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    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    2.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：US20120262689A1

    公开(公告)日：2012-10-18

    申请号：US13517480

    申请日：2010-11-19

    申请人： Koen Van Ingen Schenau ,  Jan Bernard Plechelmus Van Schoot ,  Gosse Charles De Vries

    发明人： Koen Van Ingen Schenau ,  Jan Bernard Plechelmus Van Schoot ,  Gosse Charles De Vries

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70116 ,  G03F7/70075

    摘要： In a lithographic apparatus, an illumination mode is set using a field mirror that includes a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror. A base illumination mode is selected from a set of predetermined illumination modes and the movable facets are set to effect that mode. In order to adjust an imaging parameter, a fraction of the movable facets are set to different positions. The determination of which facets to set to different positions is based on summing the effects of setting each facet to a different position.

    摘要翻译： 在光刻设备中，使用包括多个可移动小面的场反射镜来设置照明模式，以将辐射引导到瞳孔面反射镜上的可选位置。 从一组预定照明模式中选择基本照明模式，并且可移动小面被设置为实现该模式。 为了调整成像参数，可移动小面的一部分被设定为不同的位置。 确定哪些面设置到不同的位置是基于将每个方面设置为不同位置的效果的总和。

    Illumination system for lithographic apparatus with control system to effect an adjustment of an imaging parameter
    5.
    发明授权
    Illumination system for lithographic apparatus with control system to effect an adjustment of an imaging parameter 有权
    用于具有控制系统的光刻设备的照明系统以实现成像参数的调整

    公开(公告)号：US09052605B2

    公开(公告)日：2015-06-09

    申请号：US13517480

    申请日：2010-11-19

    申请人： Koen Van Ingen Schenau ,  Jan Bernard Plechelmus Van Schoot ,  Gosse Charles De Vries

    发明人： Koen Van Ingen Schenau ,  Jan Bernard Plechelmus Van Schoot ,  Gosse Charles De Vries

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70116 ,  G03F7/70075

    摘要： In a lithographic apparatus, an illumination mode is set using a field mirror that includes a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror. A base illumination mode is selected from a set of predetermined illumination modes and the movable facets are set to effect that mode. In order to adjust an imaging parameter, a fraction of the movable facets are set to different positions. The determination of which facets to set to different positions is based on summing the effects of setting each facet to a different position.

    摘要翻译： 在光刻设备中，使用包括多个可移动小面的场反射镜来设置照明模式，以将辐射引导到瞳孔面反射镜上的可选位置。 从一组预定照明模式中选择基本照明模式，并且可移动小面被设置为实现该模式。 为了调整成像参数，可移动小面的一部分被设定为不同的位置。 确定哪些面设置到不同的位置是基于将每个方面设置为不同位置的效果的总和。

    LITHOGRAPHIC APPARATUS AND METHOD
    6.
    发明申请
    LITHOGRAPHIC APPARATUS AND METHOD 审中-公开
    LITHOGRAPHIC设备和方法

    公开(公告)号：US20120105818A1

    公开(公告)日：2012-05-03

    申请号：US13378913

    申请日：2010-06-07

    申请人： Jan Bernard Plechelmus Van Schoot ,  Gosse Charles De Vries

    发明人： Jan Bernard Plechelmus Van Schoot ,  Gosse Charles De Vries

    IPC分类号： G03B27/54 ,  F21V7/04

    CPC分类号： G03F7/702 ,  G03F7/70075 ,  G03F7/70116

    摘要： An illumination system having a plurality of reflective elements, the reflective elements being movable between different orientations which direct radiation towards different locations in a pupil plane, thereby forming different illumination modes. Each reflective element is moveable to a first orientation in which it directs radiation to a location in an inner illumination location group, to a second orientation in which it directs radiation to a location in an intermediate illumination location group, and to a third orientation in which it directs radiation to a location in an outer illumination location group. The reflective elements are configured to be oriented to direct equal amounts of radiation towards the inner, intermediate and outer illumination location groups, and are configured to be oriented such that they can direct substantially no radiation into the outer illumination location group and direct substantially equal amounts of radiation towards the inner and intermediate illumination location groups.

    摘要翻译： 一种具有多个反射元件的照明系统，所述反射元件可在不同取向之间移动，所述不同取向将辐射导向光瞳平面中的不同位置，从而形成不同的照明模式。 每个反射元件可移动到第一取向，其中它将辐射引导到内照明位置组中的位置，到第二方向，其中它将辐射引导到中间照明位置组中的位置，并且其中第三方向 它将辐射引导到外部照明位置组中的位置。 反射元件被配置为被定向成将等量的辐射引导到内部，中间和外部照明位置组，并且被配置为被定向成使得它们可以基本上不将辐射引导到外部照明位置组中并且引导基本相等的量 的辐射朝向内部和中间照明位置组。

    ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND ILLUMINATION METHOD
    8.
    发明申请
    ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND ILLUMINATION METHOD 审中-公开
    照明系统，光刻设备和照明方法

    公开(公告)号：US20120262690A1

    公开(公告)日：2012-10-18

    申请号：US13518301

    申请日：2010-11-29

    申请人： Wilhelmus Petrus De Boeij ,  Erik Roelof Loopstra ,  Uwe Mickan ,  Jan Bernard Plechelmus Van Schoot ,  Gosse Charles De Vries

    发明人： Wilhelmus Petrus De Boeij ,  Erik Roelof Loopstra ,  Uwe Mickan ,  Jan Bernard Plechelmus Van Schoot ,  Gosse Charles De Vries

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70116 ,  G03F7/70075

    摘要： An illumination system includes a field-facet mirror-device and a pupil mirror configured to condition a beam of radiation incident on the field-facet mirror-device. The field-facet mirror-device includes reflective field facets movable between first and second orientations relative to the incident beam. The field facets in their first orientations are effective to reflect the incident radiation towards respective reflective pupil facets so as to form part of a conditioned beam reflected from the pupil-facet mirror-device. The field facets in their second orientations are effective to reflect the incident radiation onto respective areas of the pupil-facet mirror-device designated as beam dump areas. The areas are arranged to prevent radiation incident on the areas from forming part of the conditioned beam and are arranged between the limits of an annular area on the pupil-facet mirror-device effective to define the inner and outer regions of the conditioned beam reflected from the pupil-facet mirror-device.

    摘要翻译： 照明系统包括场分面镜装置和配置成调节入射在场面镜装置上的辐射束的光瞳镜。 场面反射镜装置包括相对于入射光束在第一和第二取向之间移动的反射场面。 其第一取向中的场小面有效地将入射辐射反射到各个反射光瞳面，以便形成从瞳孔面反射镜装置反射的条件光束的一部分。 其第二取向中的场面有效地将入射的辐射反射到被指定为光束聚集区域的瞳孔面反射镜装置的相应区域上。 这些区域被布置成防止入射到区域上的辐射形成调节梁的一部分，并且被布置在瞳孔面反射镜装置上的环形区域的极限之间，有效地限定条件束的内部和外部区域从 瞳孔面反射镜。

    Illumination system, lithographic apparatus and method of forming an illumination mode
    9.
    发明授权
    Illumination system, lithographic apparatus and method of forming an illumination mode 有权
    照明系统，光刻设备和形成照明模式的方法

    公开(公告)号：US09134629B2

    公开(公告)日：2015-09-15

    申请号：US13203773

    申请日：2010-02-25

    申请人： Erik Roelof Loopstra ,  Koen Van Ingen Schenau ,  Jan Bernard Plechelmus Van Schoot ,  Christian Wagner ,  Gosse Charles De Vries

    发明人： Erik Roelof Loopstra ,  Koen Van Ingen Schenau ,  Jan Bernard Plechelmus Van Schoot ,  Christian Wagner ,  Gosse Charles De Vries

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70825 ,  G03F7/70075 ,  G03F7/70116

    摘要： An illumination system of a lithographic apparatus includes a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations, the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation, which directs radiation towards a first location the pupil plane, and a second orientation, which directs radiation towards a second location in the pupil plane. The first orientation and the second orientation of the reflective element are defined by end stops.

    摘要翻译： 光刻设备的照明系统包括被布置成接收来自辐射源的辐射的多个反射元件，所述反射元件可在不同取向之间移动。 在不同的取向中，反射元件将辐射定向到照明系统的光瞳平面中的反射分量处的不同位置，从而形成不同的照明模式。 每个反射元件可以在将辐射引导到瞳孔平面的第一位置的第一取向和朝向瞳孔平面中的第二位置引导辐射的第二取向之间移动。 反射元件的第一方向和第二方向由端点限定。