DEVICE AND METHOD FOR THE PLASMA TREATMENT OF SURFACES AND USE OF A DEVICE
    6.
    发明申请
    DEVICE AND METHOD FOR THE PLASMA TREATMENT OF SURFACES AND USE OF A DEVICE 审中-公开
    用于等离子体处理表面和使用装置的装置和方法

    公开(公告)号:US20140207053A1

    公开(公告)日:2014-07-24

    申请号:US14115789

    申请日:2012-05-04

    IPC分类号: A61B18/04

    摘要: The invention relates to a device for the plasma treatment of surfaces (47), in particular of skin, having a housing (3), a plasma source (5) allocated to the housing (3), and at least one spacer (21) that is provided on the housing (3) and/or the plasma source (5) in such a manner that a distance (d) between the plasma source (5) and a surface (47) to be treated can be maintained at least in some regions. The device is characterized in that the spacer (21) is designed to be adjustable in order to vary the distance (d) and that the distance (d) can be varied in such a manner that a preferred plasma chemistry can be selected at the location of the surface (47) to be treated.

    摘要翻译: 本发明涉及一种用于等离子体处理表面(47),特别是皮肤的装置,其具有壳体(3),分配给壳体(3)的等离子体源(5)和至少一个间隔物(21) 其设置在壳体(3)和/或等离子体源(5)上,使得待处理的等离子体源(5)和表面(47)之间的距离(d)可以至少保持在 一些地区。 该装置的特征在于,间隔件(21)被设计成可调节以便改变距离(d),并且距离(d)可以以这样的方式变化,使得可以在该位置处选择优选的等离子体化学 的待处理表面(47)。