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    Showerhead electrode assemblies and plasma processing chambers incorporating the same
    2.
    发明授权
    Showerhead electrode assemblies and plasma processing chambers incorporating the same 有权
    喷头电极组件和包括其的等离子体处理室

    公开(公告)号：US08152954B2

    公开(公告)日：2012-04-10

    申请号：US11871586

    申请日：2007-10-12

    申请人： Greg Bettencourt ,  Raj Dhindsa ,  George Diercks ,  Randall A. Hardin ,  Jon Keihl ,  Duane Lytle ,  Alexei Marakhtanov ,  Roger Patrick ,  John Pegg ,  Shannon Spencer

    发明人： Greg Bettencourt ,  Raj Dhindsa ,  George Diercks ,  Randall A. Hardin ,  Jon Keihl ,  Duane Lytle ,  Alexei Marakhtanov ,  Roger Patrick ,  John Pegg ,  Shannon Spencer

    IPC分类号： C23F1/00 ,  H01L21/306

    CPC分类号： H01J37/04 ,  C23C16/4401 ,  C23C16/45565 ,  H01J37/3255 ,  H01J37/32605 ,  H01J37/32724 ,  H01J2237/032

    摘要： The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, and securing hardware, wherein the silicon-based showerhead electrode comprises a plurality of partial recesses formed in the backside of the silicon-based showerhead electrode and backside inserts positioned in the partial recesses. The thermal control plate comprises securing hardware passages configured to permit securing hardware to access the backside inserts. The securing hardware and the backside inserts are configured to maintain engagement of the thermal control plate and the silicon-based showerhead electrode and to permit disengagement of the thermal control plate and the silicon-based showerhead electrode while isolating the silicon-based electrode material of the silicon-based showerhead electrode from frictional contact with the securing hardware during disengagement.

    摘要翻译： 本发明一般涉及等离子体处理，更具体地，涉及其中使用的等离子体处理室和电极组件。 根据本发明的一个实施例，提供一种电极组件，其包括热控制板，硅基喷头电极和固定硬件，其中硅基喷头电极包括多个部分凹部，其形成在 硅基喷头电极和位于部分凹部中的背面插入件。 热控制板包括固定硬件通道，其配置成允许固定硬件以接近背面插入件。 固定硬件和背面插入件被配置为保持热控制板和硅基喷头电极的接合，并且允许热控制板和硅基喷头电极分离，同时隔离硅基电极材料的硅基电极材料 硅基喷头电极在分离时与固定硬件摩擦接触。

    SHOWERHEAD ELECTRODE ASSEMBLIES AND PLASMA PROCESSING CHAMBERS INCORPORATING THE SAME
    4.
    发明申请
    SHOWERHEAD ELECTRODE ASSEMBLIES AND PLASMA PROCESSING CHAMBERS INCORPORATING THE SAME 有权
    淋浴电极组件和等离子体加工炉

    公开(公告)号：US20090095424A1

    公开(公告)日：2009-04-16

    申请号：US11871586

    申请日：2007-10-12

    申请人： Greg Bettencourt ,  Raj Dhindsa ,  George Diercks ,  Randall A. Hardin ,  Jon Keihl ,  Duane Lytle ,  Alexei Marakhtanov ,  Roger Patrick ,  John Pegg ,  Shannon Spencer

    发明人： Greg Bettencourt ,  Raj Dhindsa ,  George Diercks ,  Randall A. Hardin ,  Jon Keihl ,  Duane Lytle ,  Alexei Marakhtanov ,  Roger Patrick ,  John Pegg ,  Shannon Spencer

    IPC分类号： C23C16/00 ,  H05H1/00

    CPC分类号： H01J37/04 ,  C23C16/4401 ,  C23C16/45565 ,  H01J37/3255 ,  H01J37/32605 ,  H01J37/32724 ,  H01J2237/032

    摘要： The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, and securing hardware, wherein the silicon-based showerhead electrode comprises a plurality of partial recesses formed in the backside of the silicon-based showerhead electrode and backside inserts positioned in the partial recesses. The thermal control plate comprises securing hardware passages configured to permit securing hardware to access the backside inserts. The securing hardware and the backside inserts are configured to maintain engagement of the thermal control plate and the silicon-based showerhead electrode and to permit disengagement of the thermal control plate and the silicon-based showerhead electrode while isolating the silicon-based electrode material of the silicon-based showerhead electrode from frictional contact with the securing hardware during disengagement.

    摘要翻译： 本发明一般涉及等离子体处理，更具体地，涉及其中使用的等离子体处理室和电极组件。 根据本发明的一个实施例，提供一种电极组件，其包括热控制板，硅基喷头电极和固定硬件，其中硅基喷头电极包括多个部分凹部，其形成在 硅基喷头电极和位于部分凹部中的背面插入件。 热控制板包括固定硬件通道，其配置成允许固定硬件以接近背面插入件。 固定硬件和后侧插入件构造成保持热控制板和硅基喷头电极的接合，并且允许热控制板和硅基喷头电极分离，同时隔离硅基电极材料的硅基电极材料 硅基喷头电极在分离时与固定硬件摩擦接触。