公开(公告)号：US07555828B2

公开(公告)日：2009-07-07

申请号：US10307777

申请日：2002-12-02

申请人： Gregory Breyta ,  Mark Whitney Hart ,  Bulent Nihat Kurdi ,  Dennis Richard McKean ,  Alfred Floyd Renaldo ,  Douglas Johnson Werner

发明人： Gregory Breyta ,  Mark Whitney Hart ,  Bulent Nihat Kurdi ,  Dennis Richard McKean ,  Alfred Floyd Renaldo ,  Douglas Johnson Werner

IPC分类号： G11B5/127

CPC分类号： B82Y25/00 ,  B82Y10/00 ,  G11B5/3116 ,  G11B5/313 ,  G11B5/3163 ,  G11B5/3903 ,  G11B5/40 ,  G11B2005/3996 ,  Y10T29/49025 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49052

摘要： A read sensor for a magneto resistive head is formed through the use of a bilayer lift-off mask. According to one embodiment, a release layer is formed on top of a sensor layer. A silicon-containing resist layer is formed over the release layer. The resist layer is patterned according to the desired dimensions of the read sensor. Then, plasma etching, such as oxygen plasma etching, is used to remove the portion of the release layer that is exposed by removal of resist material. The release layer may be etched to undercut the patterned resist layer, or may entirely removed beneath the patterned resist layer to provide a bridge of the resist material. In either case, isotropic plasma etching, anisotropic plasma etching, or some combination thereof may be applied.

摘要翻译： 通过使用双层剥离掩模形成用于磁阻头的读取传感器。 根据一个实施例，释放层形成在传感器层的顶部。 在剥离层上形成含硅抗蚀剂层。 根据读取传感器的期望尺寸对抗蚀剂层进行图案化。 然后，使用诸如氧等离子体蚀刻的等离子体蚀刻来去除通过去除抗蚀剂材料而暴露的剥离层的部分。 可以蚀刻剥离层以削去图案化的抗蚀剂层，或者可以在图案化的抗蚀剂层下方完全去除以提供抗蚀剂材料的桥。 在任一情况下，可以应用各向同性等离子体蚀刻，各向异性等离子体蚀刻或其某种组合。

公开(公告)号：US07223350B2

公开(公告)日：2007-05-29

申请号：US10109929

申请日：2002-03-29

申请人： Ping-Wei Chang ,  Brad Lee Jackson ,  Bulent Nihat Kurdi ,  Jennifer Lu ,  Dennis Richard McKean ,  Eun Kyoung Row

发明人： Ping-Wei Chang ,  Brad Lee Jackson ,  Bulent Nihat Kurdi ,  Jennifer Lu ,  Dennis Richard McKean ,  Eun Kyoung Row

IPC分类号： B44C1/22

CPC分类号： G11B5/6082 ,  G11B5/3173

摘要： A process to reduce step heights in planarization of thin film carriers in an encapsulation system. The improvements include using an adhesive tape having a thinner adhesive thickness and a stiffer tape for the film sealing the encapsulant on the carrier to result in a low step height surface transition between the carrier and the cured encapsulant. The composition of the encapsulant is modified to reduce the shrinkage upon curing of the encapsulant. The encapsulant may include an absorbent that absorbs the irradiation and cause the top surface to harden first compared to the bulk of the encapsulant, and/or a gas-emitting additive that creates gaseous products that expand upon irradiation to thereby reduce the shrinkage of the encapsulant upon curing. Alternatively, irradiation at very low incidence angle relative to the top surface of the encapsulant causes the top surface to harden before the bulk of the encapsulant.

摘要翻译： 一种降低封装系统中薄膜载体平面化阶跃高度的方法。 这些改进包括使用具有较薄粘合剂厚度的粘合带和用于将密封剂密封在载体上的较硬的胶带，导致载体和固化的密封剂之间的低台阶高度表面过渡。 改进密封剂的组成以减少密封剂固化时的收缩。 密封剂可以包括吸收辐射的吸收剂，并且使顶部表面首先与密封剂的主体相比硬化，和/或产生气体产物的气体发射添加剂，其在照射时膨胀，从而减小密封剂的收缩 固化后。 或者，相对于密封剂的顶表面以非常低的入射角的照射使得顶部表面在大部分密封剂之前硬化。

公开(公告)号：US5932113A

公开(公告)日：1999-08-03

申请号：US923360

申请日：1997-09-04

申请人： Bulent Nihat Kurdi ,  Dennis R. McKean ,  Eric Keith Wong

发明人： Bulent Nihat Kurdi ,  Dennis R. McKean ,  Eric Keith Wong

IPC分类号： C23F1/02 ,  G11B5/31 ,  G11B5/60 ,  G11B21/21 ,  B44C1/22

CPC分类号： G11B5/6005 ,  C23F1/02 ,  G11B21/21 ,  G11B5/3106 ,  G11B5/3116

摘要： A method for preparing the air bearing surface of a slider for etch patterning including the steps of applying a first thin film to a carrier, applying a second thin film to the carrier, the first thin film and the second thin film separated by a recess, each of the first and second thin films having respective first and second air bearing surfaces, applying an adhesive film over the first and second thin films, depositing a fluid in the recess, the fluid held in the recess by the adhesive film, curing the fluid, and removing the adhesive film. The method of the invention may also include coating the first and second air bearing surfaces with an etch mask, developing the etch mask, and patterning the first and second air bearing surfaces.

摘要翻译： 一种用于制备用于蚀刻图案的滑块的空气轴承表面的方法，包括以下步骤：将第一薄膜施加到载体上，将第二薄膜施加到载体上，第一薄膜和第二薄膜由凹部分开， 所述第一和第二薄膜中的每一个具有相应的第一和第二空气轴承表面，在第一和第二薄膜上施加粘合剂膜，在凹槽中沉积流体，通过粘合剂膜保持在凹部中的流体，固化流体 ，并除去粘合膜。 本发明的方法还可以包括用蚀刻掩模涂覆第一和第二空气轴承表面，显影蚀刻掩模，以及图案化第一和第二空气轴承表面。