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    Illumination system, lithographic apparatus and method of forming an illumination mode
    1.
    发明授权
    Illumination system, lithographic apparatus and method of forming an illumination mode 有权
    照明系统，光刻设备和形成照明模式的方法

    公开(公告)号：US09134629B2

    公开(公告)日：2015-09-15

    申请号：US13203773

    申请日：2010-02-25

    申请人： Erik Roelof Loopstra ,  Koen Van Ingen Schenau ,  Jan Bernard Plechelmus Van Schoot ,  Christian Wagner ,  Gosse Charles De Vries

    发明人： Erik Roelof Loopstra ,  Koen Van Ingen Schenau ,  Jan Bernard Plechelmus Van Schoot ,  Christian Wagner ,  Gosse Charles De Vries

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70825 ,  G03F7/70075 ,  G03F7/70116

    摘要： An illumination system of a lithographic apparatus includes a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations, the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation, which directs radiation towards a first location the pupil plane, and a second orientation, which directs radiation towards a second location in the pupil plane. The first orientation and the second orientation of the reflective element are defined by end stops.

    摘要翻译： 光刻设备的照明系统包括被布置成接收来自辐射源的辐射的多个反射元件，所述反射元件可在不同取向之间移动。 在不同的取向中，反射元件将辐射定向到照明系统的光瞳平面中的反射分量处的不同位置，从而形成不同的照明模式。 每个反射元件可以在将辐射引导到瞳孔平面的第一位置的第一取向和朝向瞳孔平面中的第二位置引导辐射的第二取向之间移动。 反射元件的第一方向和第二方向由端点限定。

    ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF FORMING AN ILLUMINATION MODE
    2.
    发明申请
    ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF FORMING AN ILLUMINATION MODE 有权
    照明系统，光刻设备和形成照明模式的方法

    公开(公告)号：US20120013882A1

    公开(公告)日：2012-01-19

    申请号：US13203773

    申请日：2010-02-25

    申请人： Erik Roelof Loopstra ,  Koen Van Ingen Schenau ,  Jan Bernard Plechelmus Van Schoot ,  Christian Wagner ,  Gosse Charles De Vries

    发明人： Erik Roelof Loopstra ,  Koen Van Ingen Schenau ,  Jan Bernard Plechelmus Van Schoot ,  Christian Wagner ,  Gosse Charles De Vries

    IPC分类号： G03B27/54 ,  F21V17/02

    CPC分类号： G03F7/70825 ,  G03F7/70075 ,  G03F7/70116

    摘要： An illumination system of a lithographic apparatus includes a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations, the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation, which directs radiation towards a first location the pupil plane, and a second orientation, which directs radiation towards a second location in the pupil plane. The first orientation and the second orientation of the reflective element are defined by end stops.

    摘要翻译： 光刻设备的照明系统包括被布置成接收来自辐射源的辐射的多个反射元件，所述反射元件可在不同取向之间移动。 在不同的取向中，反射元件将辐射定向到照明系统的光瞳平面中的反射分量处的不同位置，从而形成不同的照明模式。 每个反射元件可以在将辐射引导到瞳孔平面的第一位置的第一取向和朝向瞳孔平面中的第二位置引导辐射的第二取向之间移动。 反射元件的第一方向和第二方向由端点限定。

    Radiation Source
    3.
    发明申请
    Radiation Source 有权
    辐射源

    公开(公告)号：US20140211184A1

    公开(公告)日：2014-07-31

    申请号：US14241986

    申请日：2012-07-27

    申请人： Christian Wagner ,  Erik Roelof Loopstra

    发明人： Christian Wagner ,  Erik Roelof Loopstra

    IPC分类号： G03F7/20 ,  G02B27/28 ,  H05G2/00

    CPC分类号： H05G2/008 ,  G02B27/283 ,  G03F7/70025 ,  G03F7/70033 ,  G03F7/70983 ,  H01S3/0064 ,  H01S3/2316 ,  H01S3/2333 ,  H05G2/003 ,  H05G2/005

    摘要： According to a first aspect of the present invention, there is provided a radiation source comprising: a nozzle configured to direct a stream of fuel droplets (70) along a trajectory towards a plasma formation location; a laser configured to direct laser radiation at a fuel droplet at the plasma formation location to generate, in use, a radiation generating plasma; wherein the laser comprises: a seed laser (50) for providing a seed laser beam (52); a beam splitter (54) for receiving the seed laser beam from the seed laser; an optical amplifier (58) for receiving the seed laser beam from the beam splitter and performing optical amplification; a first reflector (60) located downstream of the optical amplifier, configured to direct the seed laser beam back through the optical amplifier and on to the beam splitter; and a second reflector (70) located further downstream of the beam splitter, configured to receive the seed laser beam from the beam splitter and to direct at least a portion of the seed laser beam back toward the beam splitter.

    摘要翻译： 根据本发明的第一方面，提供了一种辐射源，包括：喷嘴，被配置为沿着轨迹朝着等离子体形成位置引导燃料液滴流（70）; 激光器，被配置为在等离子体形成位置处的燃料液滴处引导激光辐射，以在使用中产生辐射产生等离子体; 其中所述激光器包括：种子激光器（50），用于提供种子激光束（52）; 用于从种子激光器接收种子激光束的分束器（54）; 用于从分束器接收种子激光束并进行光放大的光放大器（58） 位于所述光放大器下游的第一反射器（60），被配置为将所述种子激光束引导通过所述光放大器并且返回到所述分束器; 以及位于所述分束器的更下游的第二反射器（70），被配置为从所述分束器接收所述种子激光束并将所述种子激光束的至少一部分引导回所述分束器。

    RADIATION SOURCE AND LITHOGRAPHIC APPARATUS
    4.
    发明申请
    RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 审中-公开
    辐射源和光刻设备

    公开(公告)号：US20140218706A1

    公开(公告)日：2014-08-07

    申请号：US14241370

    申请日：2012-07-27

    申请人： Christian Wagner ,  Erik Roelof Loopstra

    发明人： Christian Wagner ,  Erik Roelof Loopstra

    IPC分类号： G03F7/20 ,  H05G2/00

    CPC分类号： G03F7/70058 ,  G03F7/70025 ,  G03F7/70033 ,  H01S3/08009 ,  H01S3/0804 ,  H01S3/08059 ,  H01S3/105 ,  H01S3/123 ,  H01S3/2232 ,  H05G2/006 ,  H05G2/008

    摘要： A radiation source comprises a nozzle configured to direct a stream of fuel droplets (400) along a trajectory towards a plasma formation location and a laser configured to direct laser radiation to the plasma formation location to convert the fuel droplets at the plasma formation location into a plasma. The laser comprises an amplifier (310, 320) and an optical element (500) configured to define a divergent beam path for radiation passing through the amplifier.

    摘要翻译： 辐射源包括喷嘴，其构造成沿着等离子体形成位置的轨迹引导燃料液滴流（400），并且配置成将激光辐射引导到等离子体形成位置以将等离子体形成位置处的燃料液滴转换成等离子体形成位置 等离子体。 激光器包括放大器（310,320）和光学元件（500），其被配置为限定用于通过放大器的辐射的发散光束路径。

    Radiation source
    5.
    发明授权
    Radiation source 有权
    辐射源

    公开(公告)号：US09516732B2

    公开(公告)日：2016-12-06

    申请号：US14241986

    申请日：2012-07-27

    申请人： Christian Wagner ,  Erik Roelof Loopstra

    发明人： Christian Wagner ,  Erik Roelof Loopstra

    IPC分类号： H05G2/00 ,  G03F7/20 ,  H01S3/23 ,  H01S3/00 ,  G02B27/28

    CPC分类号： H05G2/008 ,  G02B27/283 ,  G03F7/70025 ,  G03F7/70033 ,  G03F7/70983 ,  H01S3/0064 ,  H01S3/2316 ,  H01S3/2333 ,  H05G2/003 ,  H05G2/005

    摘要： According to a first aspect of the present invention, there is provided a radiation source comprising: a nozzle configured to direct a stream of fuel droplets (70) along a trajectory towards a plasma formation location; a laser configured to direct laser radiation at a fuel droplet at the plasma formation location to generate, in use, a radiation generating plasma; wherein the laser comprises: a seed laser (50) for providing a seed laser beam (52); a beam splitter (54) for receiving the seed laser beam from the seed laser; an optical amplifier (58) for receiving the seed laser beam from the beam splitter and performing optical amplification; a first reflector (60) located downstream of the optical amplifier, configured to direct the seed laser beam back through the optical amplifier and on to the beam splitter; and a second reflector (70) located further downstream of the beam splitter, configured to receive the seed laser beam from the beam splitter and to direct at least a portion of the seed laser beam back toward the beam splitter.

    摘要翻译： 根据本发明的第一方面，提供了一种辐射源，包括：喷嘴，被配置为沿着轨迹朝着等离子体形成位置引导燃料液滴流（70）; 激光器，被配置为在等离子体形成位置处的燃料液滴处引导激光辐射，以在使用中产生辐射产生等离子体; 其中所述激光器包括：种子激光器（50），用于提供种子激光束（52）; 用于从种子激光器接收种子激光束的分束器（54）; 用于从分束器接收种子激光束并进行光放大的光放大器（58） 位于所述光放大器下游的第一反射器（60），被配置为将所述种子激光束引导通过所述光放大器并且返回到所述分束器; 以及位于所述分束器的更下游的第二反射器（70），被配置为从所述分束器接收所述种子激光束并将所述种子激光束的至少一部分引导回所述分束器。

    Neck block cooling
    8.
    发明授权
    Neck block cooling 有权
    颈部冷却

    公开(公告)号：US08002540B2

    公开(公告)日：2011-08-23

    申请号：US12223565

    申请日：2006-11-28

    申请人： Witold Neter ,  Marek Hoenisch ,  Klaus Wegmann ,  Stefan Schweininger ,  Christian Wagner

    发明人： Witold Neter ,  Marek Hoenisch ,  Klaus Wegmann ,  Stefan Schweininger ,  Christian Wagner

    IPC分类号： B29C45/73

    CPC分类号： B29C45/7312 ,  B29C33/04 ,  B29C45/33 ,  B29C2033/042 ,  B29K2105/253

    摘要： A neck block of a molding tool for the production of a hollow body preform by means of injection molding, wherein the neck block has a main body with a shaping surface which is adapted to the external contour of a neck portion of the hollow body preform to be produced and is provided to come into contact in the injection molding operation with the neck portion of the hollow body preform, wherein furthermore there is provided at least one cooling passage for a cooling fluid which at least portion-wise extends substantially parallel to the shaping surface. The neck block is further provided with an inlet and an outlet and an inlet passage and an outlet passage which connect the inlet and the outlet respectively to the cooling passage. The cooling passage is arranged closer to the shaping surface than the inlet and the outlet. The cooling passage has at least one portion which extends substantially parallel to the shaping surface and which extends within the main body so that the walls thereof are formed by the main body, and a connecting portion which adjoins said portion and the walls of which are formed in part by the main body and in part by a closure element fitted onto the main body.

    摘要翻译： 一种用于通过注射成型生产中空体预制件的模制工具的颈部块，其中颈部块具有主体，该主体具有适于中空体预制件的颈部的外部轮廓的成形表面， 被制造并且在注射成型操作中与中空本体预制件的颈部接触，此外还设置有至少一个用于冷却流体的冷却通道，该冷却通道至少部分地基本上平行于成形 表面。 颈部还设置有入口和出口以及将入口和出口分别连接到冷却通道的入口通道和出口通道。 冷却通道布置成比入口和出口更靠近成形表面。 冷却通道具有至少一部分，其基本上平行于成形表面延伸并且在主体内延伸，使得其壁由主体形成，并且连接部分邻接所述部分和壁的形成 部分地由主体部分地由安装在主体上的封闭元件构成。

    Neck Block Cooling
    9.
    发明申请
    Neck Block Cooling 有权
    颈部冷却

    公开(公告)号：US20090162473A1

    公开(公告)日：2009-06-25

    申请号：US12223565

    申请日：2006-11-28

    申请人： Witold Neter ,  Marek Hoenisch ,  Klaus Wegmann ,  Stefan Schweininger ,  Christian Wagner

    发明人： Witold Neter ,  Marek Hoenisch ,  Klaus Wegmann ,  Stefan Schweininger ,  Christian Wagner

    IPC分类号： B29C45/17

    CPC分类号： B29C45/7312 ,  B29C33/04 ,  B29C45/33 ,  B29C2033/042 ,  B29K2105/253

    摘要： A neck block of a moulding tool for the production of a hollow body preform by means of injection moulding, wherein the neck block has a main body with a shaping surface which is adapted to the external contour of a neck portion of the hollow body preform to be produced and is provided to come into contact in the injection moulding operation with the neck portion of the hollow body preform, wherein furthermore there is provided at least one cooling passage for a cooling fluid which at least portion-wise extends substantially parallel to the shaping surface. The neck block is further provided with an inlet and an outlet and an inlet passage and an outlet passage which connect the inlet and the outlet respectively to the cooling passage. The cooling passage is arranged closer to the shaping surface than the inlet and the outlet. The cooling passage has at least one portion which extends substantially parallel to the shaping surface and which extends within the main body so that the walls thereof are formed by the main body, and a connecting portion which adjoins said portion and the walls of which are formed in part by the main body and in part by a closure element fitted onto the main body.

    摘要翻译： 一种用于通过注射成型生产中空体预制件的模制工具的颈部块，其中颈部块具有主体，该主体具有适于中空体预制件的颈部的外部轮廓的成形表面， 被制造并且在注射成型操作中与中空本体预制件的颈部接触，此外还设置有至少一个用于冷却流体的冷却通道，该冷却通道至少部分地基本上平行于成形 表面。 颈部还设置有入口和出口以及将入口和出口分别连接到冷却通道的入口通道和出口通道。 冷却通道布置成比入口和出口更靠近成形表面。 冷却通道具有至少一部分，其基本上平行于成形表面延伸并且在主体内延伸，使得其壁由主体形成，并且连接部分邻接所述部分和壁的形成 部分地由主体部分地由安装在主体上的封闭元件构成。