Method of making an article comprising a silicon body
    9.
    发明授权
    Method of making an article comprising a silicon body 失效
    制造包含硅体的制品的方法

    公开(公告)号:US5391269A

    公开(公告)日:1995-02-21

    申请号:US84689

    申请日:1993-06-29

    CPC分类号: H01L21/3063 Y10T29/49169

    摘要: We have found that etching of a body that comprises exposed Si as well as a Ti-comprising metal layer (e.g., a patterned Ti/Pt layer) in an amine-based anisotropic etchant for Si (e.g., 100.degree. C. EDP) frequently results in undesirable changes in the Ti-comprising metal layer. We have also found that the changes can be substantially reduced or eliminated by electrolytic means, namely, by making the metal layer the anode in an electrolytic cell that contains the etchant.

    摘要翻译: 我们已经发现,在基于胺的各向异性蚀刻剂(例如,100℃EDP)中经常蚀刻包括暴露的Si以及包含Ti的金属层(例如,图案化的Ti / Pt层)的主体 导致含Ti的金属层的不期望的变化。 我们还发现,通过电解方式,即通过在含有蚀刻剂的电解槽中使金属层成为阳极,可以显着地减少或消除这些变化。