or the like including patterns, for example, a semiconductor device or the like. The first aspect of the present invention is a contamination inspection device comprising: an irradiation optical system for irradiating lights on the inspection target substrate; and a spatial filter for shading diffracted lights form the inspection target substrate. Herein, the spatial filter comprises: a plurality of light shading materials; a control member for changing at least one of parameters selected from a shape, an angle and an interval with respect to the light shading material, and a control unit for controlling the control members.

摘要翻译： 提供了用于高精度地检测包括图案的晶片，液晶基板和介质等的缺陷的污染检查方法和污染检查装置，例如半导体装置等。 本发明的第一方面是一种污染检查装置，包括：照射光学系统，用于在检查对象基板上照射光; 并且用于遮蔽衍射光的空间滤光器形成检查对象基板。 这里，空间滤波器包括：多个遮光材料; 用于改变相对于遮光材料的形状，角度和间隔中选择的参数中的至少一个的控制构件，以及用于控制控制构件的控制单元。

公开(公告)号：US20110093991A1

公开(公告)日：2011-04-21

申请号：US12977384

申请日：2010-12-23

申请人： Masanori Gunji ,  Katsunori Nakajima ,  Yasuhiko Nara ,  Tsutomu Saito ,  Shigeru Izawa

发明人： Masanori Gunji ,  Katsunori Nakajima ,  Yasuhiko Nara ,  Tsutomu Saito ,  Shigeru Izawa

IPC分类号： G01Q70/02

CPC分类号： G01R1/06705 ,  Y10T29/49826

摘要： An object of the present invention relates to an arrangement of a manufactured probe in a prober apparatus without being exposed to an atmospheric air.The present invention relates to a probe storage container which can supply a probe in a prober apparatus without being exposed to an atmospheric air. Preferably, the probe is stored in the probe storage container by removing an oxide film in a leading end portion of the probe in accordance with a dry treatment using an ion source or the like, without being exposed to the atmospheric air. In accordance with the present invention, it is possible to replace and attach the probe with respect to the prober apparatus without being exposed to the atmospheric air, and it is possible to avoid a formation of the oxide film on a surface of the probe. Further, a worker attaching the probe to the prober apparatus can work without being directly in contact with the probe, and it is possible to prevent the leading end portion of the probe from being broken. Accordingly, it is possible to stably measure an electric characteristic of a semiconductor device or the like on the wafer.

摘要翻译： 本发明的一个目的涉及一种制造的探针在探测设备中的布置，而不暴露于大气中。 探针存储容器本发明涉及一种探针存储容器，其可以在探测设备中提供探针而不暴露于大气中。 优选地，通过根据使用离子源等的干法处理而不暴露于大气中，通过在探针的前端部分除去氧化膜来将探针存储在探针存储容器中。 根据本发明，可以相对于探针装置替换和附接探针而不暴露于大气中，并且可以避免在探针的表面上形成氧化膜。 此外，将探头附接到探测器装置的工作者可以在不直接与探针接触的情况下工作，并且可以防止探针的前端部分破裂。 因此，可以稳定地测量晶片上的半导体器件等的电特性。