公开(公告)号：US20160233050A1

公开(公告)日：2016-08-11

申请号：US15015930

申请日：2016-02-04

Applicant: HITACHI, LTD.

Inventor： Keigo KASUYA ,  Takeshi KAWASAKI ,  Takashi OHSHIMA ,  Souichi KATAGIRI

IPC: H01J37/18 ,  H01J37/073 ,  H01J37/14

CPC classification number: H01J37/18 ,  H01J41/20 ,  H01J2237/1825

Abstract: An ion pump and a charged particle beam device each includes two opposite flat-plate cathodes, an anode with a cylindrical shape having openings that face the respective flat-plate cathodes, a voltage application unit configured to apply a potential higher than potentials of the flat-plate cathodes to the anode, a magnetic field application unit configured to apply a magnetic field along an axial direction of the cylindrical shape of the anode, and a cathode bar arranged within the anode. The surface of the cathode bar is formed with a material that forms a non-evaporative getter alloy film on the anode or the flat-plate cathodes.

Abstract translation: 离子泵和带电粒子束装置各自包括两个相对的平板阴极，具有面对各个平板阴极的开口的具有圆柱形形状的阳极;电压施加单元，被配置为施加高于平面电位的电位 阳极的板极阴极，被配置为沿着阳极的圆柱形状的轴向施加磁场的磁场施加单元和布置在阳极内的阴极棒。 阴极棒的表面由在阳极或平板阴极上形成非蒸发吸气剂合金膜的材料形成。

公开(公告)号：US20170229284A1

公开(公告)日：2017-08-10

申请号：US15514656

申请日：2014-09-29

Applicant: HITACHI, LTD.

Inventor： Shinichi MATSUBARA ,  Hiroyasu SHICHI ,  Takashi OHSHIMA

IPC: H01J37/26 ,  H01J37/08 ,  H01J37/16

CPC classification number: H01J37/26 ,  H01J37/08 ,  H01J37/16 ,  H01J37/18 ,  H01J37/28 ,  H01J2237/0807 ,  H01J2237/2003 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/2608 ,  H01J2237/31749

Abstract: Since a diffraction phenomenon occurs in the electron beam passing through a differential evacuation hole, an electron beam whose probe diameter is narrowed cannot pass through a hole having an aspect ratio of a predetermined value or more, and accordingly, a degree in vacuum on the electron beam side cannot be improved. By providing a differential evacuation hole with a high aspect ratio in an ion beam device, it becomes possible to obtain an observed image on a sample surface, with the sample being placed under the atmospheric pressure or a pressure similar thereto, in a state where the degree of vacuum on the ion beam side is stabilized. Moreover, by processing the differential evacuation hole by using an ion beam each time it is applied, both a normal image observation with high resolution and an image observation under atmospheric pressure or a pressure similar thereto can be carried out.